Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL8068574 | 0.96 | — | — | |
| SCHEMBL9707 | 0.96 | — | — | |
| Ammonia Solution, Strong SCHEMBL7662769 | 0.92 | — | — | |
| Bromide SCHEMBL4007326 | 0.92 | — | — | |
| Iodide SCHEMBL4746012 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL9537046 | 0.79 | — | — | |
| Formic Acid SCHEMBL31556138 | 0.78 | LMNA (0.33) | — | |
| SCHEMBL24741007 | 0.76 | CYP2D6 (0.37) | — | |
| Hydrochloric Acid SCHEMBL27883424 | 0.76 | NFKB1 (0.44) | — | |
| SCHEMBL625808 | 0.74 | DNM1 (0.65) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200131431-A1 | CHEMICAL ADDITIVES AND SURFACTANT COMBINATIONS FOR FAVORABLE WETTABILITY ALTERATION AND IMPROVED HYDROCARBON RECOVERY FACTORS | ALCHEMY SCIENCES INC (US) | 2020-04-30 | — | — | US | claimed |
| WO-2009077394-A1 | AZOMETHINE DIRECT DYES OR REDUCED PRECURSORS OF THESE DYES OBTAINED FROM 5-(2-HYDROXYETHYLAMINO)-2-METHYLPHENOL, AND DYEING PROCESS USING THESE DYES AND PRECURSORS | L'OREAL (FR) | 2009-06-25 | — | — | WO | claimed |
| US-20240208959-A1 | THIAZOLE/ISOTHIAZOLE HSD17B13 INHIBITORS AND USES THEREOF | INIPHARM, INC. | 2024-06-27 | — | — | US | disclosed |
| EP-4370561-A1 | IMPROVEMENTS IN OR RELATED TO ORGANIC COMPOUNDS | Givaudan SA (CH) | 2024-05-22 | — | — | EP | disclosed |
| EP-4319872-A1 | THIAZOLE/ISOTHIAZOLE HSD17B13 INHIBITORS AND USES THEREOF | Inipharm, Inc. (US) | 2024-02-14 | — | — | EP | disclosed |
| EP-4267147-A1 | ZWITTERIONIC LIPID NANOPARTICLE COMPOSITIONS, AND METHODS OF USE | Cornell University (US) | 2023-11-01 | — | — | EP | disclosed |
| US-20230286923-A1 | QUINAZOLINONE HSD17B13 INHIBITORS AND USES THEREOF | INIPHARM, INC. | 2023-09-14 | — | — | US | disclosed |
| EP-4185380-A1 | QUINAZOLINONE HSD17B13 INHIBITORS AND USES THEREOF | Inipharm, Inc. (US) | 2023-05-31 | — | — | EP | disclosed |
| CN-116194440-A | Quinazolinone HSD17B13 inhibitors and uses thereof | 伊尼制药公司 | 2023-05-30 | — | — | CN | disclosed |
| WO-2023285663-A1 | IMPROVEMENTS IN OR RELATED TO ORGANIC COMPOUNDS | GIVAUDAN SA (CH) | 2023-01-19 | — | — | WO | disclosed |
| WO-2022216627-A1 | THIAZOLE/ISOTHIAZOLE HSD17B13 INHIBITORS AND USES THEREOF | INIPHARM, INC. (US) | 2022-10-13 | — | — | WO | disclosed |
| EP-0728178-B1 | FABRIC CONDITIONING COMPOSITION | UNILEVER PLC (GB) | 1999-12-22 | — | — | EP | disclosed |
| US-5958794-A | CHEMOMECHANICAL WET POLISHING WITH AN ERODABLE ABRASIVE ARTICLE HAVING A THREE-DIMENSIONALLY TEXTURED SURFACE THAT INCLUDES RESIN-BOUND ABRASIVE PARTICLES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1999-09-28 | — | — | US | disclosed |
| EP-0859823-A1 | FABRIC CONDITIONING COMPOSITION | QUEST INTERNATIONAL (NL) | 1998-08-26 | — | — | EP | disclosed |
| EP-0852063-A1 | METHOD OF MODIFYING AN EXPOSED SURFACE OF A SEMICONDUCTOR WAFER | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-07-08 | — | — | EP | disclosed |
| WO-1997017419-A1 | FABRIC CONDITIONING COMPOSITION | QUEST INTERNATIONAL (NL) | 1997-05-15 | — | — | WO | disclosed |
| WO-1997011484-A1 | METHOD OF MODIFYING AN EXPOSED SURFACE OF A SEMICONDUCTOR WAFER | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-03-27 | — | — | WO | disclosed |
| EP-0728178-A1 | FABRIC CONDITIONING COMPOSITION | UNILEVER PLC (GB) | 1996-08-28 | — | — | EP | disclosed |
| WO-1995013346-A1 | FABRIC CONDITIONING COMPOSITION | UNILEVER PLC (GB) | 1995-05-18 | — | — | WO | disclosed |
| US-5061603-A | For productionof screen for screen printing; grafted pyridinium alcohols | SERICOL GROUP LIMITED (GB) | 1991-10-29 | — | — | US | disclosed |