Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.33 |
| ▸ | AR | P10275 | 3/20 | 0.31 |
| ▸ | CA2 | P00918 | 2/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | FABP4 | P15090 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL242617 | 0.78 | KIF11 (0.46) | PTPN5 | |
| SCHEMBL244778 | 0.74 | KIF11 (0.38) | — | |
| SCHEMBL243271 | 0.73 | ATM (0.35) | — | |
| Bromide SCHEMBL3132540 | 0.72 | KIF11 (0.37) | — | |
| Hydrogen Sulfide SCHEMBL27925458 | 0.72 | PTGS2 (0.40) | PTPN1TRPA1PTPN5ARCA2 | |
| SCHEMBL244495 | 0.71 | KDM4E (0.40) | — | |
| SCHEMBL9809873 | 0.71 | CA2 (0.48) | ARCA2CA1 | |
| Perchlorate SCHEMBL3139518 | 0.68 | GPR84 (0.36) | — | |
| SCHEMBL15135001 | 0.68 | ALDH1A1 (0.44) | TRPA1PTPN5ARCA2CA1 | |
| SCHEMBL482553 | 0.67 | ENPP1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11339231-B2 | Olefin-based resin composition, manufacturing method therefor, and molded article thereof | ADEKA CORPORATION (JP) | 2022-05-24 | — | — | US | disclosed |
| US-20200317830-A1 | OLEFIN-BASED RESIN COMPOSITION, MANUFACTURING METHOD THEREFOR, AND MOLDED ARTICLE THEREOF | ADEKA CORPORATION (JP) | 2020-10-08 | — | — | US | disclosed |
| US-20190284217-A1 | NOVEL COMPOUND, COMPOSITION INCLUDING SAME, OLEFIN-BASED RESIN COMPOSITION, MOLDED ARTICLE THEREOF, AND METHOD FOR IMPROVING IMPACT RESISTANCE OF MOLDED ARTICLE | ADEKA CORPORATION (JP) | 2019-09-19 | — | — | US | disclosed |
| EP-3533800-A1 | NOVEL COMPOUND, COMPOSITION INCLUDING SAME, OLEFIN-BASED RESIN COMPOSITION, MOLDED ARTICLE THEREOF, AND METHOD FOR IMPROVING IMPACT RESISTANCE OF MOLDED ARTICLE | Adeka Corporation (JP) | 2019-09-04 | — | — | EP | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-9024058-B2 | Ammonium fluoroalkanesulfonates and a synthesis method therefor | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20110212390-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110212391-A1 | POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |
| EP-2362267-A1 | Chemically amplified negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-31 | — | — | EP | disclosed |
| EP-2362268-A1 | Polymer, chemically amplified positive resist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-31 | — | — | EP | disclosed |
| US-20110207954-A1 | Method for Producing Alkoxycarbonylfluoroalkanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20110070544-A1 | Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method | Central Glass Company,Ltd. (JP) | 2011-03-24 | — | — | US | disclosed |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| EP-2264007-A1 | NOVEL SALT HAVING FLUORINE-CONTAINING CARBANION STRUCTURE, DERIVATIVE THEREOF, PHOTOACID GENERATOR, RESIST MATERIAL USING THE PHOTOACID GENERATOR, AND PATTERN FORMING METHOD | Central Glass Company, Limited (JP) | 2010-12-22 | — | — | EP | disclosed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110207954-A1 | Method for Producing Alkoxycarbonylfluoroalkanesulfonic Acid Salt | ARSA, SLC6A5, PFAS | PTPN1 3117/4885TRPA1 139/4885PTPN5 1817/4885 |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | PFAS, DDAH1, STS | PTPN1 1367/4885TRPA1 2397/4885PTPN5 1599/4885 |
| US-20110070544-A1 | Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method | ARF1, ARF5, ARF6 | PTPN1 3396/4885TRPA1 2306/4885PTPN5 3493/4885 |
| US-20190284217-A1 | NOVEL COMPOUND, COMPOSITION INCLUDING SAME, OLEFIN-BASED RESIN COMPOSITION, MOLDED ARTICLE THEREOF, AND METHOD FOR IMPROVING IMPACT RESISTANCE OF MOLDED ARTICLE | SETD7, ZMYND8, MRM1 | PTPN1 4563/4885TRPA1 1008/4885PTPN5 4587/4885 |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | HAO2, SULT2A1, CYP2F1 | PTPN1 1813/4885TRPA1 4083/4885PTPN5 3460/4885 |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | RER1, SMARCC1, SMCHD1 | PTPN1 435/4885TRPA1 1013/4885PTPN5 479/4885 |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | ARF1, ARF5, ARF6 | PTPN1 3451/4885TRPA1 363/4885PTPN5 3514/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.