Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA known ✓ | P10253 | 2/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.95 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.95 |
| ▸ | ATM | Q13315 | 1/20 | 0.95 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.59 |
| ▸ | SLC9A1 | P19634 | 7/20 | 0.54 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.54 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.54 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.54 |
| ▸ | THPO | P40225 | 1/20 | 0.54 |
| ▸ | CYP4Z1 | Q86W10 | 1/20 | 0.54 |
| ▸ | KCNMA1 | Q12791 | 3/20 | 0.48 |
| ▸ | MGAM | O43451 | 2/20 | 0.47 |
| ▸ | AMY1A | P0DUB6 | 2/20 | 0.47 |
| ▸ | SI | P14410 | 2/20 | 0.47 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL17967108 | 0.98 | POLB (0.91) | POLBMAPK1ATMDGAT1SLC9A1 | |
| SCHEMBL1012471 | 0.98 | POLB (1.00) | POLBMAPK1ATMDGAT1SLC9A1 | |
| SCHEMBL3672275 | 0.98 | POLB (1.00) | POLBMAPK1ATMDGAT1SLC9A1 | |
| SCHEMBL184 | 0.98 | POLB (1.00) | POLBMAPK1ATMDGAT1SLC9A1 | |
| Phosphine SCHEMBL23702726 | 0.95 | POLB (0.95) | POLBMAPK1ATMDGAT1SLC9A1 | |
| SCHEMBL875075 | 0.95 | POLB (0.95) | POLBMAPK1ATMDGAT1SLC9A1 | |
| Water SCHEMBL12099335 | 0.95 | POLB (0.95) | POLBMAPK1ATMDGAT1SLC9A1 | |
| Ammonia Solution, Strong SCHEMBL563462 | 0.95 | POLB (0.95) | POLBMAPK1ATMDGAT1SLC9A1 | |
| SCHEMBL7424280 | 0.95 | POLB (0.95) | POLBMAPK1ATMDGAT1SLC9A1 | |
| SCHEMBL875034 | 0.95 | POLB (0.95) | POLBMAPK1ATMDGAT1SLC9A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9199933-B2 | Process for preparation of (1S, 3S, 5S)-2-[(2S)-2-amino-2-(3-hydroxy-I-adamantyl) acetyl]-2-azabicyclo [3.1.0] hexane-3-carbonitrile | Davuluri, Ramamohan Rao (IN) | 2015-12-01 | — | — | US | claimed |
| US-20150112084-A1 | PROCESS FOR PREPARATION OF (IS, 3S, 5S)-2-[(2S)-2-AMIN0-2-(3-HYDROXY-l-ADAMANTYL) ACETYL]-2-AZABICYCLO [3.1.0] HEXANE-3-CARBONITRILE | DAVULURI, RAMAMOHAN RAO (IN) | 2015-04-23 | — | — | US | claimed |
| EP-2855432-A1 | PROCESS FOR PREPARATION OF (1S, 3S, 5S)-2-[(2S)-2-AMINO-2-(3-HYDROXY-1-ADAMANTYL) ACETYL]-2-AZABICYCLO [3.1.0]HEXANE-3-CARBONITRILE | Davuluri, Ramamohan Rao (IN) | 2015-04-08 | — | — | EP | claimed |
| WO-2013179297-A1 | PROCESS FOR PREPARATION OF (1S, 3S, 5S)-2-[(2S)-2-AMINO-2-(3-HYDROXY-1-ADAMANTYL) ACETYL]-2-AZABICYCLO [3.1.0] HEXANE-3-CARBONITRILE | RAO DAVULURI RAMAMOHAN (IN) | 2013-12-05 | — | — | WO | claimed |
| US-4873136-A | MILD ETCHING; REMOVAL OF RESIDUAL FILM WITH CATIONIC SURFACTANT | GENERAL ELECTRIC COMPANY (US) | 1989-10-10 | — | — | US | claimed |
| EP-4738010-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME | Toray Industries, Inc. (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-12590090-B2 | Pyrimidine-and nitrogen-containing bicyclic compound | ASAHI KASEI PHARMA CORPORATION (JP) | 2026-03-31 | — | — | US | disclosed |
| US-12545784-B2 | Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2026-02-10 | — | — | US | disclosed |
| EP-4668018-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE | Toray Industries, Inc. (JP) | 2025-12-24 | — | — | EP | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-4651186-A1 | METHOD FOR PRODUCING MULTILAYER BODY, AND RESIN COMPOSITION | Toray Industries, Inc. (JP) | 2025-11-19 | — | — | EP | disclosed |
| CN-1039323-C | Imidazopyriding derivatives and process for preparation thereof | TANABE SEIYAKU CO (JP) | 1998-07-29 | — | — | CN | disclosed |
| CN-1184105-A | Substituted thiazolidine derivatives and pharmaceutical compositions containing them and use thereof | OTSUKA PHARMA CO LTD (JP) | 1998-06-10 | — | — | CN | disclosed |
| CN-1037842-C | Substituted thiazolidine derivatives, pharmaceutical compositions and uses thereof | OTSUKA PHARMA CO LTD (JP) | 1998-03-25 | — | — | CN | disclosed |
| US-5677322-A | THERAPY FOR AGING, DIABETES | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1997-10-14 | — | — | US | disclosed |
| CN-1106982-A | Maillard reaction inhibitor | OTSUKA PHARMA CO LTD (JP) | 1995-08-16 | — | — | CN | disclosed |
| EP-0638075-A1 | THIAZOLE OR IMIDAZOLE DERIVATIVES AS MAILLARD REACTION INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1995-02-15 | — | — | EP | disclosed |
| WO-1994019335-A1 | THIAZOLE OR IMIDAZOLE DERIVATIVES AS MAILLARD REACTION INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1994-09-01 | — | — | WO | disclosed |
| CN-1070912-A | Imidazopyridine derivatives and preparation method thereof | TANABE SEIYAKU CO (JP) | 1993-04-14 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | GAA 4327/4885POLB 1151/4885MAPK1 3534/4885 |
| US-12545784-B2 | Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device | ASIC1, ASIC3, TET3 | GAA 3637/4885POLB 2310/4885MAPK1 2629/4885 |
| US-20150112084-A1 | PROCESS FOR PREPARATION OF (IS, 3S, 5S)-2-[(2S)-2-AMIN0-2-(3-HYDROXY-l-ADAMANTYL) ACETYL]-2-AZABICYCLO [3.1.0] HEXANE-3-CARBONITRILE | DPP4, DPP3, DPP9 | GAA 224/4885POLB 4445/4885MAPK1 1324/4885 |
| US-12590090-B2 | Pyrimidine-and nitrogen-containing bicyclic compound | IRAK1, IRAK4, IRAK2 | GAA 3517/4885POLB 1595/4885MAPK1 152/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.