Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | LPAR1 | Q92633 | 5/20 | 0.39 |
| ▸ | LPAR3 | Q9UBY5 | 5/20 | 0.39 |
| ▸ | LPAR2 | Q9HBW0 | 2/20 | 0.39 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | TLR2 | O60603 | 2/20 | 0.33 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.33 |
| ▸ | PRKCG | P05129 | 1/20 | 0.33 |
| ▸ | PRKCB | P05771 | 1/20 | 0.33 |
| ▸ | PRKCA | P17252 | 1/20 | 0.33 |
| ▸ | PRKCH | P24723 | 1/20 | 0.33 |
| ▸ | PRKCI | P41743 | 1/20 | 0.33 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.33 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.33 |
| ▸ | PRKCZ | Q05513 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28728615 | 1.00 | TDP1 (0.53) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL429585 | 1.00 | TDP1 (0.53) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL230477 | 1.00 | TDP1 (0.53) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL28729672 | 1.00 | TDP1 (0.53) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL80455 | 0.96 | TDP1 (0.52) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL22499935 | 0.94 | TDP1 (0.48) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL23159796 | 0.94 | TDP1 (0.62) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL4891519 | 0.94 | TDP1 (0.57) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL8642635 | 0.94 | TDP1 (0.52) | TDP1LPAR1LPAR3LPAR2USP2 | |
| SCHEMBL25289202 | 0.94 | TDP1 (0.52) | TDP1LPAR1LPAR3LPAR2USP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 764 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12545862-B2 | Method for producing decomposing/cleaning composition | RESONAC CORPORATION (JP) | 2026-02-10 | — | — | US | claimed |
| US-20250257242-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2025-08-14 | — | — | US | claimed |
| WO-2025066477-A1 | ALKALI-DEVELOPABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT HAVING CURED PRODUCT | 太阳油墨（苏州）有限公司 | 2025-04-03 | — | — | WO | claimed |
| CN-119717391-A | Alkali-developable resin composition, dry film, cured product, and electronic component having the cured product | 太阳油墨（苏州）有限公司 | 2025-03-28 | — | — | CN | claimed |
| US-20240042376-A1 | WATER-LEAN CARBON DIOXIDE ABSORBENT AND METHOD FOR CAPTURING CARBON DIOXIDE BY USING SAME | CE-TEK CO., LTD. (KR) | 2024-02-08 | — | — | US | claimed |
| WO-2023068516-A1 | LOW-WATER TYPE CARBON DIOXIDE ABSORBENT AND METHOD FOR CAPTURING CARBON DIOXIDE BY USING SAME | 주식회사 씨이텍 | 2023-04-27 | — | — | WO | claimed |
| CN-114027309-B | Iodine-containing disinfectant containing polyvinylpyrrolidone and polyalcohol ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-114208818-B | Iodine-containing disinfectant containing polyol ether and/or cyclic ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-10-04 | — | — | CN | claimed |
| CN-114208818-A | Iodine-containing disinfectant containing polyol ether and/or cyclic ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-03-22 | — | — | CN | claimed |
| CN-114027309-A | Iodine-containing disinfectant containing polyvinylpyrrolidone and polyol ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-02-11 | — | — | CN | claimed |
| US-10543454-B2 | Carbon dioxide absorbent | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2020-01-28 | — | — | US | claimed |
| US-10099172-B2 | Carbon dioxide absorbent comprising triamine | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2018-10-16 | — | — | US | claimed |
| US-20180257023-A1 | CARBON DIOXIDE ABSORBENT | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2018-09-13 | — | — | US | claimed |
| US-20170246587-A1 | CARBON DIOXIDE ABSORBENT COMPRISING TRIAMINE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2017-08-31 | — | — | US | claimed |
| US-20170225118-A1 | CARBON DIOXIDE ABSORBENT COMPRISING OXYGEN-CONTAINING DIAMINE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2017-08-10 | — | — | US | claimed |
| CN-102453148-B | Olefin polymerization catalyst component, olefin polymerization catalyst and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2014-04-02 | — | — | CN | claimed |
| CN-102131910-B | Cleaning agent composition for removing lead-free flux and system for removing lead-free flux | ARAKAWA CHEM IND | 2012-12-19 | — | — | CN | claimed |
| CN-102453148-A | Olefin polymerization catalyst component, olefin polymerization catalyst, and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2012-05-16 | — | — | CN | claimed |
| US-5512198-A | WEAR RESISTANCE | NIPPON OIL CO., LTD. (JP) | 1996-04-30 | — | — | US | claimed |
| WO-2026087353-A1 | USE OF NON-VOLATILE AND LOW WATER SENSITIVE COUNTERIONS IN LATICES | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2026-04-30 | — | — | WO | disclosed |
| US-12577508-B2 | Composition, and method for cleaning adhesive polymer | RESONAC CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| EP-4700824-A1 | LOW-TEMPERATURE-SINTERING BONDING MATERIAL AND BONDED STRUCTURE | Daicel Corporation (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-12545862-B2 | Method for producing decomposing/cleaning composition | RESONAC CORPORATION (JP) | 2026-02-10 | — | — | US | disclosed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-3913025-B1 | AQUEOUS REACTION LIQUID | CANON PRODUCTION PRINTING HOLDING BV (NL) | 2025-11-05 | — | — | EP | disclosed |
| EP-4012726-B1 | ADHESIVE CONDUCTIVE PASTE | DAICEL CORP (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4628555-A1 | TWO-COMPONENT CLEAR COATING COMPOSITION | Nippon Paint Automotive Coatings Co., Ltd. (JP) | 2025-10-08 | — | — | EP | disclosed |
| US-20250304843-A1 | ANTIFREEZE AGENTS AND COOLANTS FOR FUEL CELLS, STORAGE BATTERIES AND BATTERIES | BASF SE (DE) | 2025-10-02 | — | — | US | disclosed |
| US-20250270480-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250270474-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250270415-A1 | PRINTING METHOD, PRINTER AND INK SET | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2025-08-28 | — | — | US | disclosed |
| EP-4606873-A1 | PRINTING METHOD, PRINTER AND INK SET | Canon Production Printing Holding B.V. (NL) | 2025-08-27 | — | — | EP | disclosed |
| US-20250257242-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2025-08-14 | — | — | US | disclosed |
| EP-4597547-A1 | CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20250215024-A1 | CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE | FUJIFILM CORPORATION (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250201546-A1 | METHOD FOR PROCESSING SUBSTRATE, KIT FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-19 | — | — | US | disclosed |
| WO-2025127083-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | 株式会社レゾナック | 2025-06-19 | — | — | WO | disclosed |
| WO-2025126439-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | 株式会社レゾナック | 2025-06-19 | — | — | WO | disclosed |
| WO-2025127074-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | 株式会社レゾナック | 2025-06-19 | — | — | WO | disclosed |
| WO-2025126434-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | 株式会社レゾナック | 2025-06-19 | — | — | WO | disclosed |
| US-20250188315-A1 | POLISHING AGENT AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2025-06-12 | — | — | US | disclosed |
| WO-2025105151-A1 | METHOD OF MANUFACTURING TREATED SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2025-05-22 | — | — | WO | disclosed |
| US-12305110-B2 | Antifreeze agents and coolants for fuel cells, storage batteries and batteries | BASF SE (DE) | 2025-05-20 | — | — | US | disclosed |
| CN-119948406-A | Photosensitive colored resin composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device | 三菱化学株式会社 | 2025-05-06 | — | — | CN | disclosed |
| US-20250140548-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD, (JP) | 2025-05-01 | — | — | US | disclosed |
| US-20250140549-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD, (JP) | 2025-05-01 | — | — | US | disclosed |
| US-12286546-B2 | Pre-treatment liquid for use in ink jet printing | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2025-04-29 | — | — | US | disclosed |
| EP-3877481-B1 | USE OF AN ESSENTIALLY WATER-FREE COMPOSITION AS A COOLANT AND ANTIFREEZE FOR FUEL CELLS, ACCUMULATORS AND BATTERIES | BASF SE (DE) | 2025-04-23 | — | — | EP | disclosed |
| WO-2025078258-A1 | FOOD SAFE AQUEOUS INKJET COMPOSITIONS | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2025-04-17 | — | — | WO | disclosed |
| WO-2025078257-A1 | FOOD SAFE AQUEOUS INKJET COMPOSITIONS | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2025-04-17 | — | — | WO | disclosed |
| US-20250122393-A1 | FOOD SAFE AQUEOUS INKJET COMPOSITIONS | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2025-04-17 | — | — | US | disclosed |
| US-20250122397-A1 | FOOD SAFE AQUEOUS INKJET COMPOSITIONS | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2025-04-17 | — | — | US | disclosed |
| EP-4538341-A1 | FOOD SAFE AQUEOUS INKJET COMPOSITIONS | Canon Production Printing Holding B.V. (NL) | 2025-04-16 | — | — | EP | disclosed |
| EP-4538339-A1 | FOOD SAFE AQUEOUS INKJET COMPOSITIONS | Canon Production Printing Holding B.V. (NL) | 2025-04-16 | — | — | EP | disclosed |
| EP-4538347-A2 | USE OF A SUBSTANTIALLY ANHYDROUS COMPOSITION AS COOLANT AND ANTIFREEZE AGENTS FOR FUEL CELLS, ACCUMULATORS AND BATTERIES | BASF SE (DE) | 2025-04-16 | — | — | EP | disclosed |
| EP-4538340-A1 | FOOD SAFE AQUEOUS INKJET COMPOSITIONS | Canon Production Printing Holding B.V. (NL) | 2025-04-16 | — | — | EP | disclosed |
| EP-4535406-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| EP-4535405-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-119768898-A | Chemical solution, method for producing modified substrate, and method for producing laminate | 富士胶片株式会社 | 2025-04-04 | — | — | CN | disclosed |
| WO-2025066477-A1 | ALKALI-DEVELOPABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT HAVING CURED PRODUCT | 太阳油墨（苏州）有限公司 | 2025-04-03 | — | — | WO | disclosed |
| CN-113169060-B | Chamfering part treating agent composition and method for manufacturing wafer | 中央硝子株式会社 | 2025-04-01 | — | — | CN | disclosed |
| CN-119717391-A | Alkali-developable resin composition, dry film, cured product, and electronic component having the cured product | 太阳油墨（苏州）有限公司 | 2025-03-28 | — | — | CN | disclosed |
| US-12252587-B2 | Curable resin composition, thin film, and color conversion panel and display device including thin film | SAMSUNG SDI CO., LTD. (KR) | 2025-03-18 | — | — | US | disclosed |
| US-20250084351-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-03-13 | — | — | US | disclosed |
| US-20250075092-A1 | JETABLE NEUTRALIZING LIQUID TO PREVENT PRIMER SALT INTERACTION WITH VARNISH APPLICATION | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2025-03-06 | — | — | US | disclosed |
| US-20250075094-A1 | TWO-PACK TYPE CLEAR COATING COMPOSITION | NIPPON PAINT AUTOMOTIVE COATING CO. LTD. (JP) | 2025-03-06 | — | — | US | disclosed |
| EP-4516529-A1 | JETABLE NEUTRALIZING LIQUID TO PREVENT PRIMER SALT INTERACTION WITH VARNISH APPLICATION | Canon Production Printing Holding B.V. (NL) | 2025-03-05 | — | — | EP | disclosed |
| US-20250066621-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-02-27 | — | — | US | disclosed |
| CN-111742391-B | Chemical solution for forming water-repellent protective film, method for producing same, and method for producing surface-treated body | 中央硝子株式会社 | 2025-02-18 | — | — | CN | disclosed |
| EP-4259734-B1 | PRE-TREATMENT LIQUID FOR USE IN INK JET PRINTING | CANON PRODUCTION PRINTING HOLDING BV (NL) | 2025-02-12 | — | — | EP | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| EP-4495204-A1 | POLISHING AGENT AND POLISHING METHOD | Resonac Corporation (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-119317618-A | Sulfonium salt and acid generator containing same | 三亚普罗股份有限公司 | 2025-01-14 | — | — | CN | disclosed |
| US-20240425780-A1 | CLEANING SOLUTION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-12-26 | — | — | US | disclosed |
| US-12163087-B2 | Surface treatment agent and method for manufacturing surface treatment body | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-12-10 | — | — | US | disclosed |
| WO-2024248021-A1 | FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND METHOD FOR PRODUCING FILM-FORMING COMPOSITION | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| US-12152169-B2 | Adhesive conductive paste | DAICEL CORPORATION (JP) | 2024-11-26 | — | — | US | disclosed |
| EP-4459666-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | Central Glass Company, Limited (JP) | 2024-11-06 | — | — | EP | disclosed |
| US-12128350-B2 | Water-lean carbon dioxide absorbent and method for capturing carbon dioxide by using same | CE-TEK CO., LTD. (KR) | 2024-10-29 | — | — | US | disclosed |
| WO-2024219382-A1 | LOW-TEMPERATURE-SINTERING BONDING MATERIAL AND BONDED STRUCTURE | 株式会社ダイセル | 2024-10-24 | — | — | WO | disclosed |
| CN-118804958-A | Aqueous multi-liquid polyurethane coating composition | 关西涂料株式会社 | 2024-10-18 | — | — | CN | disclosed |
| CN-118804957-A | Aqueous multi-liquid polyurethane coating composition | 关西涂料株式会社 | 2024-10-18 | — | — | CN | disclosed |
| WO-2024214715-A1 | ADDITIVE COMPOSITION FOR COMMON RAIL DIESEL ENGINE FUEL | 油化産業株式会社 | 2024-10-17 | — | — | WO | disclosed |
| CN-113169248-B | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2024-10-01 | — | — | CN | disclosed |
| US-20240317779-A1 | METAL COMPLEXES HAVING 4-H,6-H OR 8-H DIHYDROAZULENYL LIGANDS AND USE THEREOF | UMICORE AG & CO. KG (DE) | 2024-09-26 | — | — | US | disclosed |
| US-20240317788-A1 | PRECIOUS METAL COMPLEXES WITH DIHYDROAZULENYL LIGANDS AND USE THEREOF | UMICORE AG & CO. KG (DE) | 2024-09-26 | — | — | US | disclosed |
| US-12098319-B2 | Liquid chemical for forming water-repellent protective film, method for preparing same, and method for manufacturing surface-treated body | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-09-24 | — | — | US | disclosed |
| EP-4011990-B1 | PRE-TREATMENT LIQUID FOR USE IN INK JET PRINTING | CANON PRODUCTION PRINTING HOLDING BV (NL) | 2024-09-11 | — | — | EP | disclosed |
| WO-2024177001-A1 | SULFONIUM SALT AND ACID GENERATOR CONTAINING SAID SULFONIUM SALT | サンアプロ株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-20240287103-A1 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | CENTRAL GLASS CO LTD (JP) | 2024-08-29 | — | — | US | disclosed |
| CN-110874026-B | Stripping liquid composition for color filter and method for using same | 易案爱富科技有限公司 | 2024-07-12 | — | — | CN | disclosed |
| WO-2024143097-A1 | SUBSTRATE TREATING METHOD AND SUBSTRATE MANUFACTURING METHOD | セントラル硝子株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024128017-A1 | SULFONIUM SALT, ACID GENERATING AGENT, AND PHOTORESIST | サンアプロ株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122565-A1 | PHOTOSENSITIVE COLORED RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, COLOR FILTER, AND IMAGE DISPLAY DEVICE | 三菱ケミカル株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024116463-A1 | TWO-COMPONENT CLEAR COATING COMPOSITION | 日本ペイント・オートモーティブコーティングス株式会社 | 2024-06-06 | — | — | WO | disclosed |
| EP-3296327-B1 | METHOD FOR PRODUCING ELLIPTICAL, NEEDLE-SHAPED, OR ROD-SHAPED POLYMER PARTICLES | NISSHINBO HOLDINGS INC (JP) | 2024-05-15 | — | — | EP | disclosed |
| US-20240142874-A1 | NON-CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-05-02 | — | — | US | disclosed |
| US-20240116075-A1 | SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-11 | — | — | US | disclosed |
| WO-2024070526-A1 | CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY | 富士フイルム株式会社 | 2024-04-04 | — | — | WO | disclosed |
| US-11945152-B2 | Model material ink set, support material composition, ink set, three-dimensional shaped object, and method for manufacturing three-dimensional shaped object | MAXELL, LTD. (JP) | 2024-04-02 | — | — | US | disclosed |
| EP-3715094-B1 | COMPOSITION FOR MODEL MATERIAL | MAXELL LTD (JP) | 2024-03-27 | — | — | EP | disclosed |
| CN-115551934-B | Curable resin composition, cured film prepared therefrom, and electronic device comprising cured film | 三星SDI株式会社 | 2024-03-12 | — | — | CN | disclosed |
| CN-117677901-A | Positive photosensitive resin composition | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-108026225-B | Resin composition for mold material, resin composition for support material, stereolithography product, and method for producing stereolithography product | 麦克赛尔株式会社 | 2024-03-05 | — | — | CN | disclosed |
| CN-117625025-A | Aqueous multi-liquid polyurethane coating composition | 关西涂料株式会社 | 2024-03-01 | — | — | CN | disclosed |
| CN-112969770-B | Novel antifreeze and coolant for fuel cells, storage cells and batteries | 巴斯夫欧洲公司 | 2024-02-27 | — | — | CN | disclosed |
| CN-114269892-B | Composition and method for cleaning adhesive polymer | 株式会社力森诺科 | 2024-02-23 | — | — | CN | disclosed |
| US-20240055273-A1 | Wet Etching Solution and Wet Etching Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-15 | — | — | US | disclosed |
| WO-2024029354-A1 | SULFONIUM SALT AND ACID GENERATOR CONTAINING SAID SULFONIUM SALT | サンアプロ株式会社 | 2024-02-08 | — | — | WO | disclosed |
| US-20240042376-A1 | WATER-LEAN CARBON DIOXIDE ABSORBENT AND METHOD FOR CAPTURING CARBON DIOXIDE BY USING SAME | CE-TEK CO., LTD. (KR) | 2024-02-08 | — | — | US | disclosed |
| CN-115109413-B | Curable resin composition, film, color conversion panel, and display device | 三星SDI株式会社 | 2024-02-02 | — | — | CN | disclosed |
| EP-3877482-B1 | USE OF HEAT TRANSFER FLUIDS FOR COOLING LITHIUM BATTERIES | BASF SE (DE) | 2024-01-10 | — | — | EP | disclosed |
| CN-114746536-B | Method for producing decomposition cleaning composition | 株式会社力森诺科 | 2024-01-09 | — | — | CN | disclosed |
| CN-117304414-A | Resin composition for mold material and stereolithography | 麦克赛尔株式会社 | 2023-12-29 | — | — | CN | disclosed |
| EP-4294817-A1 | NOBLE METAL COMPLEXES WITH DIHYDROAZULENYL LIGANDS AND USE THEREOF | Umicore AG & Co. KG (DE) | 2023-12-27 | — | — | EP | disclosed |
| WO-2023243611-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | 株式会社レゾナック | 2023-12-21 | — | — | WO | disclosed |
| CN-112602174-B | Composition, method for cleaning adhesive polymer, method for manufacturing device wafer, and method for regenerating supporting wafer | 株式会社力森诺科 | 2023-12-08 | — | — | CN | disclosed |
| WO-2023234368-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | セントラル硝子株式会社 | 2023-12-07 | — | — | WO | disclosed |
| WO-2023234370-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | セントラル硝子株式会社 | 2023-12-07 | — | — | WO | disclosed |
| EP-4287240-A1 | SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER | Central Glass Company, Limited (JP) | 2023-12-06 | — | — | EP | disclosed |
| US-20230374669-A1 | Wet Etching Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-11-23 | — | — | US | disclosed |
| US-11817310-B2 | Bevel portion treatment agent composition and method of manufacturing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11807837-B2 | Composition, method for cleaning adhesive polymer, method for producing device wafer, and method for regenerating support wafer | RESONAC CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| WO-2023203867-A1 | AQUEOUS MULTI-COMPONENT POLYURETHANE COATING COMPOSITION | 関西ペイント株式会社 | 2023-10-26 | — | — | WO | disclosed |
| WO-2023203680-A1 | POLISHING AGENT AND POLISHING METHOD | 株式会社レゾナック | 2023-10-26 | — | — | WO | disclosed |
| WO-2023204123-A1 | COMPOUND, ACID GENERATOR COMPRISING SAID COMPOUND, PHOTORESIST, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAID PHOTORESIST | サンアプロ株式会社 | 2023-10-26 | — | — | WO | disclosed |
| US-11795335-B2 | Resin composition for modeling material, light curing molding ink set, and method for manufacturing optically shaped article | MAXELL, LTD. (JP) | 2023-10-24 | — | — | US | disclosed |
| CN-116917295-A | Metal complexes with 4-H, 6-H or 8-H-dihydroazulene ligands and uses thereof | 优米科尔股份公司及两合公司 | 2023-10-20 | — | — | CN | disclosed |
| WO-2023199841-A1 | COMPOUND, ACID GENERATOR CONTAINING SAID COMPOUND, PHOTORESIST, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING SAID PHOTORESIST | サンアプロ株式会社 | 2023-10-19 | — | — | WO | disclosed |
| EP-4259734-A1 | PRE-TREATMENT LIQUID FOR USE IN INK JET PRINTING | Canon Production Printing Holding B.V. (NL) | 2023-10-18 | — | — | EP | disclosed |
| US-11781026-B2 | Aqueous ink composition | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2023-10-10 | — | — | US | disclosed |
| US-11781092-B2 | Composition, and method for cleaning adhesive polymer | RESONAC CORPORATION (JP) | 2023-10-10 | — | — | US | disclosed |
| WO-2023189304-A1 | AQUEOUS MULTI-COMPONENT POLYURETHANE COATING COMPOSITION | 関西ペイント株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230312966-A1 | PRE-TREATMENT LIQUID FOR USE IN INK JET PRINTING | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2023-10-05 | — | — | US | disclosed |
| CN-116802188-A | Noble metal complex with azulene-based ligand and use thereof | 优米科尔股份公司及两合公司 | 2023-09-22 | — | — | CN | disclosed |
| CN-111630633-B | Chemical solution for forming water-repellent protective film and method for treating surface of wafer | 中央硝子株式会社 | 2023-09-19 | — | — | CN | disclosed |
| CN-113423754-B | Curable resin composition, cured product, acid-modified maleimide resin, and curing agent | DIC株式会社 | 2023-09-19 | — | — | CN | disclosed |
| EP-3888927-B1 | METHOD FOR APPLYING AN IMAGE ONTO A RECORDING MEDIUM | CANON PRODUCTION PRINTING HOLDING BV (NL) | 2023-09-13 | — | — | EP | disclosed |
| CN-111699546-B | Water-repellent protective film forming agent and chemical solution for forming water-repellent protective film | 中央硝子株式会社 | 2023-09-12 | — | — | CN | disclosed |
| US-20230282473-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-09-07 | — | — | US | disclosed |
| US-20230282474-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-09-07 | — | — | US | disclosed |
| CN-116710597-A | Wet etching solution and wet etching method | 中央硝子株式会社 | 2023-09-05 | — | — | CN | disclosed |
| CN-116685715-A | Substrate, selective film deposition method, deposited film of organic substance, and organic substance | 中央硝子株式会社 | 2023-09-01 | — | — | CN | disclosed |
| US-11738585-B2 | Method for applying an image onto the recording medium and corresponding printing apparatus | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2023-08-29 | — | — | US | disclosed |
| CN-111512418-B | Surface treatment agent and method for producing surface-treated body | 中央硝子株式会社 | 2023-08-29 | — | — | CN | disclosed |
| CN-113272471-B | Substrate, selective film deposition method, deposited film of organic substance, and organic substance | 中央硝子株式会社 | 2023-07-18 | — | — | CN | disclosed |
| WO-2023127942-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | セントラル硝子株式会社 | 2023-07-06 | — | — | WO | disclosed |
| WO-2023120322-A1 | DECOMPOSITION CLEANING COMPOSITION AND METHOD FOR PRODUCING SAME | 株式会社レゾナック | 2023-06-29 | — | — | WO | disclosed |
| CN-116324036-A | Wet etching method | 中央硝子株式会社 | 2023-06-23 | — | — | CN | disclosed |
| US-11674046-B2 | Aqueous reaction liquid | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2023-06-13 | — | — | US | disclosed |
| US-20230174806-A1 | MODEL MATERIAL CLEAR COMPOSITION, MODEL MATERIAL COMPOSITION SET, AND COMPOSITION SET FOR OPTICAL SHAPING | MAXELL, LTD. (JP) | 2023-06-08 | — | — | US | disclosed |
| US-11670498-B2 | Surface treatment agent and surface-treated body manufacturing method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-06-06 | — | — | US | disclosed |
| EP-3677433-B1 | INKJET IMAGE FORMATION METHOD | KONICA MINOLTA INC (JP) | 2023-05-24 | — | — | EP | disclosed |
| EP-3578338-B1 | MODEL MATERIAL INK SET, SUPPORT MATERIAL COMPOSITION, INK SET, THREE-DIMENSIONAL SHAPED OBJECT, AND METHOD FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT | MAXELL LTD (JP) | 2023-05-10 | — | — | EP | disclosed |
| EP-3702387-B1 | PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-10 | — | — | EP | disclosed |
| WO-2023068516-A1 | LOW-WATER TYPE CARBON DIOXIDE ABSORBENT AND METHOD FOR CAPTURING CARBON DIOXIDE BY USING SAME | 주식회사 씨이텍 | 2023-04-27 | — | — | WO | disclosed |
| CN-114027309-B | Iodine-containing disinfectant containing polyvinylpyrrolidone and polyalcohol ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2023-04-25 | — | — | CN | disclosed |
| CN-115926162-A | Unsaturated group-containing polycarboxylic acid resin, process for producing the same, photosensitive resin composition, and cured product thereof | 日本化药株式会社 | 2023-04-07 | — | — | CN | disclosed |
| CN-115926058-A | Polyamide-imide (meth) acrylate resin, active energy ray-curable resin composition, and cured product thereof | 日本化药株式会社 | 2023-04-07 | — | — | CN | disclosed |
| CN-115933312-A | Colored photosensitive composition, cured product, and image display device | 日本化药株式会社 | 2023-04-07 | — | — | CN | disclosed |
| US-20230100703-A1 | MODEL MATERIAL CLEAR COMPOSITION AND COMPOSITION SET FOR OPTICAL SHAPING | MAXELL, LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| US-20230094224-A1 | POLISHING AGENT, STOCK SOLUTION FOR POLISHING AGENT, AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| EP-4155376-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | disclosed |
| EP-4155375-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | disclosed |
| CN-110773401-B | Method for repairing and coating coated body | 关西涂料株式会社 | 2023-03-17 | — | — | CN | disclosed |
| US-11597786-B2 | Composition for model material | MAXELL, LTD. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20230039366-A1 | COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER | SHOWA DENKO K.K. (JP) | 2023-02-09 | — | — | US | disclosed |
| CN-115699259-A | Surface treatment method for semiconductor substrate and surface treatment agent composition | 中央硝子株式会社 | 2023-02-03 | — | — | CN | disclosed |
| WO-2023007941-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SPECIFIC COPOLYMER | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| WO-2023007972-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| CN-115668459-A | Surface treatment method for semiconductor substrate and surface treatment agent composition | 中央硝子株式会社 | 2023-01-31 | — | — | CN | disclosed |
| CN-115551934-A | Curable resin composition, cured film formed therefrom, and electronic device having cured film | 三星SDI株式会社 | 2022-12-30 | — | — | CN | disclosed |
| WO-2022255216-A1 | AQUEOUS COATING COMPOSITION AND METHOD FOR PRODUCING COATED ARTICLE | 日本ペイント株式会社 | 2022-12-08 | — | — | WO | disclosed |
| EP-4098643-A1 | PRECIOUS METAL COMPLEXES WITH DIHYDROGUAJAZULENYL LIGANDS AND THEIR USE | UMICORE AG & Co. KG (DE) | 2022-12-07 | — | — | EP | disclosed |
| CN-115427547-A | Composition and method for cleaning adhesive polymer | 昭和电工株式会社 | 2022-12-02 | — | — | CN | disclosed |
| US-20220380704-A1 | METHOD FOR PRODUCING DECOMPOSING/CLEANING COMPOSITION | RESONAC CORPORATION (JP) | 2022-12-01 | — | — | US | disclosed |
| CN-115397775-A | Method for producing organic solvent dispersion sol of surface-modified silica particles | 日产化学株式会社 | 2022-11-25 | — | — | CN | disclosed |
| WO-2022244593-A1 | DECOMPOSING/CLEANING COMPOSITION, METHOD FOR PRODUCING SAME, AND METHOD FOR CLEANING ADHESIVE POLYMER | 昭和電工株式会社 | 2022-11-24 | — | — | WO | disclosed |
| EP-3696202-B1 | RESIN COMPOSITION FOR MODEL MATERIALS, RESIN COMPOSITION FOR SUPPORT MATERIALS, OPTICALLY SHAPED ARTICLE AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLESHAPED ARTICLE AND MEHTOD FOR PRODUCING OPTOCALLY SHAPED ARTICLE | MAXELL LTD (JP) | 2022-11-23 | — | — | EP | disclosed |
| CN-113264856-B | Sulfonium salt, photoacid generator, and photosensitive composition | 东京应化工业株式会社 | 2022-11-22 | — | — | CN | disclosed |
| CN-110157311-B | Aqueous two-component polyurethane coating composition | 关西涂料株式会社 | 2022-11-15 | — | — | CN | disclosed |
| US-11485067-B2 | Resin composition for modeling material, resin composition for supporting material, photofabrication product, and process for producing photofabrication product | MAXELL, LTD. (JP) | 2022-11-01 | — | — | US | disclosed |
| US-20220325156-A1 | Surface Treatment Agent and Method for Manufacturing Surface Treatment Body | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-10-13 | — | — | US | disclosed |
| WO-2022208663-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION | 昭和電工マテリアルズ株式会社 | 2022-10-06 | — | — | WO | disclosed |
| CN-114208818-B | Iodine-containing disinfectant containing polyol ether and/or cyclic ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-10-04 | — | — | CN | disclosed |
| US-11459475-B2 | Retardation of primer and ink absorption to postpone cockling by temperature switchable pre-treatment liquid | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2022-10-04 | — | — | US | disclosed |
| US-20220306809-A1 | CURABLE RESIN COMPOSITION, THIN FILM, AND COLOR CONVERSION PANEL AND DISPLAY DEVICE INCLUDING THIN FILM | SAMSUNG SDI CO., LTD. (KR) | 2022-09-29 | — | — | US | disclosed |
| CN-115109413-A | Curable resin composition, film, color conversion panel, and display device | 三星SDI株式会社 | 2022-09-27 | — | — | CN | disclosed |
| US-20220290078-A1 | COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER | SHOWA DENKO K.K. (JP) | 2022-09-15 | — | — | US | disclosed |
| CN-111410902-B | Aqueous multi-component polyurethane coating compositions | 关西涂料株式会社 | 2022-09-06 | — | — | CN | disclosed |
| US-20220275247-A1 | ADHESIVE CONDUCTIVE PASTE | DAICEL CORPORATION (JP) | 2022-09-01 | — | — | US | disclosed |
| EP-3757176-B1 | INK JET COATING COMPOSITION | CANON PRODUCTION PRINTING HOLDING BV (NL) | 2022-08-31 | — | — | EP | disclosed |
| US-11427022-B2 | Ink jet coating composition | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2022-08-30 | — | — | US | disclosed |
| WO-2022175112-A1 | NOBLE METAL COMPLEXES WITH DIHYDROAZULENYL LIGANDS AND USE THEREOF | UMICORE AG & CO. KG (DE) | 2022-08-25 | — | — | WO | disclosed |
| WO-2022175111-A1 | METAL COMPLEXES HAVING 4-H, 6-H OR 8-H DIHYDROAZULENYL LIGANDS AND USE THEREOF | UMICORE AG & CO. KG (DE) | 2022-08-25 | — | — | WO | disclosed |
| EP-4047003-A1 | METAL COMPLEXES WITH 4-H-, 6-H- OR 8-H-DIHYDROAZULENYL LIGANDS AND THEIR USE | UMICORE AG & Co. KG (DE) | 2022-08-24 | — | — | EP | disclosed |
| WO-2022168632-A1 | PHOTOACID GENERATOR AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY | サンアプロ株式会社 | 2022-08-11 | — | — | WO | disclosed |
| WO-2022163825-A1 | SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER | セントラル硝子株式会社 | 2022-08-04 | — | — | WO | disclosed |
| WO-2022149565-A1 | WET ETCHING SOLUTION AND WET ETCHING METHOD | セントラル硝子株式会社 | 2022-07-14 | — | — | WO | disclosed |
| CN-114746536-A | Method for producing decomposition cleaning composition | 昭和电工株式会社 | 2022-07-12 | — | — | CN | disclosed |
| US-20220213335-A1 | RESIN COMPOSITION FOR MODELING MATERIAL, LIGHT CURING MOLDING INK SET, AND METHOD FOR MANUFACTURING OPTICALLY SHAPED ARTICLE | MAXELL LTD (JP) | 2022-07-07 | — | — | US | disclosed |
| CN-111093949-B | Composition for mold material | 麦克赛尔株式会社 | 2022-06-24 | — | — | CN | disclosed |
| CN-107229184-B | Colored photosensitive composition, colored cured product obtained therefrom, display element, and method for producing colored cured product | 东京应化工业株式会社 | 2022-06-24 | — | — | CN | disclosed |
| WO-2022128573-A1 | PRE-TREATMENT LIQUID FOR USE IN INK JET PRINTING | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2022-06-23 | — | — | WO | disclosed |
| US-20220186061-A1 | PRE-TREATMENT LIQUID FOR USE IN INK JET PRINTING | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2022-06-16 | — | — | US | disclosed |
| US-20220187517-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND WAVELENGTH CONVERSION RESIN COMPOSITION | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2022-06-16 | — | — | US | disclosed |
| EP-4011989-A1 | PRE-TREATMENT LIQUID FOR USE IN INK JET PRINTING | Canon Production Printing Holding B.V. (NL) | 2022-06-15 | — | — | EP | disclosed |
| EP-4011990-A1 | PRE-TREATMENT LIQUID FOR USE IN INK JET PRINTING | Canon Production Printing Holding B.V. (NL) | 2022-06-15 | — | — | EP | disclosed |
| EP-4012726-A1 | ADHESIVE CONDUCTIVE PASTE | Daicel Corporation (JP) | 2022-06-15 | — | — | EP | disclosed |
| EP-3351367-B1 | RESIN COMPOSITION FOR MODELING MATERIAL, LIGHT CURING MOLDING INK SET, AND METHOD FOR MANUFACTURING OPTICALLY SHAPED ARTICLE | MAXELL LTD (JP) | 2022-06-15 | — | — | EP | disclosed |
| US-20220179138-A1 | WAVELENGTH CONVERSION MEMBER AND UTILIZATION THEREOF, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| WO-2022118624-A1 | URETHANIZATION REACTION CATALYST, URETHANE COMPOUND, CURABLE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING URETHANE COMPOUND | DIC株式会社 | 2022-06-09 | — | — | WO | disclosed |
| CN-108391449-B | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2022-05-17 | — | — | CN | disclosed |
| US-20220135815-A1 | AQUEOUS INK COMPOSITION | CANON PRODUCTION PRINTING HOLDING B.V. (NL) | 2022-05-05 | — | — | US | disclosed |
| EP-3992257-A1 | AQUEOUS INK COMPOSITION | Canon Production Printing Holding B.V. (NL) | 2022-05-04 | — | — | EP | disclosed |
| CN-107229185-B | Energy-sensitive composition, cured product, and method for producing cured product | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| CN-110407998-B | Composition for reducing aldehyde release, polyol product, polyurethane system, preparation method and application thereof | 奥斯佳材料科技(上海)有限公司 | 2022-04-08 | — | — | CN | disclosed |
| EP-3979004-A1 | SURFACE TREATMENT AGENT AND METHOD FOR MANUFACTURING SURFACE TREATMENT BODY | Central Glass Company, Limited (JP) | 2022-04-06 | — | — | EP | disclosed |
| CN-114269892-A | Composition and method for cleaning adhesive polymer | 昭和电工株式会社 | 2022-04-01 | — | — | CN | disclosed |
| CN-114270453-A | Adhesive conductor paste | 株式会社大赛璐 | 2022-04-01 | — | — | CN | disclosed |
| CN-114208818-A | Iodine-containing disinfectant containing polyol ether and/or cyclic ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-03-22 | — | — | CN | disclosed |
| US-11282709-B2 | Chemical agent for forming water repellent protective film and surface treatment method for wafers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-22 | — | — | US | disclosed |
| WO-2022054615-A1 | PHENOXY RESIN, RESIN COMPOSITION, CURED PRODUCT, LAMINATE FOR ELECTRIC/ELECTRONIC CIRCUITS, AND METHOD FOR PRODUCING PHENOXY RESIN | 日鉄ケミカル＆マテリアル株式会社 | 2022-03-17 | — | — | WO | disclosed |
| US-20220081575-A1 | SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-17 | — | — | US | disclosed |
| EP-3961676-A1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-02 | — | — | EP | disclosed |
| EP-3582252-B1 | POLISHING METHOD | SHOWA DENKO MATERIALS CO LTD (JP) | 2022-02-23 | — | — | EP | disclosed |
| US-11247502-B2 | Inkjet image formation method | Konica Minolta, Inc. (JP) | 2022-02-15 | — | — | US | disclosed |
| CN-114027309-A | Iodine-containing disinfectant containing polyvinylpyrrolidone and polyol ether and preparation method thereof | 佛山市正典生物技术有限公司 | 2022-02-11 | — | — | CN | disclosed |
| CN-114008538-A | Surface treatment agent and method for producing surface-treated body | 中央硝子株式会社 | 2022-02-01 | — | — | CN | disclosed |
| WO-2022019199-A1 | MULTI-LAYER COATED FILM AND MULTI-LAYER COATED FILM FORMING METHOD | 関西ペイント株式会社 | 2022-01-27 | — | — | WO | disclosed |
| US-20220020582-A1 | BEVEL PORTION TREATMENT AGENT COMPOSITION AND METHOD OF MANUFACTURING WAFER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-01-20 | — | — | US | disclosed |
| US-20210403782-A1 | NEW ANTIFREEZE AGENTS AND COOLANTS FOR FUEL CELLS, STORAGE BATTERIES AND BATTERIES | BASF SE (DE) | 2021-12-30 | — | — | US | disclosed |
| CN-107074759-B | Sulfonium salt, photoacid generator, and photosensitive composition | 东京应化工业株式会社 | 2021-12-14 | — | — | CN | disclosed |
| US-20210380862-A1 | NEW HEAT TRANSFER LIQUID FOR COOLING LITHIUM STORAGE BATTERIES | BASF SE (DE) | 2021-12-09 | — | — | US | disclosed |
| CN-113652134-A | Stain-resistant matte aqueous coating composition and method for forming stain-resistant matte coating film | 关西涂料株式会社 | 2021-11-16 | — | — | CN | disclosed |
| CN-113557610-A | Wavelength conversion member, backlight unit, image display device, and resin composition for wavelength conversion | 昭和电工材料株式会社 | 2021-10-26 | — | — | CN | disclosed |
| CN-113557456-A | Wavelength conversion member, application thereof, backlight unit and image display device | 昭和电工材料株式会社 | 2021-10-26 | — | — | CN | disclosed |
| US-11155717-B2 | Storage container storing liquid composition and method for storing liquid composition | FUJIFILM CORPORATION (JP) | 2021-10-26 | — | — | US | disclosed |
| US-20210317390-A1 | COMPOSITION, METHOD FOR CLEANING ADHESIVE POLYMER, METHOD FOR PRODUCING DEVICE WAFER, AND METHOD FOR REGENERATING SUPPORT WAFER | SHOWA DENKO K.K. (JP) | 2021-10-14 | — | — | US | disclosed |
| US-11136474-B2 | Polishing liquid and polishing method | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2021-10-05 | — | — | US | disclosed |
| US-20210292643-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION | SHOWA DENKO MATERIALS CO LTD (JP) | 2021-09-23 | — | — | US | disclosed |
| CN-113423754-A | Curable resin composition, cured product, acid-modified maleimide resin, and curing agent | DIC株式会社 | 2021-09-21 | — | — | CN | disclosed |
| CN-110198827-B | Ink set for mold material, support material composition, ink set, three-dimensional object, and method for producing three-dimensional object | 麦克赛尔控股株式会社 | 2021-09-21 | — | — | CN | disclosed |
| EP-3877482-A1 | NEW HEAT TRANSFER LIQUID FOR COOLING LITHIUM STORAGE BATTERIES | BASF SE (DE) | 2021-09-15 | — | — | EP | disclosed |
| EP-3877481-A1 | NEW ANTIFREEZE AGENTS AND COOLANTS FOR FUEL CELLS, STORAGE BATTERIES AND BATTERIES | BASF SE (DE) | 2021-09-15 | — | — | EP | disclosed |
| US-11111401-B2 | Light curing molding ink set, and method for manufacturing light cured article | MAXELL HOLDINGS, LTD. (JP) | 2021-09-07 | — | — | US | disclosed |
| CN-108727955-B | Multi-component water-based primer coating composition and coating method | 关西涂料株式会社 | 2021-08-31 | — | — | CN | disclosed |
| CN-109312045-B | Alcohol-modified polyamideimide resin and method for producing same | DIC株式会社 | 2021-08-24 | — | — | CN | disclosed |
| CN-113264856-A | Sulfonium salt, photoacid generator, and photosensitive composition | 东京应化工业株式会社 | 2021-08-17 | — | — | CN | disclosed |
| CN-113272471-A | Substrate, selective film deposition method, organic deposition film, and organic material | 中央硝子株式会社 | 2021-08-17 | — | — | CN | disclosed |
| EP-3351366-B1 | LIGHT CURING MOLDING INK SET, AND METHOD FOR MANUFACTURING LIGHT CURED ARTICLE | MAXELL HOLDINGS LTD (JP) | 2021-08-11 | — | — | EP | disclosed |
| CN-113169060-A | Chamfer treatment agent composition and method for producing wafer | 中央硝子株式会社 | 2021-07-23 | — | — | CN | disclosed |
| CN-113169248-A | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2021-07-23 | — | — | CN | disclosed |
| EP-3023449-B1 | POLYAMIDE-IMIDE RESIN, AND CURABLE RESIN COMPOSITION AND CURED PRODUCT OF SAME | DAINIPPON INK & CHEMICALS (JP) | 2021-07-14 | — | — | EP | disclosed |
| US-11061278-B2 | Wavelength conversion member, back light unit, image display device, resin composition for wavelength conversion, and resin cured product for wavelength conversion | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| CN-113015776-A | Novel heat transfer liquid for cooling lithium storage batteries | 巴斯夫欧洲公司 | 2021-06-22 | — | — | CN | disclosed |
| CN-112969770-A | Novel antifreeze and coolant for fuel cells, storage cells and batteries | 巴斯夫欧洲公司 | 2021-06-15 | — | — | CN | disclosed |
| US-11034860-B2 | Polishing agent, stock solution for polishing agent, and polishing method | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2021-06-15 | — | — | US | disclosed |
| EP-3216783-B1 | SULFONATE COMPOUND, PHOTOACID GENERATOR, AND PHOTOLITHOGRAPHIC RESIN COMPOSITION | SAN APRO LTD (JP) | 2021-06-09 | — | — | EP | disclosed |
| WO-2021106460-A1 | METHOD FOR PRODUCING DECOMPOSING/CLEANING COMPOSITION | 昭和電工株式会社 | 2021-06-03 | — | — | WO | disclosed |
| CN-112888676-A | Photoacid generators and resin compositions for lithography | 三亚普罗股份有限公司 | 2021-06-01 | — | — | CN | disclosed |
| CN-106795107-B | Sulfonate compound, photoacid generator, and resin composition for lithography | 三亚普罗股份有限公司 | 2021-05-28 | — | — | CN | disclosed |
| US-20210139769-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, CURABLE COMPOSITION AND CURED PRODUCT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-20210139768-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, AND CURABLE COMPOSITION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| WO-2021084603-A1 | RESIN COMPOSITION FOR WAVELENGTH CONVERSION, CURED RESIN MATERIAL FOR WAVELENGTH CONVERSION, WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE | 昭和電工マテリアルズ株式会社 | 2021-05-06 | — | — | WO | disclosed |
| CN-108025486-B | Resin composition for mold material, ink set for stereolithography, and method for producing stereolithography product | 麦克赛尔控股株式会社 | 2021-05-04 | — | — | CN | disclosed |
| CN-108025492-B | Ink set for photo-molding and method for producing photo-molded article | 麦克赛尔控股株式会社 | 2021-05-04 | — | — | CN | disclosed |
| CN-112602174-A | Composition, method for cleaning adhesive polymer, method for manufacturing device wafer, and method for recycling support wafer | 昭和电工株式会社 | 2021-04-02 | — | — | CN | disclosed |
| US-20210090881-A1 | SURFACE TREATMENT AGENT AND SURFACE-TREATED BODY MANUFACTURING METHOD | CENTRAL GLASS COMPANY, LIMITED (JP) | 2021-03-25 | — | — | US | disclosed |
| US-10946494-B2 | Polishing agent, stock solution for polishing agent, and polishing method | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2021-03-16 | — | — | US | disclosed |
| US-10947414-B2 | Compositions for use in chemical mechanical polishing | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2021-03-16 | — | — | US | disclosed |
| WO-2021039274-A1 | COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER | 昭和電工株式会社 | 2021-03-04 | — | — | WO | disclosed |
| US-20210040383-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE AND CURABLE COMPOSITION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2021-02-11 | — | — | US | disclosed |
| EP-3767345-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE AND CURABLE COMPOSITION | Hitachi Chemical Company, Ltd. (JP) | 2021-01-20 | — | — | EP | disclosed |
| CN-112230319-A | Wavelength conversion member, backlight unit, image display device, wavelength conversion resin composition, and wavelength conversion resin cured product | 日立化成株式会社 | 2021-01-15 | — | — | CN | disclosed |
| EP-3761076-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE AND CURABLE COMPOSITION | Hitachi Chemical Company, Ltd. (JP) | 2021-01-06 | — | — | EP | disclosed |
| EP-3761077-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, CURABLE COMPOSITION AND CURED PRODUCT | Hitachi Chemical Company, Ltd. (JP) | 2021-01-06 | — | — | EP | disclosed |
| CN-112180488-A | Wavelength conversion member, backlight unit, image display device, wavelength conversion resin composition, and wavelength conversion resin cured product | 日立化成株式会社 | 2021-01-05 | — | — | CN | disclosed |
| CN-111971591-A | Wavelength conversion member, backlight unit, image display device, and curable composition | 日立化成株式会社 | 2020-11-20 | — | — | CN | disclosed |
| CN-111919142-A | Wavelength conversion member, backlight unit, image display device, curable composition, and cured product | 日立化成株式会社 | 2020-11-10 | — | — | CN | disclosed |
| CN-111902744-A | Wavelength conversion member, backlight unit, image display device, and curable composition | 日立化成株式会社 | 2020-11-06 | — | — | CN | disclosed |
| US-20200350176-A1 | CHEMICAL AGENT FOR FORMING WATER REPELLENT PROTECTIVE FILM AND SURFACE TREATMENT METHOD FOR WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-11-05 | — | — | US | disclosed |
| US-20200339850-A1 | CHEMICAL SOLUTION FOR FORMING WATER-REPELLENT PROTECTIVE FILM, METHOD FOR PREPARING SAME, AND METHOD FOR MANUFACTURING SURFACE-TREATED BODY | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-10-29 | — | — | US | disclosed |
| US-20200339611-A1 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-10-29 | — | — | US | disclosed |
| US-10796921-B2 | CMP fluid and method for polishing palladium | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2020-10-06 | — | — | US | disclosed |
| CN-111742391-A | Chemical solution for forming water-repellent protective film, method for producing same, and method for producing surface-treated body | 中央硝子株式会社 | 2020-10-02 | — | — | CN | disclosed |
| EP-3715094-A1 | COMPOSITION FOR MODEL MATERIAL | Maxell Holdings, Ltd. (JP) | 2020-09-30 | — | — | EP | disclosed |
| CN-111699546-A | Water-repellent protective film forming agent, chemical solution for forming water-repellent protective film, and method for surface treatment of wafer | 中央硝子株式会社 | 2020-09-22 | — | — | CN | disclosed |
| US-20200282636-A1 | COMPOSITION FOR MODEL MATERIAL | MAXELL, LTD. (JP) | 2020-09-10 | — | — | US | disclosed |
| EP-3330306-B1 | RESIN COMPOSITION FOR SUPPORTING MATERIAL, PHOTOFABRICATION PRODUCT, AND PROCESS FOR PRODUCING PHOTOFABRICATION PRODUCT | MAXELL HOLDINGS LTD (JP) | 2020-09-09 | — | — | EP | disclosed |
| CN-111624852-A | Photosensitive resin composition and method for etching glass substrate | 东京应化工业株式会社 | 2020-09-04 | — | — | CN | disclosed |
| CN-111630633-A | Chemical solution for forming water-repellent protective film and method for surface treatment of wafer | 中央硝子株式会社 | 2020-09-04 | — | — | CN | disclosed |
| EP-3702387-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-09-02 | — | — | EP | disclosed |
| WO-2020166212-A1 | CURABLE RESIN COMPOSITION, CURED PRODUCT, ACID-MODIFIED MALEIMIDE RESIN, AND CURING AGENT | DIC株式会社 | 2020-08-20 | — | — | WO | disclosed |
| EP-3696202-A1 | RESIN COMPOSITION FOR MODEL MATERIALS, RESIN COMPOSITION FOR SUPPORT MATERIALS, OPTICALLY SHAPED ARTICLE AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLESHAPED ARTICLE AND MEHTOD FOR PRODUCING OPTOCALLY SHAPED ARTICLE | Maxell Holdings, Ltd. (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-20200255598-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2020-08-13 | — | — | US | disclosed |
| US-10729623-B2 | Method for producing elliptical, needle-shaped, or rod-shaped polymer particles | NISSHINBO HOLDINGS, INC. (JP) | 2020-08-04 | — | — | US | disclosed |
| US-20200241361-A1 | WAVELENGTH CONVERSION MEMBER, BACK LIGHT UNIT, IMAGE DISPLAY DEVICE, RESIN COMPOSITION FOR WAVELENGTH CONVERSION, AND RESIN CURED PRODUCT FOR WAVELENGTH CONVERSION | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111410902-A | Aqueous multi-component polyurethane coating compositions | 关西涂料株式会社 | 2020-07-14 | — | — | CN | disclosed |
| EP-3677433-A1 | INKJET IMAGE FORMATION METHOD | Konica Minolta, Inc. (JP) | 2020-07-08 | — | — | EP | disclosed |
| WO-2020137132-A1 | RESIN COMPOSITION, INK FOR INK JET PRINTING, AND ARTICLE HAVING RESIN FILM | 日立化成株式会社 | 2020-07-02 | — | — | WO | disclosed |
| CN-111349201-A | Resin composition for support material and method for producing stereolithography product | 麦克赛尔控股株式会社 | 2020-06-30 | — | — | CN | disclosed |
| US-20200180337-A1 | INKJET IMAGE FORMATION METHOD | Konica Minolta, Inc. (JP) | 2020-06-11 | — | — | US | disclosed |
| CN-111183376-A | Wavelength conversion member, backlight unit, image display device, wavelength conversion resin composition, and wavelength conversion resin cured product | 日立化成株式会社 | 2020-05-19 | — | — | CN | disclosed |
| CN-111149022-A | Wavelength conversion member, backlight unit, image display device, wavelength conversion resin composition, and wavelength conversion resin cured product | 日立化成株式会社 | 2020-05-12 | — | — | CN | disclosed |
| CN-107406752-B | Polishing agent, stock solution for polishing agent, and polishing method | 日立化成株式会社 | 2020-05-08 | — | — | CN | disclosed |
| CN-111093949-A | Composition for mold material | 麦克赛尔控股株式会社 | 2020-05-01 | — | — | CN | disclosed |
| CN-110874026-A | Stripping liquid composition for color filter and method for using same | 易案爱富科技有限公司 | 2020-03-10 | — | — | CN | disclosed |
| CN-107614542-B | Method for producing elliptical, needle-like or rod-like polymer particles | 日清纺控股株式会社 | 2020-03-03 | — | — | CN | disclosed |
| CN-110773401-A | Method for repairing and coating coated body | 关西涂料株式会社 | 2020-02-11 | — | — | CN | disclosed |
| CN-110776830-A | Polishing composition for chemical mechanical polishing process | 台湾积体电路制造股份有限公司 | 2020-02-11 | — | — | CN | disclosed |
| US-20200040221-A1 | COMPOSITIONS FOR USE IN CHEMICAL MECHANICAL POLISHING | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-02-06 | — | — | US | disclosed |
| US-10543454-B2 | Carbon dioxide absorbent | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2020-01-28 | — | — | US | disclosed |
| EP-3199520-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-12-25 | — | — | EP | disclosed |
| EP-3578338-A1 | MODEL MATERIAL INK SET, SUPPORT MATERIAL COMPOSITION, INK SET, THREE-DIMENSIONAL SHAPED OBJECT, AND METHOD FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT | Maxell Holdings, Ltd. (JP) | 2019-12-11 | — | — | EP | disclosed |
| US-20190352537-A1 | POLISHING LIQUID AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2019-11-21 | — | — | US | disclosed |
| WO-2019216174-A1 | PHOTOACID GENERATOR AND PHOTOLITHOGRAPHIC RESIN COMPOSITION | サンアプロ株式会社 (JP) | 2019-11-14 | — | — | WO | disclosed |
| US-20190341246-A1 | Chemical Liquid for Forming Water Repellent Protective Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2019-11-07 | — | — | US | disclosed |
| US-10450266-B2 | Sulfonate compound, photoacid generator, and resin composition for photolithography | SAN-APRO LIMITED (JP) | 2019-10-22 | — | — | US | disclosed |
| WO-2019176144-A1 | COMPOSITION FOR MODEL MATERIAL | マクセルホールディングス株式会社 | 2019-09-19 | — | — | WO | disclosed |
| CN-110198827-A | Ink set for mold material, support material composition, ink set, three-dimensional object, and method for producing three-dimensional object | 麦克赛尔控股株式会社 | 2019-09-03 | — | — | CN | disclosed |
| CN-110157311-A | Aqueous double-formulation polyurethane coating composition | 关西涂料株式会社 | 2019-08-23 | — | — | CN | disclosed |
| US-10312402-B2 | P-type diffusion layer forming composition | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2019-06-04 | — | — | US | disclosed |
| CN-109791234-A | Wavelength conversion material, backlight unit, image display device, and curable composition | 日立化成株式会社 | 2019-05-21 | — | — | CN | disclosed |
| US-10283373-B2 | CMP polishing liquid and polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2019-05-07 | — | — | US | disclosed |
| US-20190112489-A1 | STORAGE CONTAINER STORING LIQUID COMPOSITION AND METHOD FOR STORING LIQUID COMPOSITION | FUJIFILM CORPORATION (JP) | 2019-04-18 | — | — | US | disclosed |
| US-20190085193-A1 | INKJET RECORDING METHOD | Konica Minolta, Inc. (JP) | 2019-03-21 | — | — | US | disclosed |
| CN-105542571-B | Printing ink composition | 奥西-技术有限公司 | 2019-03-12 | — | — | CN | disclosed |
| US-20190074173-A1 | Water-Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water-Repellent Protective Film, and Wafer Cleaning Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2019-03-07 | — | — | US | disclosed |
| US-10202493-B2 | Polyamide-imide resin, and curable resin composition and cured product of same | DIC CORPORATION (JP) | 2019-02-12 | — | — | US | disclosed |
| EP-3431302-A1 | INKJET RECORDING METHOD | Konica Minolta, Inc. (JP) | 2019-01-23 | — | — | EP | disclosed |
| US-20190009453-A1 | RESIN COMPOSITION FOR MODELING MATERIAL, RESIN COMPOSITION FOR SUPPORTING MATERIAL, PHOTOFABRICATION PRODUCT, AND PROCESS FOR PRODUCING PHOTOFABRICATION PRODUCT | MAXELL, LTD. (JP) | 2019-01-10 | — | — | US | disclosed |
| US-10119049-B2 | Polishing agent, storage solution for polishing agent and polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2018-11-06 | — | — | US | disclosed |
| CN-108727955-A | The water-borne primer coating composition and coating process of multicomponent type | 关西涂料株式会社 | 2018-11-02 | — | — | CN | disclosed |
| US-10099172-B2 | Carbon dioxide absorbent comprising triamine | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2018-10-16 | — | — | US | disclosed |
| US-10090148-B2 | Water-repellent protective film, and chemical solution for forming protective film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2018-10-02 | — | — | US | disclosed |
| CN-105612606-B | Wafer Cleaning Method | 中央硝子株式会社 | 2018-09-21 | — | — | CN | disclosed |
| US-20180265720-A1 | LIGHT CURING MOLDING INK SET, AND METHOD FOR MANUFACTURING LIGHT CURED ARTICLE | HITACHI MAXELL, LTD. (JP) | 2018-09-20 | — | — | US | disclosed |
| US-10077365-B2 | Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2018-09-18 | — | — | US | disclosed |
| US-20180257023-A1 | CARBON DIOXIDE ABSORBENT | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2018-09-13 | — | — | US | disclosed |
| US-20180258297-A1 | RESIN COMPOSITION FOR MODELING MATERIAL, LIGHT CURING MOLDING INK SET, AND METHOD FOR MANUFACTURING OPTICALLY SHAPED ARTICLE | MAXELL, LTD. (JP) | 2018-09-13 | — | — | US | disclosed |
| US-10059662-B2 | Sulfonium salt, photoacid generator, and photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-08-28 | — | — | US | disclosed |
| CN-108431647-A | Curable composition, wavelength conversion material, backlight unit, and image display device | 日立化成株式会社 | 2018-08-21 | — | — | CN | disclosed |
| CN-108391449-A | The manufacturing method of semiconductor element and the manufacturing method of solar cell | 东丽株式会社 | 2018-08-10 | — | — | CN | disclosed |
| US-10037882-B2 | Method for cleaning wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2018-07-31 | — | — | US | disclosed |
| EP-3351367-A1 | MODEL MATERIAL RESIN COMPOSITION, INK SET FOR OPTICAL SHAPING, AND METHOD FOR MANUFACTURING OPTICALLY SHAPED ARTICLE | Maxell Holdings, Ltd. (JP) | 2018-07-25 | — | — | EP | disclosed |
| EP-3351366-A1 | OPTICAL SHAPING INK SET, AND METHOD FOR MANUFACTURING OPTICALLY SHAPED ARTICLE | Maxell Holdings, Ltd. (JP) | 2018-07-25 | — | — | EP | disclosed |
| US-20180179417-A1 | POLISHING AGENT, STORAGE SOLUTION FOR POLISHING AGENT AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| CN-105047545-B | The manufacturing method of solar cell | 日立化成株式会社 | 2018-06-15 | — | — | CN | disclosed |
| EP-3330306-A1 | RESIN COMPOSITION FOR MODEL MATERIALS, RESIN COMPOSITION FOR SUPPORT MATERIALS, OPTICALLY SHAPED ARTICLE AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE | Maxell Holdings, Ltd. (JP) | 2018-06-06 | — | — | EP | disclosed |
| CN-104137227-B | N-type diffusion layer forms with composition, has the manufacturing method of semiconductor substrate of n-type diffusion layer and the manufacturing method of solar cell device | 日立化成株式会社 | 2018-05-18 | — | — | CN | disclosed |
| CN-103718309-B | Semiconductor substrate, method for manufacturing same, solar cell element, and solar cell | 日立化成株式会社 | 2018-05-18 | — | — | CN | disclosed |
| CN-108026225-A | Resin composition for mold material, resin composition for support material, stereolithography article, and method for producing stereolithography article | 麦克赛尔控股株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-108025486-A | Model timber-used resin combination, light chisel ink group and the manufacture method of light chisel product | 麦克赛尔控股株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-108025492-A | Light chisel ink group and the manufacture method of light chisel product | 麦克赛尔控股株式会社 | 2018-05-11 | — | — | CN | disclosed |
| US-20180104160-A1 | METHOD FOR PRODUCING ELLIPTICAL, NEEDLE-SHAPED, OR ROD-SHAPED POLYMER PARTICLES | NISSHINBO HOLDINGS, INC. (JP) | 2018-04-19 | — | — | US | disclosed |
| US-9944827-B2 | CMP polishing solution and polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2018-04-17 | — | — | US | disclosed |
| EP-3296327-A1 | METHOD FOR PRODUCING ELLIPTICAL, NEEDLE-SHAPED, OR ROD-SHAPED POLYMER PARTICLES | Nisshinbo Holdings Inc. (JP) | 2018-03-21 | — | — | EP | disclosed |
| CN-104176393-B | Pressurized delivered container, the keeping method for having used it and liquid relief method | 中央硝子株式会社 | 2018-03-16 | — | — | CN | disclosed |
| US-20180043497-A1 | Polishing Agent, Stock Solution for Polishing Agent, and Polishing Method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| EP-3282470-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD OF FORMING N-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL | Hitachi Chemical Company, Ltd. (JP) | 2018-02-14 | — | — | EP | disclosed |
| CN-104040701-B | Semiconductor substrate with passivation film and method for manufacturing same, and solar cell element and method for manufacturing same | 日立化成株式会社 | 2018-01-26 | — | — | CN | disclosed |
| CN-107614542-A | Method for producing elliptical, needle-like or rod-like polymer particles | 日清纺控股株式会社 | 2018-01-19 | — | — | CN | disclosed |
| CN-104488069-B | Composition for forming passivation layer, semiconductor substrate with passivation layer, method for manufacturing semiconductor substrate with passivation layer, solar cell element, method for manufacturing solar cell element, and solar cell | 日立化成株式会社 | 2018-01-19 | — | — | CN | disclosed |
| EP-2876671-B1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL CO LTD (JP) | 2017-11-22 | — | — | EP | disclosed |
| CN-104428901-B | Solar cell device and its manufacture method | 日立化成株式会社 | 2017-11-03 | — | — | CN | disclosed |
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-26 | — | — | US | disclosed |
| CN-107229184-A | Coloring photosensitive combination, staining and curing thing therefrom, the manufacture method of display element and staining and curing thing | 东京应化工业株式会社 | 2017-10-03 | — | — | CN | disclosed |
| CN-107229185-A | The manufacture method of energy sensitivities composition, solidfied material and solidfied material | 东京应化工业株式会社 | 2017-10-03 | — | — | CN | disclosed |
| EP-2662883-B1 | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | HITACHI CHEMICAL CO LTD (JP) | 2017-09-27 | — | — | EP | disclosed |
| EP-3216783-A1 | SULFONATE COMPOUND, PHOTOACID GENERATOR, AND PHOTOLITHOGRAPHIC RESIN COMPOSITION | San-Apro Ltd. (JP) | 2017-09-13 | — | — | EP | disclosed |
| CN-107148662-A | The manufacture method of n-type diffusion layer formation composition, the manufacture method of n-type diffusion layer and solar cell device | 日立化成株式会社 | 2017-09-08 | — | — | CN | disclosed |
| US-20170246587-A1 | CARBON DIOXIDE ABSORBENT COMPRISING TRIAMINE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2017-08-31 | — | — | US | disclosed |
| EP-2562793-B1 | METHOD FOR PRODUCING p-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING SOLAR CELL ELEMENT | HITACHI CHEMICAL CO LTD (JP) | 2017-08-30 | — | — | EP | disclosed |
| CN-107093550-A | The manufacture method of n-type diffusion layer formation composition, the manufacture method of n-type diffusion layer and solar cell device | 日立化成株式会社 | 2017-08-25 | — | — | CN | disclosed |
| CN-107074759-A | Sulfonium salt, photoacid generator, and photosensitive composition | 东京应化工业株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-107068540-A | The cleaning method of chip | 中央硝子株式会社 | 2017-08-18 | — | — | CN | disclosed |
| US-20170233336-A1 | SULFONATE COMPOUND, PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY | SAN-APRO LIMITED (JP) | 2017-08-17 | — | — | US | disclosed |
| US-20170225118-A1 | CARBON DIOXIDE ABSORBENT COMPRISING OXYGEN-CONTAINING DIAMINE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2017-08-10 | — | — | US | disclosed |
| EP-3203500-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | Hitachi Chemical Company, Ltd. (JP) | 2017-08-09 | — | — | EP | disclosed |
| EP-2592120-B1 | AQUEOUS INKJET INK, AND METHOD FOR FORMING INKJET IMAGE | KONICA MINOLTA HOLDINGS INC (JP) | 2017-08-02 | — | — | EP | disclosed |
| EP-3199520-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2017-08-02 | — | — | EP | disclosed |
| CN-104488088-B | Solar cell device and its manufacture method and solar module | 日立化成株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-102859659-B | The manufacture method of p-diffusion layer formation composition, the manufacture method of p-diffusion layer and solar cell device | 日立化成工业株式会社 | 2017-07-28 | — | — | CN | disclosed |
| US-9714262-B2 | Composition for forming passivation layer, semiconductor substrate having passivation layer, method of producing semiconductor substrate having passivation layer, photovoltaic cell element, method of producing photovoltaic cell element and photovoltaic cell | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| EP-2479199-B1 | POLYETHER ESTER COMPOSITION, POLYURETHANE RESIN COMPOSITION, AND OPTICAL MATERIAL USING SAME | DAINIPPON INK & CHEMICALS (JP) | 2017-07-19 | — | — | EP | disclosed |
| CN-106935664-A | Passivation layer is formed with composition, semiconductor substrate and manufacture method, solar cell device and manufacture method, solar cell | 日立化成株式会社 | 2017-07-07 | — | — | CN | disclosed |
| US-20170154787-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| CN-104900724-B | Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, and method for producing photovoltaic cell | 日立化成工业株式会社 | 2017-05-10 | — | — | CN | disclosed |
| CN-103155166-B | Method for producing solar cell | 日立化成株式会社 | 2017-05-03 | — | — | CN | disclosed |
| CN-104508831-B | Solar cell element, production method therefor, and solar cell module | 日立化成株式会社 | 2017-05-03 | — | — | CN | disclosed |
| CN-103283004-B | Wafer Cleaning Method | 中央硝子株式会社 | 2017-04-12 | — | — | CN | disclosed |
| US-9608143-B2 | Composition for forming N-type diffusion layer, method of forming N-type diffusion layer, and method of producing photovoltaic cell | HITACHI CHEMICAL CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| CN-106537559-A | Method for manufacturing semiconductor substrate having n-type diffusion layer, and method for manufacturing solar cell element | 日立化成株式会社 | 2017-03-22 | — | — | CN | disclosed |
| US-20170062203-A1 | Method of Preparing Liquid Chemical for Forming Protective Film | CENTRAL GLASS CO LTD (JP) | 2017-03-02 | — | — | US | disclosed |
| CN-106471626-A | Composition for forming passivation layer, semiconductor substrate with passivation layer and manufacturing method thereof, solar cell element and manufacturing method thereof, and solar cell | 日立化成株式会社 | 2017-03-01 | — | — | CN | disclosed |
| US-20160368879-A1 | PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY | SAN-APRO LTD. (JP) | 2016-12-22 | — | — | US | disclosed |
| US-9520529-B2 | Composition for forming P-type diffusion layer, method of forming P-type diffusion layer, and method of producing photovoltaic cell | HITACHI CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| US-20160359078-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE WITH N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL ELEMENT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-12-08 | — | — | US | disclosed |
| CN-104471715-B | Composition for forming passivation layer, semiconductor substrate with passivation layer and method for manufacturing same, solar cell element and method for manufacturing same, and solar cell | 日立化成株式会社 | 2016-12-07 | — | — | CN | disclosed |
| CN-106158603-A | Form composition and the method for n-type diffusion layer, and the method preparing photovoltaic cell | 日立化成工业株式会社 | 2016-11-23 | — | — | CN | disclosed |
| US-9496131-B2 | Liquid chemical for forming protecting film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-15 | — | — | US | disclosed |
| CN-106024918-A | SEMICONDUCTOR SUBSTRATE PROVIDED WITH PASSIVATION FILM AND PRODUCTION METHOD, AND PHOTOVOLTAIC CELL ELEMENT AND PRODUCTION METHOD THEREFOR | 日立化成株式会社 | 2016-10-12 | — | — | CN | disclosed |
| CN-102870197-B | Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | 日立化成工业株式会社 | 2016-10-12 | — | — | CN | disclosed |
| CN-103688341-B | Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | 日立化成株式会社 | 2016-09-28 | — | — | CN | disclosed |
| CN-105977143-A | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | 日立化成工业株式会社 | 2016-09-28 | — | — | CN | disclosed |
| EP-2345704-B1 | AQUEOUS INKJET INK | RISO KAGAKU CORP (JP) | 2016-09-14 | — | — | EP | disclosed |
| US-20160254140-A1 | METHOD FOR CLEANING WAFER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-09-01 | — | — | US | disclosed |
| EP-3062336-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | Hitachi Chemical Co., Ltd. (JP) | 2016-08-31 | — | — | EP | disclosed |
| EP-2497803-B1 | AQUEOUS INK FOR INKJET AND INKJET RECORDING METHOD | KONICA MINOLTA HOLDINGS INC (JP) | 2016-08-17 | — | — | EP | disclosed |
| US-20160230016-A1 | Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-08-11 | — | — | US | disclosed |
| CN-103155164-B | Method for manufacturing solar cell | 日立化成株式会社 | 2016-08-10 | — | — | CN | disclosed |
| US-20160211389-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOV OLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-07-21 | — | — | US | disclosed |
| EP-3041030-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE WITH N-TYPE DIFFUSION LAYER, AND METHOD FOR MANUFACTURING SOLAR CELL ELEMENT | Hitachi Chemical Company, Ltd. (JP) | 2016-07-06 | — | — | EP | disclosed |
| EP-2665089-B1 | COMPOSITION FOR FORMING p-TYPE DIFFUSION LAYER, METHOD OF PRODUCING SILICON SUBSTRATE HAVING p-TYPE DIFFUSION LAYER, METHOD FOR PRODUCING PHOTOVOLTAIC CELL , AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL CO LTD (JP) | 2016-06-29 | — | — | EP | disclosed |
| CN-102844841-B | N-type diffusion layer forms the manufacture method of compositions, the manufacture method of n-type diffusion layer and solar cell device | 日立化成工业株式会社 | 2016-06-15 | — | — | CN | disclosed |
| CN-102834898-B | N-type diffusion layer forms the manufacture method of constituent, the manufacture method of n-type diffusion layer and solar cell device | 日立化成工业株式会社 | 2016-06-15 | — | — | CN | disclosed |
| US-20160152773-A1 | POLYAMIDE-IMIDE RESIN, AND CURABLE RESIN COMPOSITION AND CURED PRODUCT OF SAME | DIC CORPORATION (JP) | 2016-06-02 | — | — | US | disclosed |
| EP-2355137-B1 | Use of a composition for forming p-type diffusion layer and method for forming p-type diffusion layer | HITACHI CHEMICAL CO LTD (JP) | 2016-05-25 | — | — | EP | disclosed |
| EP-3023449-A1 | POLYAMIDE-IMIDE RESIN, AND CURABLE RESIN COMPOSITION AND CURED PRODUCT OF SAME | DIC Corporation (JP) | 2016-05-25 | — | — | EP | disclosed |
| CN-105612606-A | Wafer Cleaning Method | CENTRAL GLASS CO LTD | 2016-05-25 | — | — | CN | disclosed |
| US-9349582-B2 | Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-05-24 | — | — | US | disclosed |
| EP-3018182-A1 | PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY | San-Apro Limited (JP) | 2016-05-11 | — | — | EP | disclosed |
| CN-105551947-A | Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2016-05-04 | — | — | CN | disclosed |
| CN-105542571-A | Ink composition | OCE TECH BV | 2016-05-04 | — | — | CN | disclosed |
| US-20160107286-A1 | CMP POLISHING SOLUTION AND POLISHING METHOD USING SAME | HITACHI CHEMICAL COMPANY, LTD (JP) | 2016-04-21 | — | — | US | disclosed |
| CN-105518828-A | Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, method for producing semiconductor substrate with n-type diffusion layer, and method for manufacturing solar cell element | HITACHI CHEMICAL CO LTD | 2016-04-20 | — | — | CN | disclosed |
| EP-3007210-A2 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD OF PRODUCING N-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT | Hitachi Chemical Company, Ltd. (JP) | 2016-04-13 | — | — | EP | disclosed |
| CN-105489662-A | Composition that forms n-type diffusion layer, n-type diffusion layer manufacturing method and solar cell element manufacturing method | HITACHI CHEMICAL CO LTD | 2016-04-13 | — | — | CN | disclosed |
| CN-105448677-A | Semiconductor substrate and method for producing the same, solar cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2016-03-30 | — | — | CN | disclosed |
| US-20160086819-A1 | CMP POLISHING SOLUTION AND POLISHING METHOD USING SAME | HITACHI CHEMICAL COMPANY, LTD (JP) | 2016-03-24 | — | — | US | disclosed |
| CN-105408394-A | Polyamide-imide resin, and curable resin composition and cured product of same | DAINIPPON INK & CHEMICALS | 2016-03-16 | — | — | CN | disclosed |
| CN-104159983-B | Ink composition | OCE-TECHNOLOGIES B.V. (NL) | 2016-03-09 | — | — | CN | disclosed |
| CN-105368239-A | Stain-resistant matte aqueous coating composition and method for forming stain-resistant matte coating film | KANSAI PAINT CO LTD | 2016-03-02 | — | — | CN | disclosed |
| US-20160035915-A1 | SEMICONDUCTOR SUBSTRATE AND METHOD FOR PRODUCING THE SAME, PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-02-04 | — | — | US | disclosed |
| CN-103794478-B | N-type diffusion layer is formed by composition, the manufacture method of n-type diffusion layer and the manufacture method of solar cell device | HITACHI CHEMICAL CO., LTD. (JP) | 2016-01-20 | — | — | CN | disclosed |
| CN-103299403-B | Chemical solution for forming protective film | CENTRAL GLASS CO.,LTD. (JP) | 2016-01-20 | — | — | CN | disclosed |
| CN-105161404-A | Composition for forming p-type diffusion layer, method of producing silicon substrate having p-type diffusion layer, method for producing photovoltaic cell , and photovoltaic cell | HITACHI CHEMICAL CO LTD | 2015-12-16 | — | — | CN | disclosed |
| CN-105118890-A | Method for producing photovoltaic cell | HITACHI CHEMICAL CO LTD | 2015-12-02 | — | — | CN | disclosed |
| CN-105047545-A | Method for producing solar cell | HITACHI CHEMICAL CO LTD | 2015-11-11 | — | — | CN | disclosed |
| CN-105006429-A | Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2015-10-28 | — | — | CN | disclosed |
| US-20150303318-A1 | COMPOSITION FOR FORMING PASSIVATION FILM, SEMICONDUCTOR SUBSTRATE PROVIDED WITH PASSIVATION FILM AND PRODUCTION METHOD THEREFOR, AND PHOTOVOLTAIC CELL ELEMENT AND PRODUCTION METHOD THEREFOR | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-10-22 | — | — | US | disclosed |
| US-20150303317-A1 | SEMICONDUCTOR SUBSTRATE PROVIDED WITH PASSIVATION FILM AND PRODUCTION METHOD, AND PHOTOVOLTAIC CELL ELEMENT AND PRODUCTION METHOD THEREFOR | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-10-22 | — | — | US | disclosed |
| EP-2930740-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD OF FORMING P-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL | Hitachi Chemical Co., Ltd. (JP) | 2015-10-14 | — | — | EP | disclosed |
| CN-104969364-A | Composition for forming barrier layer, semiconductor substrate with barrier layer, method for producing substrate for solar cell, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2015-10-07 | — | — | CN | disclosed |
| EP-2805977-B1 | Thermosetting resin composition | DAINIPPON INK & CHEMICALS (JP) | 2015-09-30 | — | — | EP | disclosed |
| US-20150270123-A1 | Liquid Chemical for Forming Protective Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-09-24 | — | — | US | disclosed |
| CN-104916531-A | Composition that forms n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2015-09-16 | — | — | CN | disclosed |
| CN-104900724-A | Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, and method for producing photovoltaic cell | HITACHI CHEMICAL CO LTD | 2015-09-09 | — | — | CN | disclosed |
| CN-103059819-B | A kind of non-aqueous coolant for engine composition | SINOPEC CORP. (CN) | 2015-08-26 | — | — | CN | disclosed |
| CN-104844268-A | IMPURITIES DIFFUSION LAYER FORMING COMPOSITION, N-TYPE DIFFUSION LAYER FORMING COMPOSITION, METHOD FOR MANUFACTURING N-TYPE DIFFUSION LAYER, P-TYPE DIFFUSION LAYER FORMING COMPOSITION, METHOD FOR MANUFACTURING P-TYPE DIFFUSION LAYER, AND METHOD FOR MANUFACTURING SOLAR CELL ELEMENTS | HITACHI CHEMICAL CO LTD | 2015-08-19 | — | — | CN | disclosed |
| US-20150228812-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOLOLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-08-13 | — | — | US | disclosed |
| CN-104835723-A | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | HITACHI CHEMICAL CO LTD | 2015-08-12 | — | — | CN | disclosed |
| CN-104835724-A | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | HITACHI CHEMICAL CO LTD | 2015-08-12 | — | — | CN | disclosed |
| US-20150214390-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD OF FORMING N-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20150214418-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD OF FORMING P-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-07-30 | — | — | US | disclosed |
| CN-104810258-A | Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, and method for producing photovoltaic cell | HITACHI CHEMICAL CO LTD | 2015-07-29 | — | — | CN | disclosed |
| US-20150179433-A1 | Water-Repellent Protective Film, and Chemical Solution for Forming Protective Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-06-25 | — | — | US | disclosed |
| US-20150179829-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, PHOTOVOLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-06-25 | — | — | US | disclosed |
| US-9062223-B2 | Aqueous inkjet ink and method for forming inkjet image | Konica Minolta, Inc. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-20150166582-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOVOLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. a corporation | 2015-06-18 | — | — | US | disclosed |
| EP-2876670-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, SOLAR CELL ELEMENT, PRODUCTION METHOD FOR SOLAR CELL ELEMENT, AND SOLAR CELL | Hitachi Chemical Co., Ltd. (JP) | 2015-05-27 | — | — | EP | disclosed |
| EP-2876671-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, METHOD FOR PRODUCING SAID SEMICONDUCTOR SUBSTRATE, SOLAR CELL ELEMENT, AND METHOD FOR PRODUCING SAME | Hitachi Chemical Company, Ltd. (JP) | 2015-05-27 | — | — | EP | disclosed |
| EP-2874181-A1 | COMPOSITION FOR FORMATION OF PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER, SOLAR CELL ELEMENT, METHOD FOR MANUFACTURING SOLAR CELL ELEMENT, AND SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2015-05-20 | — | — | EP | disclosed |
| US-20150099352-A1 | COMPOSITION FOR FORMING n-TYPE DIFFUSION LAYER, METHOD OF PRODUCING n-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT | HITACHI CHEMICAL COMPANY, LTD. | 2015-04-09 | — | — | US | disclosed |
| CN-104508830-A | Composition for forming passivation layer, semiconductor substrate with passivation layer, method for manufacturing semiconductor substrate with passivation layer, solar cell element, method for manufacturing solar cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2015-04-08 | — | — | CN | disclosed |
| CN-104508831-A | Solar cell element, production method therefor, and solar cell module | HITACHI CHEMICAL CO LTD | 2015-04-08 | — | — | CN | disclosed |
| CN-104488070-A | Semiconductor substrate with passivation layer and method of manufacturing same | HITACHI CHEMICAL CO LTD | 2015-04-01 | — | — | CN | disclosed |
| CN-104488088-A | Solar cell element, production method therefor, and solar cell module | HITACHI CHEMICAL CO LTD | 2015-04-01 | — | — | CN | disclosed |
| CN-104488089-A | Passivation-layer-forming composition, semiconductor substrate having passivation layer, method for manufacturing semiconductor substrate having passivation layer, solar-cell element, method for manufacturing solar-cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2015-04-01 | — | — | CN | disclosed |
| CN-104488069-A | Composition for forming passivation layer, semiconductor substrate with passivation layer, method for manufacturing semiconductor substrate with passivation layer, solar cell element, method for manufacturing solar cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2015-04-01 | — | — | CN | disclosed |
| CN-104471719-A | Composition for forming passivation layer, semiconductor substrate with passivation layer and method for manufacturing same, and solar cell element and method for manufacturing same | HITACHI CHEMICAL CO LTD | 2015-03-25 | — | — | CN | disclosed |
| CN-104471718-A | Solar cell element, method for manufacturing solar cell element, and solar cell module | HITACHI CHEMICAL CO LTD | 2015-03-25 | — | — | CN | disclosed |
| CN-104471715-A | Composition for forming passivation layer, semiconductor substrate with passivation layer and method for manufacturing same, solar cell element and method for manufacturing same, and solar cell | HITACHI CHEMICAL CO LTD | 2015-03-25 | — | — | CN | disclosed |
| CN-104471717-A | Composition for forming passivation layer, semiconductor substrate having passivation layer, production method for semiconductor substrate having passivation layer, solar cell element, production method for solar cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2015-03-25 | — | — | CN | disclosed |
| CN-104471720-A | Passivation-layer-forming composition, semiconductor substrate having passivation layer, method for manufacturing semiconductor substrate having passivation layer, solar-cell element, method for manufacturing solar-cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2015-03-25 | — | — | CN | disclosed |
| CN-102352187-B | Polishing slurry for metal films and polishing method | HITACHI CHEMICAL CO LTD | 2015-03-18 | — | — | CN | disclosed |
| CN-104428901-A | Solar-cell element and method for manufacturing same | HITACHI CHEMICAL CO LTD | 2015-03-18 | — | — | CN | disclosed |
| CN-104379684-A | Ink composition | OCE TECH BV | 2015-02-25 | — | — | CN | disclosed |
| US-8960883-B2 | Aqueous ink for inkjet and inkjet recording method | KONICA MINOLTA HOLDINGS, INC. (JP) | 2015-02-24 | — | — | US | disclosed |
| US-8946374-B2 | Polyether ester composition, polyurethane resin composition, and optical material using the same | DIC CORPORATION (JP) | 2015-02-03 | — | — | US | disclosed |
| CN-104319296-A | Mask forming composition, production method for solar cell substrate, and production method for solar cell element | HITACHI CHEMICAL CO LTD | 2015-01-28 | — | — | CN | disclosed |
| US-8932390-B2 | Liquid chemical for forming protecting film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-01-13 | — | — | US | disclosed |
| EP-2819149-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE HAVING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING SOLAR CELL ELEMENT | Hitachi Chemical Company, Ltd. (JP) | 2014-12-31 | — | — | EP | disclosed |
| US-20140373870-A1 | Liquid Chemical for Forming Protecting Film | CENTRAL GLASS CO LTD (JP) | 2014-12-25 | — | — | US | disclosed |
| CN-104176393-A | PRESSURE FEED CONTAINER, STORAGE METHOD USING THE PRESSURE FEED CONTAINER, AND METHOD FOR TRANSFERRING LIQUID USING THE PRESSURE FEED CONTAINER | CENTRAL GLASS CO LTD | 2014-12-03 | — | — | CN | disclosed |
| US-8901002-B2 | Polishing slurry for metal films and polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| EP-2805977-A2 | Thermosetting resin composition | DIC Corporation (JP) | 2014-11-26 | — | — | EP | disclosed |
| US-20140339321-A1 | PRESSURE FEED CONTAINER, STORAGE METHOD USING THE PRESSURE FEED CONTAINER, AND METHOD FOR TRANSFERRING LIQUID USING THE PRESSURE FEED CONTAINER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-20 | — | — | US | disclosed |
| CN-104159983-A | Ink composition | OCE TECH BV | 2014-11-19 | — | — | CN | disclosed |
| CN-104137227-A | Composition for forming n-type diffusion layer, method for producing semiconductor substrate having n-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2014-11-05 | — | — | CN | disclosed |
| US-20140311379-A1 | Method for Preparing Liquid Chemical for Forming Water Repellent Protective Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-10-23 | — | — | US | disclosed |
| CN-104081504-A | Composition for forming passivation film, semiconductor substrate provided with passivation film and method for producing same, and solar cell element and method for producing same | HITACHI CHEMICAL CO LTD | 2014-10-01 | — | — | CN | disclosed |
| CN-104067395-A | Composition for forming mask, method for producing substrate for solar cell, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2014-09-24 | — | — | CN | disclosed |
| CN-104040701-A | Semiconductor substrate with passivation film and method for manufacturing same, and solar cell element and method for manufacturing same | HITACHI CHEMICAL CO LTD | 2014-09-10 | — | — | CN | disclosed |
| US-8828144-B2 | Process for cleaning wafers | Central Grass Company, Limited (JP) | 2014-09-09 | — | — | US | disclosed |
| CN-104025306-A | Method for manufacturing substrate for solar cell and method for manufacturing solar cell element | HITACHI CHEMICAL CO LTD | 2014-09-03 | — | — | CN | disclosed |
| US-8821750-B2 | Metal polishing slurry and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2014-09-02 | — | — | US | disclosed |
| CN-102498144-B | Polyether ester composition, polyurethane resin composition, and optical material using same | DAINIPPON INK & CHEMICALS | 2014-08-20 | — | — | CN | disclosed |
| US-20140227821-A1 | P-TYPE DIFFUSION LAYER FORMING COMPOSITION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-08-14 | — | — | US | disclosed |
| EP-2540759-B1 | Thermosetting resin composition and cured product of the same | DAINIPPON INK & CHEMICALS (JP) | 2014-08-06 | — | — | EP | disclosed |
| EP-2436734-B1 | THERMOSETTING RESIN COMPOSITE AND CURED PRODUCT THEREOF | DAINIPPON INK & CHEMICALS (JP) | 2014-07-23 | — | — | EP | disclosed |
| US-8778217-B2 | Polishing slurry for CMP, and polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| CN-103890960-A | Element and solar cell | HITACHI CHEMICAL CO LTD | 2014-06-25 | — | — | CN | disclosed |
| EP-2743967-A1 | COMPOSITION THAT FORMS N-TYPE DIFFUSION LAYER, N-TYPE DIFFUSION LAYER MANUFACTURING METHOD AND SOLAR CELL ELEMENT MANUFACTURING METHOD | Hitachi Chemical Company, Ltd. (JP) | 2014-06-18 | — | — | EP | disclosed |
| US-20140158196-A1 | ELEMENT AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-06-12 | — | — | US | disclosed |
| CN-103839787-A | Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2014-06-04 | — | — | CN | disclosed |
| CN-103794478-A | Composition that forms n-type diffusion layer, n-type diffusion layer manufacturing method and solar cell element manufacturing method | HITACHI CHEMICAL CO LTD | 2014-05-14 | — | — | CN | disclosed |
| EP-2728624-A1 | SEMICONDUCTOR SUBSTRATE, MANUFACTURING METHOD THEREFOR, SOLAR-CELL ELEMENT, AND SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2014-05-07 | — | — | EP | disclosed |
| US-20140120648-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD OF FORMING N-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-05-01 | — | — | US | disclosed |
| CN-103718309-A | Semiconductor substrate, method for manufacturing same, solar cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2014-04-09 | — | — | CN | disclosed |
| CN-102453148-B | Olefin polymerization catalyst component, olefin polymerization catalyst and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2014-04-02 | — | — | CN | disclosed |
| CN-103688367-A | Solar-cell substrate, method for manufacturing solar-cell substrate, solar-cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2014-03-26 | — | — | CN | disclosed |
| CN-103688341-A | Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2014-03-26 | — | — | CN | disclosed |
| US-20140076396-A1 | SEMICONDUCTOR SUBSTRATE AND METHOD FOR PRODUCING THE SAME, PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-03-20 | — | — | US | disclosed |
| CN-103650111-A | Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2014-03-19 | — | — | CN | disclosed |
| US-20140065761-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD OF FORMING P-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140065826-A1 | POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD | HITACHI CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| US-20140060385-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| CN-102449069-B | Thermosetting resin composite and cured product thereof | DAINIPPON INK & CHEMICALS | 2014-02-12 | — | — | CN | disclosed |
| CN-103492499-A | Silica-coating-forming composition for use with inkjets, method for forming silica coating, semiconductor device, and solar-cell system | HITACHI CHEMICAL CO LTD | 2014-01-01 | — | — | CN | disclosed |
| US-8609541-B2 | Polishing slurry for metal films and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| EP-2671920-A1 | THERMOSETTING RESIN COMPOSITION, CURED PRODUCT THEREOF, AND INTERLAYER ADHESIVE FILM FOR PRINTED WIRING BOARD | DIC Corporation (JP) | 2013-12-11 | — | — | EP | disclosed |
| US-20130309489-A1 | THERMOSETTING RESIN COMPOSITION, CURED PRODUCT OF THE SAME, AND INTERLAMINAR ADHESIVE FILM USED FOR PRINTED WIRING BOARD | DIC CORPORATION (JP) | 2013-11-21 | — | — | US | disclosed |
| EP-2665089-A1 | COMPOSITION FOR FORMING p-TYPE DIFFUSION LAYER, METHOD OF PRODUCING SILICON SUBSTRATE HAVING p-TYPE DIFFUSION LAYER, METHOD FOR PRODUCING PHOTOVOLTAIC CELL , AND PHOTOVOLTAIC CELL | Hitachi Chemical Company, Ltd. (JP) | 2013-11-20 | — | — | EP | disclosed |
| US-8585197-B2 | Method for printing non-aqueous ink and printing substrate for non-aqueous ink | RISO KAGAKU CORPORATION (JP) | 2013-11-19 | — | — | US | disclosed |
| EP-2662883-A1 | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Company, Ltd. (JP) | 2013-11-13 | — | — | EP | disclosed |
| CN-103370371-A | Thermosetting resin composition, cured product thereof, and interlayer adhesive film for printed wiring board | DAINIPPON INK & CHEMICALS | 2013-10-23 | — | — | CN | disclosed |
| CN-103348449-A | Composition for forming n-type diffusion layer, process for producing n-type diffusion layer, and process for producing solar cell | HITACHI CHEMICAL CO LTD | 2013-10-09 | — | — | CN | disclosed |
| US-20130255534-A1 | Method of Preparing Liquid Chemical for Forming Protective Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-10-03 | — | — | US | disclosed |
| EP-2642527-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | Hitachi Chemical Company, Ltd. (JP) | 2013-09-25 | — | — | EP | disclosed |
| EP-2642529-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | Hitachi Chemical Company, Ltd. (JP) | 2013-09-25 | — | — | EP | disclosed |
| EP-2642528-A1 | METHOD FOR PRODUCING SOLAR CELL | Hitachi Chemical Co., Ltd. (JP) | 2013-09-25 | — | — | EP | disclosed |
| US-8534820-B2 | Ink for ink-jet recording, ink cartridge, ink-jet recording apparatus, method of determining, and method of ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2013-09-17 | — | — | US | disclosed |
| CN-103299400-A | P-type diffusion layer formation composition, method for producing silicon substrate having p-type diffusion layer, method for producing solar cell element, and solar cell | HITACHI CHEMICAL CO LTD | 2013-09-11 | — | — | CN | disclosed |
| CN-103299399-A | Composition for forming p-type diffusion layer, method for producing p-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2013-09-11 | — | — | CN | disclosed |
| CN-103299403-A | Chemical solution for forming protective film | CENTRAL GLASS CO LTD | 2013-09-11 | — | — | CN | disclosed |
| CN-103283004-A | Wafer Cleaning Method | CENTRAL GLASS CO LTD | 2013-09-04 | — | — | CN | disclosed |
| CN-103201849-A | Method for manufacturing solar cell | HITACHI CHEMICAL CO LTD | 2013-07-10 | — | — | CN | disclosed |
| US-8481428-B2 | Polishing slurry and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2013-07-09 | — | — | US | disclosed |
| US-8470913-B2 | Thermosetting resin composition and cured product of the same | DIC CORPORATION (JP) | 2013-06-25 | — | — | US | disclosed |
| CN-103155164-A | Method for manufacturing solar cell | HITACHI CHEMICAL CO LTD | 2013-06-12 | — | — | CN | disclosed |
| CN-103155166-A | Method for producing solar cell | HITACHI CHEMICAL CO LTD | 2013-06-12 | — | — | CN | disclosed |
| EP-2592120-A1 | AQUEOUS INKJET INK, AND METHOD FOR FORMING INKJET IMAGE | Konica Minolta Holdings, Inc. (JP) | 2013-05-15 | — | — | EP | disclosed |
| US-8440010-B2 | Inkjet printing method and ink set | RISO KAGAKU CORPORATION (JP) | 2013-05-14 | — | — | US | disclosed |
| CN-101551589-B | Silica based positive type photosensitive organic compound | HITACHI CHEMICAL CO LTD | 2013-05-08 | — | — | CN | disclosed |
| US-20130106945-A1 | AQUEOUS INKJET INK AND METHOD FOR FORMING INKJET IMAGE | KONICA MINOLTA HOLDINGS, INC. (JP) | 2013-05-02 | — | — | US | disclosed |
| CN-103059819-A | Non-aqueous coolant composition for engine | CHINA PETROLEUM & CHEMICAL | 2013-04-24 | — | — | CN | disclosed |
| US-8410000-B2 | Method for producing photovoltaic cell | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-04-02 | — | — | US | disclosed |
| US-20130078759-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD OF FORMING N-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL | Hitachi Chemical Company ,Ltd. | 2013-03-28 | — | — | US | disclosed |
| US-8404599-B2 | Method for producing photovoltaic cell | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20130071968-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD OF FORMING P-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-03-21 | — | — | US | disclosed |
| US-8393728-B2 | Method for forming ink-jet image | KONICA MINOLTA HOLDINGS, INC. (JP) | 2013-03-12 | — | — | US | disclosed |
| CN-102959684-A | Composition for forming impurity diffusion layer, composition for forming n-type diffusion layer, method for producing n-type diffusion layer, composition for forming p-type diffusion layer, method for producing p-type diffusion layer, and method for producing solar cell element | SATO TETSUYA | 2013-03-06 | — | — | CN | disclosed |
| EP-2562793-A1 | COMPOSITION THAT FORMS p-TYPE DIFFUSION LAYER, METHOD FOR PRODUCING p-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING SOLAR CELL ELEMENT | Hitachi Chemical Company, Ltd. (JP) | 2013-02-27 | — | — | EP | disclosed |
| EP-2562792-A1 | COMPOSITION THAT FORMS n-TYPE DIFFUSION LAYER, METHOD FOR PRODUCING n-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING SOLAR CELL ELEMENT | Hitachi Chemical Company, Ltd. (JP) | 2013-02-27 | — | — | EP | disclosed |
| EP-2284165-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | SAN APRO LTD (JP) | 2013-02-20 | — | — | EP | disclosed |
| CN-102934205-A | Composition for forming impurity diffusion layer, process for producing impurity diffusion layer, and process for producing solar cell element | HITACHI CHEMICAL CO LTD | 2013-02-13 | — | — | CN | disclosed |
| US-20130025669-A1 | PHOTOVOLTAIC CELL SUBSTRATE, METHOD OF PRODUCING PHOTOVOLTAIC CELL SUBSTRATE, PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2013-01-31 | — | — | US | disclosed |
| US-20130025670-A1 | SEMICONDUCTOR SUBSTRATE AND METHOD FOR PRODUCING THE SAME, PHOTOVOLTAIC CELL ELEMENT, AND PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2013-01-31 | — | — | US | disclosed |
| CN-102888208-A | Abrasive and substrate polishing method | HITACHI CHEMICAL CO LTD | 2013-01-23 | — | — | CN | disclosed |
| CN-102870197-A | Composition for forming n-type diffusion layer, method for producing n-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2013-01-09 | — | — | CN | disclosed |
| EP-2540759-A2 | Thermosetting resin composition and cured product of the same | DIC Corporation (JP) | 2013-01-02 | — | — | EP | disclosed |
| CN-102859659-A | Composition that forms p-type diffusion layer, method for producing p-type diffusion layer, and method for producing solar cell element | HITACHI CHEMICAL CO LTD | 2013-01-02 | — | — | CN | disclosed |
| US-8342670-B2 | Inkjet printing method and ink set | RISO KAGAKU CORPORATION (JP) | 2013-01-01 | — | — | US | disclosed |
| CN-102844841-A | N-type diffusion layer-forming composition, n-type diffusion layer production method and solar cell component production method | HITACHI CHEMICAL CO LTD | 2012-12-26 | — | — | CN | disclosed |
| CN-102834898-A | N-type diffusion layer forming composition, method of producing n-type diffusion layer, and method of producing solar cell element | HITACHI CHEMICAL CO LTD | 2012-12-19 | — | — | CN | disclosed |
| CN-102131910-B | Cleaning agent composition for removing lead-free flux and system for removing lead-free flux | ARAKAWA CHEM IND | 2012-12-19 | — | — | CN | disclosed |
| US-20120293581-A1 | METHOD FOR PRINTING NON-AQUEOUS INK AND PRINTING SUBSTRATE FOR NON-AQUEOUS INK | RISO KAGAKU CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120272999-A1 | Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-11-01 | — | — | US | disclosed |
| US-8278030-B2 | Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof | SAN-APRO LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| CN-102690607-A | Metal polishing slurry and application thereof | HITACHI CHEMICAL CO LTD | 2012-09-26 | — | — | CN | disclosed |
| US-20120231575-A1 | METHOD FOR PRODUCING SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-09-13 | — | — | US | disclosed |
| EP-2497803-A1 | AQUEOUS INK FOR INKJET AND INKJET RECORDING METHOD | Konica Minolta Holdings, Inc. (JP) | 2012-09-12 | — | — | EP | disclosed |
| EP-2495771-A1 | SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| EP-2495770-A1 | METHOD FOR PRODUCING SOLAR CELL | Hitachi Chemical Company, Ltd. (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-20120218342-A1 | AQUEOUS INK FOR INKJET AND INKJET RECORDING METHOD | KONICA MINOLTA HOLDINGS, INC. (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120211076-A1 | SOLAR CELL | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120211025-A1 | PROCESS FOR CLEANING WAFERS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-08-23 | — | — | US | disclosed |
| CN-1903968-B | Aqueous dispersion composition for abrasive particles | YUSHIRO CHEM IND | 2012-08-22 | — | — | CN | disclosed |
| CN-101517487-B | Radiation-sensitive composition, method for forming silica-based coating film, device and member having silica-based coating film, and photosensitizer for insulating film | HITACHI CHEMICAL CO LTD | 2012-08-08 | — | — | CN | disclosed |
| EP-2479199-A1 | POLYETHER ESTER COMPOSITION, POLYURETHANE RESIN COMPOSITION, AND OPTICAL MATERIAL USING SAME | DIC Corporation (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-8226223-B2 | Ink set for ink-jet recording, ink-jet recording apparatus, and method of ink-jet recording | Broker Kogyo Kabushiki Kaisha (JP) | 2012-07-24 | — | — | US | disclosed |
| US-20120184062-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2012-07-19 | — | — | US | disclosed |
| CN-102598291-A | Method for manufacturing solar cell | HITACHI CHEMICAL CO LTD | 2012-07-18 | — | — | CN | disclosed |
| US-8221534-B2 | Ink-jet ink set, producing method of ink-jet ink set, image forming method, and ink-jet recording apparatus | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2012-07-17 | — | — | US | disclosed |
| US-20120174945-A1 | Liquid Chemical for Forming Protecting Film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120178201-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2012-07-12 | — | — | US | disclosed |
| CN-102576751-A | Solar cell unit | HITACHI CHEMICAL CO LTD | 2012-07-11 | — | — | CN | disclosed |
| US-20120172567-A1 | POLYETHER ESTER COMPOSITION, POLYURETHANE RESIN COMPOSITION, AND OPTICAL MATERIAL USING THE SAME | DIC CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-8211845-B2 | Cleaning composition for removing lead-free solder flux and system for removing lead-free solder flux | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| CN-102498144-A | Polyether ester composition, polyurethane resin composition, and optical material using same | DAINIPPON INK & CHEMICALS | 2012-06-13 | — | — | CN | disclosed |
| US-20120142829-A1 | THERMOSETTING RESIN COMPOSITION AND CURED PRODUCT OF THE SAME | DIC CORPORATION (JP) | 2012-06-07 | — | — | US | disclosed |
| US-20120122265-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2012-05-17 | — | — | US | disclosed |
| US-20120122264-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2012-05-17 | — | — | US | disclosed |
| US-20120122263-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2012-05-17 | — | — | US | disclosed |
| CN-102453148-A | Olefin polymerization catalyst component, olefin polymerization catalyst, and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2012-05-16 | — | — | CN | disclosed |
| CN-102449069-A | Thermosetting resin composite and cured product thereof | DAINIPPON INK & CHEMICALS | 2012-05-09 | — | — | CN | disclosed |
| US-8168729-B2 | Thermosetting resin composition | DIC CORPORATION (JP) | 2012-05-01 | — | — | US | disclosed |
| US-20120100718-A1 | CMP Fluid and Method for Polishing Palladium | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| US-8158981-B2 | Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-20120064721-A1 | POLISHING SLURRY AND POLISHING METHOD | HITACHI CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |
| CN-102352187-A | Polishing slurry for metal films and polishing method | HITACHI CHEMICAL CO LTD | 2012-02-15 | — | — | CN | disclosed |
| US-20120021190-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20110318929-A1 | CMP POLISHING SOLUTION AND POLISHING METHOD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-12-29 | — | — | US | disclosed |
| US-8084363-B2 | Polishing slurry and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2011-12-27 | — | — | US | disclosed |
| US-8084362-B2 | Polishing slurry and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2011-12-27 | — | — | US | disclosed |
| US-8066808-B2 | formed from plurality of color inks; ozone resistance | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2011-11-29 | — | — | US | disclosed |
| EP-2239146-B1 | Method for forming ink-jet image | KONICA MINOLTA HOLDINGS INC (JP) | 2011-11-16 | — | — | EP | disclosed |
| US-20110256658-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-10-20 | — | — | US | disclosed |
| US-8034545-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| CN-102194672-A | Composition and method for forming n-type diffusion layer, and method for manufacturing photovoltaic cell | HITACHI CHEMICAL CO LTD | 2011-09-21 | — | — | CN | disclosed |
| CN-102187278-A | Photosensitive resin composition, method for forming silica-based coating film, and device and member having silica-based coating film | HITACHI CHEMICAL CO LTD | 2011-09-14 | — | — | CN | disclosed |
| CN-1664707-B | Scouring agent and flushing fluid for the planography | DAICEL CHEM | 2011-09-14 | — | — | CN | disclosed |
| US-20110212564-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-09-01 | — | — | US | disclosed |
| CN-102169738-A | Composition and method for forming p-type diffusion layer and method for preparing photovoltaic cell | HITACHI CHEMICAL CO LTD | 2011-08-31 | — | — | CN | disclosed |
| CN-1698018-B | Radiation-curable composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD | 2011-08-31 | — | — | CN | disclosed |
| CN-102159653-A | Aqueous inkjet ink | RISO KAGAKU CORP | 2011-08-17 | — | — | CN | disclosed |
| US-20110192318-A1 | AQUEOUS INKJET INK | RISO KAGAKU CORPORATION (JP) | 2011-08-11 | — | — | US | disclosed |
| US-20110195541-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-08-11 | — | — | US | disclosed |
| US-20110195540-A1 | COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-08-11 | — | — | US | disclosed |
| EP-2355137-A1 | Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Co., Ltd. (JP) | 2011-08-10 | — | — | EP | disclosed |
| EP-2348546-A2 | Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Co., Ltd. (JP) | 2011-07-27 | — | — | EP | disclosed |
| EP-2345704-A1 | AQUEOUS INKJET INK | Riso Kagaku Corporation (JP) | 2011-07-20 | — | — | EP | disclosed |
| CN-102131910-A | Cleaning agent composition for removing lead-free flux and system for removing lead-free flux | ARAKAWA CHEM IND | 2011-07-20 | — | — | CN | disclosed |
| US-7971983-B2 | Ink set for ink-jet recording, ink-jet recording method, and ink-jet recording apparatus | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2011-07-05 | — | — | US | disclosed |
| US-20110148980-A1 | OIL INKJET PRINTING METHOD AND INK SET | RISO KAGAKU CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-7942959-B2 | Ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2011-05-17 | — | — | US | disclosed |
| US-20110094545-A1 | CLEANING COMPOSITION FOR REMOVING LEAD-FREE SOLDER FLUX AND SYSTEM FOR REMOVING LEAD-FREE SOLDER FLUX | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 2011-04-28 | — | — | US | disclosed |
| CN-102008729-A | Composition for external use | ROHTO PHARMA | 2011-04-13 | — | — | CN | disclosed |
| US-7915524-B2 | Sealing agent for photoelectric conversion device and photoelectric conversion device using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2011-03-29 | — | — | US | disclosed |
| CN-101370847-B | Thermosetting resin composition | DAINIPPON INK & CHEMICALS | 2011-03-16 | — | — | CN | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| CN-101058713-B | Polishing slurry and polishing method | HITACHI CHEMICAL CO LTD | 2011-02-09 | — | — | CN | disclosed |
| US-20110009033-A1 | POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD | HITACHI CHEMICAL CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| CN-101037646-B | Cleaning agent for removing solder flux and method for cleaning solder flux | KAKEN TECH CO LTD | 2010-12-08 | — | — | CN | disclosed |
| EP-2239146-A1 | Method for forming ink-jet image | Konica Minolta Holdings, Inc. (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100253734-A1 | METHOD FOR FORMING INK-JET IMAGE | KONICA MINOLTA HOLDINGS, INC. (JP) | 2010-10-07 | — | — | US | disclosed |
| EP-1333061-B1 | Thermosetting polymide resin composition and process for producing polymide resin | DAINIPPON INK & CHEMICALS (JP) | 2010-08-25 | — | — | EP | disclosed |
| US-7776808-B2 | Being lead-free or high melting, with a mixture of benzyl alcohol, a glycol, and an amino alcohol such as diethanolamine; electronics | KAKEN TECH CO., LTD. (JP) | 2010-08-17 | — | — | US | disclosed |
| US-7766471-B2 | Ink set for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2010-08-03 | — | — | US | disclosed |
| US-20100120250-A1 | METAL POLISHING SLURRY AND POLISHING METHOD | HITACHI CHEMICAL CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20100102321-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-04-29 | — | — | US | disclosed |
| US-7690762-B2 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2010-04-06 | — | — | US | disclosed |
| US-20100033524-A1 | Inkjet Printing Method and Ink Set | RISO KAGAKU CORPORATION (JP) | 2010-02-11 | — | — | US | disclosed |
| US-20090324831-A1 | CURABLE RESIN COMPOSITION AND PROCESS FOR PRODUCING CURED COATING USING THE SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-31 | — | — | US | disclosed |
| US-7637993-B2 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090251652-A1 | Silica based positive type photosensitive organic compound | HITACHI CHEMICAL CO., LTD. | 2009-10-08 | — | — | US | disclosed |
| CN-101551589-A | Silica based positive type photosensitive organic compound | HITACHI CHEMICAL CO LTD (JP) | 2009-10-07 | — | — | CN | disclosed |
| US-20090220897-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-03 | — | — | US | disclosed |
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| CN-101517487-A | Radiation-sensitive composition, method for forming silica-based coating film, device and member having silica-based coating film, and photosensitizer for insulating film | HITACHI CHEMICAL CO LTD (JP) | 2009-08-26 | — | — | CN | disclosed |
| US-20090209104-A1 | POLISHING SLURRY FOR CMP, AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2009-08-20 | — | — | US | disclosed |
| US-7571977-B2 | Ink-jet recording apparatus | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2009-08-11 | — | — | US | disclosed |
| US-20090195571-A1 | Ink Set for Ink-Jet Recording, Ink-Jet Recording Apparatus, and Method of Ink-Jet Recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090196994-A1 | Inkjet printing method and ink set | RISO KAGAKU CORPORATION (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090192273-A1 | THERMOSETTING RESIN COMPOSITION | DIC CORPORATION (JP) | 2009-07-30 | — | — | US | disclosed |
| US-20090186155-A1 | INK FOR INK-JET RECORDING, INK CARTRIDGE, INK-JET RECORDING APPARATUS, METHOD OF DETERMINING, AND METHOD OF INK-JET RECORDING | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2009-07-23 | — | — | US | disclosed |
| CN-101490170-A | Curable resin composition and method for forming cured coating film | DAICEL CHEM (JP) | 2009-07-22 | — | — | CN | disclosed |
| CN-100510961-C | Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD (JP) | 2009-07-08 | — | — | CN | disclosed |
| US-7553361-B2 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2009-06-30 | — | — | US | disclosed |
| US-20090156007-A1 | Polishing slurry and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2009-06-18 | — | — | US | disclosed |
| EP-2048196-A1 | CURABLE RESIN COMPOSITION AND METHOD FOR FORMING CURED COATING FILM | Daicel Chemical Industries, Ltd. (JP) | 2009-04-15 | — | — | EP | disclosed |
| CN-101398498-A | Coloring composite for color filter, color filter, and displaying device for color filter | FUJIFILM CORP (JP) | 2009-04-01 | — | — | CN | disclosed |
| CN-101370847-A | Thermosetting resin composition | DAINIPPON INK & CHEMICALS (JP) | 2009-02-18 | — | — | CN | disclosed |
| US-7479182-B2 | Black Ink for ink-jet printing | KONICA MINOLTA HOLDINGS, INC. (JP) | 2009-01-20 | — | — | US | disclosed |
| US-7468100-B2 | Ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-12-23 | — | — | US | disclosed |
| US-7465345-B2 | Ink-jet ink set | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-12-16 | — | — | US | disclosed |
| US-20080305979-A1 | Cleaning agent for removing solder flux and method for cleaning solder flux | KAKEN TECH CO., LTD | 2008-12-11 | — | — | US | disclosed |
| US-20080302270-A1 | Ink Set For Ink-Jet Recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-12-11 | — | — | US | disclosed |
| US-20080274305-A1 | Liquid Crystal Sealant and Liquid Crystal Display Cell Utilizing the Same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2008-11-06 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1724314-B1 | Ink-jet ink | KONICA MINOLTA HOLDINGS INC (JP) | 2008-10-22 | — | — | EP | disclosed |
| US-7438751-B2 | Black ink comprising a black pigment, yellow dye, magenta dye, and cyan dye; storage stability; rub fastness against a plain paper surface, color balance after fading (fading stability), and/or water resistance | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7438750-B2 | Ink-jet ink set | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7438749-B2 | Ink-jet ink set | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20080250968-A1 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-10-16 | — | — | US | disclosed |
| US-7435711-B2 | Cleaning agent for removing solder flux and method for cleaning solder flux | KAKEN TECH CO., LTD. (JP) | 2008-10-14 | — | — | US | disclosed |
| EP-1964869-A1 | THERMOSETTING RESIN COMPOSITION | DIC Corporation (JP) | 2008-09-03 | — | — | EP | disclosed |
| US-20080207560-A1 | Composition For External Use | ROHTO PHARMACEUTICAL CO., LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| CN-100414398-C | Liquid crystal sealing agent, liquid crystal display device using the same, and method of manufacturing the display device | NIPPON KAYAKU KK (JP) | 2008-08-27 | — | — | CN | disclosed |
| CN-100412183-C | Cleaning agent for removing soldering flux and method for cleaning soldering flux | KAKEN TECH CO LTD (JP) | 2008-08-20 | — | — | CN | disclosed |
| US-7407537-B2 | Ink set for ink-jet recording, method for producing the same, and the ink-jet printer | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-08-05 | — | — | US | disclosed |
| CN-100407494-C | Sealing agent for photoelectric conversion element and photoelectric conversion element using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2008-07-30 | — | — | CN | disclosed |
| US-20080171148-A1 | Ink Set for Ink-Jet Recording, Ink-Jet Recording Method, and Ink-Jet Recording Apparatus | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-07-17 | — | — | US | disclosed |
| US-7393399-B2 | Ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-07-01 | — | — | US | disclosed |
| CN-100395294-C | Water base ink for ink-jet recording | BROTHER IND LTD (JP) | 2008-06-18 | — | — | CN | disclosed |
| EP-1607455-B1 | Water base ink for ink-jet recording | BROTHER IND LTD (JP) | 2008-06-11 | — | — | EP | disclosed |
| CN-101194187-A | Method for forming antireflection film | HITACHI CHEMICAL CO LTD (JP) | 2008-06-04 | — | — | CN | disclosed |
| US-20080102258-A1 | INK-JET INK SET, PRODUCING METHOD OF INK-JET INK SET, IMAGE FORMING METHOD, AND INK-JET RECORDING APPARATUS | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-05-01 | — | — | US | disclosed |
| US-20080079793-A1 | Ink Set For Ink-Jet Recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080079794-A1 | Ink for Ink-Jet Recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080072786-A1 | Ink-Jet Ink Set | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080072787-A1 | Ink-Jet Ink Set | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080072789-A1 | Ink-Jet Ink Set | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080072788-A1 | Ink-Jet Ink Set | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080066645-A1 | Ink For Ink-Jet Recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-03-20 | — | — | US | disclosed |
| US-20080066643-A1 | Ink For Ink-Jet Recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-7328989-B2 | Water base ink set for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2008-02-12 | — | — | US | disclosed |
| CN-101102797-A | External composition | ROHTO PHARMA (JP) | 2008-01-09 | — | — | CN | disclosed |
| US-7297464-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1849481-A1 | COMPOSITION FOR EXTERNAL USE | ROHTO PHARMACEUTICAL CO., LTD. (JP) | 2007-10-31 | — | — | EP | disclosed |
| CN-101058713-A | Polishing slurry and polishing method | HITACHI CHEMICAL CO LTD (JP) | 2007-10-24 | — | — | CN | disclosed |
| US-20070232197-A1 | Polishing slurry and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| CN-101037646-A | Cleaning agent for removing solder flux and method for cleaning solder flux | KAKEN TECH CO LTD (JP) | 2007-09-19 | — | — | CN | disclosed |
| US-20070200880-A1 | Ink-Jet Recording Apparatus | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2007-08-30 | — | — | US | disclosed |
| US-7250078-B2 | Ink-jet ink and ink-jet recording method | KONICA MINOLTA HOLDINGS, INC. (JP) | 2007-07-31 | — | — | US | disclosed |
| US-7247192-B2 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2007-07-24 | — | — | US | disclosed |
| CN-101002137-A | Liquid crystal sealant and liquid crystal display cell utilizing the same | NIPPON KAYAKU KK (JP) | 2007-07-18 | — | — | CN | disclosed |
| EP-1780587-A1 | LIQUID CRYSTAL SEALANT AND LIQUID CRYSTAL DISPLAY CELL UTILIZING THE SAME | Nippon Kayaku Kabushiki Kaisha (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-20070068419-A1 | Blank ink for ink-jet printing | KONICA MINOLTA HOLDINGS, INC. (JP) | 2007-03-29 | — | — | US | disclosed |
| CN-1903968-A | Aqueous dispersion composition for abrasive particles | YUSHIRO CHEM IND (JP) | 2007-01-31 | — | — | CN | disclosed |
| US-7159976-B2 | Water base ink set for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20060263399-A1 | Preparation for external use on skin | VIVIER CANADA INC. (CA) | 2006-11-23 | — | — | US | disclosed |
| US-20060260506-A1 | Water-based ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2006-11-23 | — | — | US | disclosed |
| EP-1724314-A1 | Ink-jet ink | KONICA MINOLTA HOLDINGS, INC. (JP) | 2006-11-22 | — | — | EP | disclosed |
| CN-1867861-A | Liquid crystal sealing agent, liquid crystal display device using the same, and method of manufacturing the display device | NIPPON KAYAKU KK (JP) | 2006-11-22 | — | — | CN | disclosed |
| US-20060254459-A1 | Ink-jet ink | KONICA MINOLTA HOLDINGS, INC. (JP) | 2006-11-16 | — | — | US | disclosed |
| US-20060223732-A1 | Cleaning agent for removing solder flux and method for cleaning solder flux | KAKEN TECH CO., LTD. (JP) | 2006-10-05 | — | — | US | disclosed |
| US-7101596-B2 | Liquid crystal sealant, liquid crystal display device using the same and method for producing the device | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2006-09-05 | — | — | US | disclosed |
| US-20060192828-A1 | Water base ink for ink-jet recording | OHIRA HIDEO | 2006-08-31 | — | — | US | disclosed |
| US-20060162771-A1 | Sealing agent for photoelectric conversion element and photoelectric conversion device element using the same | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2006-07-27 | — | — | US | disclosed |
| CN-1264924-C | Thermosetting polyimide resin composition and method for producing polyimide resin | DAINIPPON INK & CHEMICALS (JP) | 2006-07-19 | — | — | CN | disclosed |
| CN-1798826-A | Cleaning agent for removing soldering flux and method for cleaning soldering flux | KAKEN TECH CO LTD (JP) | 2006-07-05 | — | — | CN | disclosed |
| EP-1674919-A1 | SEALANT FOR LIQUID CRYSTAL, LIQUID-CRYSTAL DISPLAY MADE WITH THE SAME, AND PROCESS FOR PRODUICNG THE DISPLAY | Nippon Kayaku Kabushiki Kaisha (JP) | 2006-06-28 | — | — | EP | disclosed |
| EP-1672427-A1 | RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE | Hitachi Chemical Co., Ltd. (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1672426-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-06-21 | — | — | EP | disclosed |
| CN-1751410-A | Sealing agent for photoelectric conversion element and photoelectric conversion element using the same | NIPPON KAYAKU KK (JP) | 2006-03-22 | — | — | CN | disclosed |
| US-20060050114-A1 | Ink cartridge for ink-jet recording apparatus and method for manufacturing the same | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2006-03-09 | — | — | US | disclosed |
| US-20060005743-A1 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2006-01-12 | — | — | US | disclosed |
| EP-1614728-A1 | Water-based ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2006-01-11 | — | — | EP | disclosed |
| CN-1715345-A | Water base ink for ink-jet recording | BROTHER IND LTD (JP) | 2006-01-04 | — | — | CN | disclosed |
| US-20050279246-A1 | Ink set for ink-jet recording, method for producing the same, and ink-jet printer | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2005-12-22 | — | — | US | disclosed |
| EP-1607454-A1 | Ink set for ink-jet recording, method for producing the same, and ink-jet printer | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2005-12-21 | — | — | EP | disclosed |
| EP-1607455-A1 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2005-12-21 | — | — | EP | disclosed |
| CN-1709993-A | Ink set for ink-jet recording, method for producing the same, and ink-jet printer | BROTHER IND LTD (JP) | 2005-12-21 | — | — | CN | disclosed |
| US-20050275701-A1 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2005-12-15 | — | — | US | disclosed |
| US-20050266344-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| EP-1598897-A1 | SEALING AGENT FOR PHOTOELECTRIC CONVERSION ELEMENT AND PHOTOELECTRIC CONVERSION ELEMENT USING THE SAME | Nippon Kayaku Kabushiki Kaisha (JP) | 2005-11-23 | — | — | EP | disclosed |
| CN-1698017-A | Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD (JP) | 2005-11-16 | — | — | CN | disclosed |
| CN-1698018-A | Radiation-curable composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide | HITACHI CHEMICAL CO LTD (JP) | 2005-11-16 | — | — | CN | disclosed |
| US-20050239953-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| CN-1664707-A | Scouring agent and flushing fluid for the planography | DAICEL CHEM (JP) | 2005-09-07 | — | — | CN | disclosed |
| US-20050181145-A1 | Liquid crystal sealant, liquid crystal display device using the same and method for producing the device | SHARP KABUSHIKI KAISHA (JP) | 2005-08-18 | — | — | US | disclosed |
| US-20050172855-A1 | Ink-jet ink and ink-jet recording method | KONICA MINOLTA HOLDINGS, INC. (JP) | 2005-08-11 | — | — | US | disclosed |
| US-6887967-B2 | Thermosetting polyimide resin composition process for producing polyimide resin, and polyimide resin | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20050050803-A1 | Polishing fluid and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2005-03-10 | — | — | US | disclosed |
| US-20040227800-A1 | Water base ink set for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2004-11-18 | — | — | US | disclosed |
| US-20040080594-A1 | Water base ink for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2004-04-29 | — | — | US | disclosed |
| US-20030189627-A1 | Water base ink set for ink-jet recording | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2003-10-09 | — | — | US | disclosed |
| CN-1435448-A | Thermosetting polyimide resin composition and method for producing polyimide resin | DAINIPPON INK & CHEMICALS (JP) | 2003-08-13 | — | — | CN | disclosed |
| US-20030149222-A1 | Thermosetting polyimide resin composition and process for producing polyimide resin | DAINIPPON INK AND CHEMICALS, INC (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1333061-A1 | Thermosetting polymide resin composition and process for producing polymide resin | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-08-06 | — | — | EP | disclosed |
| US-6120858-A | COMPRISING AN EPOXY RESIN, A NOVOLAC RESIN, A CURING ACCELERATOR AND A TITANIUM BLACK PIGMENT | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-0608132-B1 | Coating varnish composition and antifouling coating composition | HITACHI CHEMICAL CO LTD (JP) | 1998-05-20 | — | — | EP | disclosed |
| EP-0582451-B1 | Refrigerator oil composition for fluoroalkane refrigerant | NIPPON OIL CO LTD (JP) | 1997-12-10 | — | — | EP | disclosed |
| US-5512198-A | WEAR RESISTANCE | NIPPON OIL CO., LTD. (JP) | 1996-04-30 | — | — | US | disclosed |
| US-5439511-A | Composition containing polymer obtained by polymerizing unsaturated acid anhydride and another unsaturated compound, specified additive | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1995-08-08 | — | — | US | disclosed |
| EP-0608132-A1 | Coating varnish composition and antifouling coating composition | HITACHI CHEMICAL CO., LTD. (JP) | 1994-07-27 | — | — | EP | disclosed |
| EP-0582451-A1 | Refrigerator oil composition for fluoroalkane refrigerant | NIPPON OIL CO. LTD. (JP) | 1994-02-09 | — | — | EP | disclosed |
| US-5071454-A | Absorption with alkylene glycol ethers | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-12-10 | — | — | US | disclosed |
| US-5071454-A | Absorption with alkylene glycol ethers | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-12-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (22 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220020582-A1 | BEVEL PORTION TREATMENT AGENT COMPOSITION AND METHOD OF MANUFACTURING WAFER | SGMS1, SGMS2, SEM1 | TDP1 4522/4885LPAR1 586/4885LPAR3 1209/4885 |
| US-20220081575-A1 | SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER | C5, C1S, C9 | TDP1 1837/4885LPAR1 2420/4885LPAR3 2456/4885 |
| US-20240317788-A1 | PRECIOUS METAL COMPLEXES WITH DIHYDROAZULENYL LIGANDS AND USE THEREOF | PIN1, PDS5A, IDH1 | TDP1 4350/4885LPAR1 3965/4885LPAR3 3337/4885 |
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | ARSA, SPIN1, ASIC1 | TDP1 4091/4885LPAR1 1007/4885LPAR3 532/4885 |
| US-12545862-B2 | Method for producing decomposing/cleaning composition | ITGAV, ITGA8, TLN1 | TDP1 1945/4885LPAR1 2340/4885LPAR3 2514/4885 |
| US-10059662-B2 | Sulfonium salt, photoacid generator, and photosensitive composition | ARSA, SPIN1, ASIC1 | TDP1 4091/4885LPAR1 1007/4885LPAR3 532/4885 |
| US-11817310-B2 | Bevel portion treatment agent composition and method of manufacturing wafer | SGMS1, SGMS2, SEM1 | TDP1 4522/4885LPAR1 586/4885LPAR3 1209/4885 |
| US-20190074173-A1 | Water-Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water-Repellent Protective Film, and Wafer Cleaning Method | SMURF2, SMURF1, SLFN12 | TDP1 2515/4885LPAR1 3596/4885LPAR3 3955/4885 |
| US-10037882-B2 | Method for cleaning wafer | POT1, UCHL5, USP30 | TDP1 675/4885LPAR1 3171/4885LPAR3 2961/4885 |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | ESPL1, SMS, SGMS1 | TDP1 4078/4885LPAR1 720/4885LPAR3 839/4885 |
| US-20240287103-A1 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | SMS, SRM, GUCY1A2 | TDP1 1035/4885LPAR1 2826/4885LPAR3 3595/4885 |
| US-20250215024-A1 | CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE | EPM2A, AKR7A2, ALDOA | TDP1 4313/4885LPAR1 1198/4885LPAR3 1576/4885 |
| US-20060263399-A1 | Preparation for external use on skin | CUTA, SLC6A12, PROC | TDP1 3097/4885LPAR1 1028/4885LPAR3 3101/4885 |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | TDP1 4498/4885LPAR1 1603/4885LPAR3 1022/4885 |
| US-20090186155-A1 | INK FOR INK-JET RECORDING, INK CARTRIDGE, INK-JET RECORDING APPARATUS, METHOD OF DETERMINING, AND METHOD OF INK-JET RECORDING | NOX4, NOX3, NOXO1 | TDP1 1375/4885LPAR1 2132/4885LPAR3 1728/4885 |
| US-12577508-B2 | Composition, and method for cleaning adhesive polymer | POT1, DNMT1, EHMT1 | TDP1 230/4885LPAR1 2633/4885LPAR3 3494/4885 |
| US-20200339611-A1 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | SMS, SRM, GUCY1A2 | TDP1 1035/4885LPAR1 2826/4885LPAR3 3595/4885 |
| US-20160368879-A1 | PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY | ARL1, GARS1, SPTBN1 | TDP1 4488/4885LPAR1 899/4885LPAR3 690/4885 |
| US-20150166582-A1 | COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOVOLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL | MB, CD81, AP2M1 | TDP1 2931/4885LPAR1 2081/4885LPAR3 3698/4885 |
| US-20240317779-A1 | METAL COMPLEXES HAVING 4-H,6-H OR 8-H DIHYDROAZULENYL LIGANDS AND USE THEREOF | DOHH, CPNE4, MDH2 | TDP1 4472/4885LPAR1 4778/4885LPAR3 4834/4885 |
| US-20170233336-A1 | SULFONATE COMPOUND, PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY | ASIC1, ASIC3, SULT1A1 | TDP1 4052/4885LPAR1 3270/4885LPAR3 3317/4885 |
| US-10450266-B2 | Sulfonate compound, photoacid generator, and resin composition for photolithography | ASIC1, ASIC3, SULT1A1 | TDP1 4052/4885LPAR1 3270/4885LPAR3 3317/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.