Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA known ✓ | P10253 | 3/20 | 0.56 |
| ▸ | GLA known ✓ | P06280 | 1/20 | 0.49 |
| ▸ | FLT3 known ✓ | P36888 | 1/20 | 0.47 |
| ▸ | CA2 known ✓ | P00918 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.66 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.61 |
| ▸ | TSHR | P16473 | 2/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.56 |
| ▸ | RAB9A | P51151 | 1/20 | 0.56 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | ELANE | P08246 | 1/20 | 0.53 |
| ▸ | CA12 | O43570 | 2/20 | 0.51 |
| ▸ | CA9 | Q16790 | 2/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.49 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL908522 | 0.98 | KDM4E (0.68) | KDM4EHSD17B10GAATSHRALDH1A1 | |
| SCHEMBL29714473 | 0.98 | KDM4E (0.68) | KDM4EHSD17B10GAATSHRALDH1A1 | |
| SCHEMBL9339665 | 0.95 | KDM4E (0.64) | KDM4EHSD17B10GAATSHRALDH1A1 | |
| SCHEMBL9702108 | 0.86 | HSD17B10 (0.62) | KDM4EHSD17B10GAATSHRALDH1A1 | |
| SCHEMBL12268640 | 0.85 | CA12 (0.54) | KDM4EHSD17B10GAAALDH1A1RAB9A | |
| SCHEMBL5045660 | 0.85 | HSD17B10 (0.75) | KDM4EHSD17B10GAATSHRALDH1A1 | |
| Isophthalic Acid SCHEMBL10627291 | 0.85 | LMNA (0.63) | KDM4EHSD17B10GAATSHRALDH1A1 | |
| SCHEMBL5049051 | 0.85 | HSD17B10 (0.75) | KDM4EHSD17B10GAATSHRALDH1A1 | |
| SCHEMBL30595409 | 0.84 | CA12 (0.65) | KDM4EGAAALDH1A1LMNAELANE | |
| SCHEMBL3974361 | 0.84 | CA12 (0.65) | KDM4EGAAALDH1A1LMNAELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7531691-B2 | Method for producing naphthalene carboxylic acid amide compound | UENO FINE CHEMICALS INDUSTRY, LTD. (JP) | 2009-05-12 | — | — | US | claimed |
| US-20080045720-A1 | Method for producing naphthalene carboxylic acid amide compound | UENO FINE CHEMICALS INDUSTRY, LTD. (JP) | 2008-02-21 | — | — | US | claimed |
| EP-1867629-A2 | Method for producing naphthalene carboxylic acid amide compound | Ueno Fine Chemicals Industry, Ltd. (JP) | 2007-12-19 | — | — | EP | claimed |
| US-10703917-B2 | Coating compositions suitable for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-07-07 | — | — | US | disclosed |
| US-20170313889-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-11-02 | — | — | US | disclosed |
| US-9708493-B2 | Coating compositions suitable for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-18 | — | — | US | disclosed |
| US-20160009924-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-01-14 | — | — | US | disclosed |
| US-8883407-B2 | Coating compositions suitable for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-11-11 | — | — | US | disclosed |
| US-20110003250-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-01-06 | — | — | US | disclosed |
| EP-2261738-A2 | Coating compositions suitable for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2010-12-15 | — | — | EP | disclosed |
| US-7531691-B2 | Method for producing naphthalene carboxylic acid amide compound | UENO FINE CHEMICALS INDUSTRY, LTD. (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20080045720-A1 | Method for producing naphthalene carboxylic acid amide compound | UENO FINE CHEMICALS INDUSTRY, LTD. (JP) | 2008-02-21 | — | — | US | disclosed |
| EP-1867629-A2 | Method for producing naphthalene carboxylic acid amide compound | Ueno Fine Chemicals Industry, Ltd. (JP) | 2007-12-19 | — | — | EP | disclosed |
| EP-0462578-B1 | Mesomorphic compound for use in liquid crystal composition and liquid crystal device and display apparatus using same | CANON KK (JP) | 1999-09-22 | — | — | EP | disclosed |
| US-5244596-A | Benzoxazoles | CANON KABUSHIKI KAISHA (JP) | 1993-09-14 | — | — | US | disclosed |
| EP-0462578-A1 | Mesomorphic compound for use in liquid crystal composition and liquid crystal device and display apparatus using same | CANON KABUSHIKI KAISHA (JP) | 1991-12-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110003250-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | DHPS, HAAO, FTO | GAA 2304/4885GLA 1394/4885FLT3 4770/4885 |
| US-10703917-B2 | Coating compositions suitable for use with an overcoated photoresist | DHPS, HAAO, FTO | GAA 2304/4885GLA 1394/4885FLT3 4770/4885 |
| US-20170313889-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | DHPS, HAAO, FTO | GAA 2304/4885GLA 1394/4885FLT3 4770/4885 |
| US-20160009924-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | DHPS, HAAO, FTO | GAA 2304/4885GLA 1394/4885FLT3 4770/4885 |
| US-20080045720-A1 | Method for producing naphthalene carboxylic acid amide compound | NAAA, AADAC, NAT1 | GAA 593/4885GLA 920/4885FLT3 1878/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.