Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.52 |
| ▸ | CES2 | O00748 | 2/20 | 0.52 |
| ▸ | CES1 | P23141 | 2/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | SRC | P12931 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.39 |
| ▸ | MMP8 | P22894 | 1/20 | 0.39 |
| ▸ | MMP13 | P45452 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | GMNN | O75496 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL251610 | 0.85 | CA1 (0.51) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL3631033 | 0.85 | BCAT2 (0.51) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL3866415 | 0.83 | LMNA (0.45) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL16339817 | 0.82 | LMNA (0.47) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL2593899 | 0.82 | LMNA (0.47) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL27714239 | 0.81 | LMNA (0.41) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL11896558 | 0.81 | CYP1A2 (0.54) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL13281027 | 0.80 | LMNA (0.45) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL28770861 | 0.80 | LMNA (0.45) | LMNACES2CES1MAPK1SRC | |
| SCHEMBL28746292 | 0.79 | LMNA (0.44) | LMNACES2CES1MAPK1SRC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 782 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115594875-A | Anti-glare film coating liquid and anti-glare film | 宁波甬安光科新材料科技有限公司（CN） | 2023-01-13 | — | — | CN | claimed |
| CN-105404096-B | Chemically amplified positive resist dry film, dry film laminate and method for producing laminate | 信越化学工业株式会社 | 2021-07-16 | — | — | CN | claimed |
| US-10876219-B2 | In-situ fingerprinting for electrochemical deposition and/or electrochemical etching | ANCOSYS GMBH (DE) | 2020-12-29 | — | — | US | claimed |
| US-10007181-B2 | Chemically amplified positive resist dry film, dry film laminate and method of preparing laminate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | claimed |
| EP-2821780-B1 | In-situ fingerprinting for electrochemical deposition and/or electrochemical etching | ANCOSYS GMBH (DE) | 2018-05-23 | — | — | EP | claimed |
| US-9766545-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-09-19 | — | — | US | claimed |
| US-20150331324-A1 | Methods for Small Trench Patterning Using Chemical Amplified Photoresist Compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-11-19 | — | — | US | claimed |
| US-20150008132-A1 | IN-SITU FINGERPRINTING FOR ELECTROCHEMICAL DEPOSITION AND/OR ELECTROCHEMICAL ETCHING | Nova Measuring Instruments GmbH (DE) | 2015-01-08 | — | — | US | claimed |
| EP-2821780-A1 | In-situ fingerprinting for electrochemical deposition and/or electrochemical etching | Ancosys GmbH (DE) | 2015-01-07 | — | — | EP | claimed |
| US-8592137-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2013-11-26 | — | — | US | claimed |
| US-20130155381-A1 | METHODS FOR SMALL TRENCH PATTERNING USING CHEMICAL AMPLIFIED PHOTORESIST COMPOSITIONS | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) | 2013-06-20 | — | — | US | claimed |
| EP-1345673-B1 | LOW PRESSURE REVERSE OSMOSIS AND NANOFILTRATION MEMBRANES AND METHOD FOR THE PRODUCTION THEREOF | HYDRANAUTICS (US) | 2008-09-24 | — | — | EP | claimed |
| EP-1085984-B1 | I INKJET RECEPTOR MEDIA AND COATING SOLUTIONS THEREFOR | MINNESOTA MINING & MFG (US) | 2005-12-28 | — | — | EP | claimed |
| EP-1345673-A2 | LOW PRESSURE REVERSE OSMOSIS AND NANOFILTRATION MEMBRANES AND METHOD FOR THE PRODUCTION THEREOF | HYDRANAUTICS (US) | 2003-09-24 | — | — | EP | claimed |
| WO-2002043842-A2 | LOW PRESSURE REVERSE OSMOSIS AND NANOFILTRATION MEMBRANES AND METHOD FOR THE PRODUCTION THEREOF | HYDRANAUTICS (US) | 2002-06-06 | — | — | WO | claimed |
| US-6383612-B1 | PIGMENT METAL SALT COATING IMPREGNATED INTO POROUS MEMBRANE; AROMATIC OR ALIPHATIC DRYING AGENT WITH SULFONIC, CARBOXYLIC, PHENOLIC, AND/OR HYDROXYL FUNCTIONAL GROUPS; WATERPROOFING, COLORFASTNESS, NONSMEARING | 3M INNOVATIVE PROPERTIES COMPANY | 2002-05-07 | — | — | US | claimed |
| EP-1085984-A1 | INK-DRYING AGENTS FOR INKJET RECEPTOR MEDIA | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 2001-03-28 | — | — | EP | claimed |
| WO-1999065702-A1 | INK-DRYING AGENTS FOR INKJET RECEPTOR MEDIA | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1999-12-23 | — | — | WO | claimed |
| WO-1994012167-A1 | PHARMACEUTICAL COMPOSITIONS FOR LOCAL USE AGAINST INSECT BITES AND STINGS | FARMIN S.R.L. (IT) | 1994-06-09 | — | — | WO | claimed |
| JP-62094381-A | — | — | None | — | — | JP | disclosed |
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| US-12607937-B2 | Photoresist top coating material for etching rate control | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-04-21 | — | — | US | disclosed |
| EP-3486693-B1 | OPTICAL LAYERED BODY | DAINIPPON PRINTING CO LTD (JP) | 2026-04-01 | — | — | EP | disclosed |
| EP-4691763-A1 | DECORATIVE SHEET AND DECORATIVE BOARD | Dai Nippon Printing Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-12535738-B2 | Photoresist top coating material for etching rate control | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-01-27 | — | — | US | disclosed |
| US-20260020362-A1 | RIBBED SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE | KANEKA CORP (JP) | 2026-01-15 | — | — | US | disclosed |
| US-12493244-B2 | Photosensitive resin composition, photosensitive dry film, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-09 | — | — | US | disclosed |
| US-20250364312-A1 | METHOD FOR FORMING A SEMICONDUCTOR DEVICE AND DEVICES FABRICATED THEREOF | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-11-27 | — | — | US | disclosed |
| US-20250306404-A1 | OPTICAL FILM, POLARIZER PROTECTIVE FILM, TRANSFER BODY FOR POLARIZER PROTECTIVE FILM, POLARIZATION PLATE, IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING POLARIZER PROTECTIVE FILM | DAINIPPON PRINTING CO LTD (JP) | 2025-10-02 | — | — | US | disclosed |
| US-12379616-B2 | Optical film, polarizer protective film, transfer body for polarizer protective film, polarization plate, image display device, and method for manufacturing polarizer protective film | DAI NIPPON PRINTING CO., LTD. (JP) | 2025-08-05 | — | — | US | disclosed |
| US-12365169-B2 | Decorative sheet and decorative plate | DAI NIPPON PRINTING CO., LTD. (JP) | 2025-07-22 | — | — | US | disclosed |
| US-12339586-B2 | Photocurable resin composition containing self-crosslinkable polymer | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-24 | — | — | US | disclosed |
| CN-120152849-A | Decorative sheet and decorative plate | 大日本印刷株式会社 | 2025-06-13 | — | — | CN | disclosed |
| US-20250179572-A1 | Photoactive Compounds and Methods for Biomolecule Detection and Sequencing | VIBRANT HOLDINGS, LLC | 2025-06-05 | — | — | US | disclosed |
| US-20250172869-A1 | WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | NISSAN CHEMICAL CORPORATION (JP) | 2025-05-29 | — | — | US | disclosed |
| CN-114600045-B | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| EP-4050054-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHINETSU CHEMICAL CO (JP) | 2025-04-23 | — | — | EP | disclosed |
| WO-2025079961-A1 | DEVELOPING SOLUTION FOR PHOTOSENSITIVE RESIN COMPOSITION, DEVELOPING METHOD, AND PATTERN FORMATION METHOD | 주식회사 엘지화학 | 2025-04-17 | — | — | WO | disclosed |
| WO-2025079919-A1 | PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE | 주식회사 엘지화학 | 2025-04-17 | — | — | WO | disclosed |
| CN-115175810-B | Hard coat film, method for producing same, and display device | 株式会社钟化 | 2025-04-15 | — | — | CN | disclosed |
| US-20250116936-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-10 | — | — | US | disclosed |
| WO-2025058368-A1 | PHOTOSENSITIVE RESIN COMPOSITION, INSULATION FILM, AND SEMICONDUCTOR DEVICE | 주식회사 엘지화학 | 2025-03-20 | — | — | WO | disclosed |
| US-20250044695-A1 | METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN | MERCK PATENT GMBH (DE) | 2025-02-06 | — | — | US | disclosed |
| EP-4492142-A1 | WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | Nissan Chemical Corporation (JP) | 2025-01-15 | — | — | EP | disclosed |
| US-12197127-B2 | Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-01-14 | — | — | US | disclosed |
| US-20250011507-A1 | POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-01-09 | — | — | US | disclosed |
| US-20250014901-A1 | WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | NISSAN CHEMICAL CORPORATION (JP) | 2025-01-09 | — | — | US | disclosed |
| EP-4485077-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKING POLYMER | Nissan Chemical Corporation (JP) | 2025-01-01 | — | — | EP | disclosed |
| WO-2024257762-A1 | OPTICAL SHEET, SHEET ARTICLE, POLARIZING PLATE, TOUCH PANEL MEMBER, DISPLAY DEVICE, METHOD FOR SELECTING OPTICAL SHEET, AND METHOD FOR MANUFACTURING OPTICAL SHEET | 大日本印刷株式会社 | 2024-12-19 | — | — | WO | disclosed |
| CN-111338181-B | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2024-11-26 | — | — | CN | disclosed |
| US-12152279-B2 | Photoactive compounds and methods for biomolecule detection and sequencing | VIBRANT HOLDINGS, LLC (US) | 2024-11-26 | — | — | US | disclosed |
| US-20240363395-A1 | METHOD FOR FORMING A SEMICONDUCTOR DEVICE AND DEVICES FABRICATED THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-10-31 | — | — | US | disclosed |
| US-12128654-B2 | Cosmetic sheet and cosmetic plate | DAI NIPPON PRINTING CO., LTD. (JP) | 2024-10-29 | — | — | US | disclosed |
| CN-115508920-B | Anti-glare antireflection film for display | 宁波甬安光科新材料科技有限公司 | 2024-10-25 | — | — | CN | disclosed |
| CN-118843834-A | Composition for forming wafer edge protection film for semiconductor manufacturing | 日产化学株式会社 | 2024-10-25 | — | — | CN | disclosed |
| WO-2024202869-A1 | DECORATIVE SHEET AND DECORATIVE BOARD | 大日本印刷株式会社 | 2024-10-03 | — | — | WO | disclosed |
| CN-118742855-A | Photocurable resin composition containing self-crosslinkable polymer | 日产化学株式会社 | 2024-10-01 | — | — | CN | disclosed |
| EP-4435517-A1 | POLYCYCLIC AROMATIC HYDROCARBON-BASED PHOTO-CURABLE RESIN COMPOSITION | Nissan Chemical Corporation (JP) | 2024-09-25 | — | — | EP | disclosed |
| US-20240294802-A1 | LAMINATE, LAMINATE FOR OUTDOOR USE, AND HARD COAT LAYER-FORMING MATERIAL | DEXERIALS CORPORATION (JP) | 2024-09-05 | — | — | US | disclosed |
| US-20240262091-A1 | COSMETIC SHEET AND COSMETIC PLATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2024-08-08 | — | — | US | disclosed |
| EP-4398035-A1 | WAFER EDGE PROTECTIVE-FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | Nissan Chemical Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-12019375-B2 | Photosensitive material and method of lithography | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-06-25 | — | — | US | disclosed |
| US-12018239-B2 | Laser processing machine | KATAOKA CORPORATION (JP) | 2024-06-25 | — | — | US | disclosed |
| CN-118235092-A | Polycyclic aromatic hydrocarbon-based photocurable resin composition | 日产化学株式会社 | 2024-06-21 | — | — | CN | disclosed |
| US-20240206322-A1 | OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE | KANEKA CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| US-20240192601-A1 | PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-06-13 | — | — | US | disclosed |
| CN-118163453-A | Decorative sheet and decorative plate | 大日本印刷株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-20240165925-A1 | DECORATIVE SHEET AND DECORATIVE PANEL | DAI NIPPON PRINTING CO., LTD. (JP) | 2024-05-23 | — | — | US | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117940849-A | Wafer edge protection film forming composition for semiconductor manufacturing | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-108919409-B | Optical layered body, polarizing plate, method for producing same, image display device, method for producing same, and method for improving visibility | 大日本印刷株式会社 | 2024-04-26 | — | — | CN | disclosed |
| EP-4348352-A1 | METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN | Merck Patent GmbH (DE) | 2024-04-10 | — | — | EP | disclosed |
| CN-117715740-A | Decorative sheet and decorative plate | 大日本印刷株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-117597233-A | Laminate, laminate for outdoor use, and hard coating layer forming material | 迪睿合株式会社 | 2024-02-23 | — | — | CN | disclosed |
| US-20240044039-A1 | IN-SITU FINGERPRINTING FOR ELECTROCHEMICAL DEPOSITION AND/OR ELECTROCHEMICAL ETCHING | ANCOSYS GMBH (DE) | 2024-02-08 | — | — | US | disclosed |
| WO-2024029496-A1 | CURABLE RESIN COMPOSITION, HARD COAT FILM AND METHOD FOR PRODUCING SAME, AND DISPLAY | 株式会社カネカ | 2024-02-08 | — | — | WO | disclosed |
| EP-4316810-A1 | DECORATIVE SHEET AND DECORATIVE PANEL | DAI NIPPON PRINTING CO., LTD. (JP) | 2024-02-07 | — | — | EP | disclosed |
| CN-117529405-A | Hard coating film, method for producing the same, and display | 株式会社钟化 | 2024-02-06 | — | — | CN | disclosed |
| CN-117501179-A | Method of using composition containing organic acid compound, lithographic composition containing organic acid compound, and method of manufacturing resist pattern | 默克专利有限公司 | 2024-02-02 | — | — | CN | disclosed |
| US-11884839-B2 | Acetal-protected silanol group-containing polysiloxane composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-113227856-B | Optical film, polarizing element protective film, transfer body for polarizing element protective film, polarizing plate, image display device, and method for producing polarizing element protective film | 大日本印刷株式会社 | 2024-01-30 | — | — | CN | disclosed |
| CN-117388969-A | Optical film, polarizing plate, and image display device | 大日本印刷株式会社 | 2024-01-12 | — | — | CN | disclosed |
| US-20230408923-A1 | SUBSTRATE LAMINATE, IMAGE SENSOR, AND METHOD FOR MANUFACTURING SUBSTRATE LAMINATE | KANEKA CORPORATION (JP) | 2023-12-21 | — | — | US | disclosed |
| CN-107615168-B | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117121184-A | Optical semiconductor device, method for manufacturing the same, solid-state imaging device, and electronic apparatus | 株式会社钟化 | 2023-11-24 | — | — | CN | disclosed |
| CN-117075428-A | Negative photosensitive resin composition | DIC株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-117083706-A | Substrate laminate, image sensor, and method for manufacturing substrate laminate | 株式会社钟化 | 2023-11-17 | — | — | CN | disclosed |
| WO-2023218876-A1 | ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, AND CURED PRODUCT THEREOF | 株式会社日本触媒 | 2023-11-16 | — | — | WO | disclosed |
| CN-117042964-A | Decorative sheet and decorative plate | 大日本印刷株式会社 | 2023-11-10 | — | — | CN | disclosed |
| US-20230359124-A1 | MATERIALS AND METHODS FOR FORMING RESIST BOTTOM LAYER | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-11-09 | — | — | US | disclosed |
| CN-117008420-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-11-07 | — | — | CN | disclosed |
| CN-117002122-A | Decorative sheet | 凸版印刷株式会社 | 2023-11-07 | — | — | CN | disclosed |
| CN-116981963-A | Hard coat film, method for producing same, and display | 株式会社钟化 | 2023-10-31 | — | — | CN | disclosed |
| CN-114311899-B | Conductive laminate, touch panel, and method for manufacturing conductive laminate | 大日本印刷株式会社 | 2023-10-24 | — | — | CN | disclosed |
| US-20230314937-A1 | METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN | MERCK PATENT GMBH (DE) | 2023-10-05 | — | — | US | disclosed |
| EP-4067999-B1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-04 | — | — | EP | disclosed |
| WO-2023171733-A1 | WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | 日産化学株式会社 | 2023-09-14 | — | — | WO | disclosed |
| WO-2023162968-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKING POLYMER | 日産化学株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023149421-A1 | TRANSPARENT RESIN SUBSTRATE FOR FLEXIBLE DISPLAY, AND HARD COAT FILM | 株式会社カネカ | 2023-08-10 | — | — | WO | disclosed |
| CN-113009612-B | Optical laminate, image display device, or touch panel sensor | 大日本印刷株式会社 | 2023-07-28 | — | — | CN | disclosed |
| US-11703766-B2 | Materials and methods for forming resist bottom layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-07-18 | — | — | US | disclosed |
| CN-116419848-A | Hard coat film, method for producing same, and image display device | 株式会社钟化 | 2023-07-11 | — | — | CN | disclosed |
| US-11692282-B2 | In-situ fingerprinting for electrochemical deposition and/or electrochemical etching | ANCOSYS GMBH (DE) | 2023-07-04 | — | — | US | disclosed |
| US-20230176479-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-08 | — | — | US | disclosed |
| EP-4189486-A1 | METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN | Merck Patent GmbH (DE) | 2023-06-07 | — | — | EP | disclosed |
| CN-109804311-B | Chemically amplified positive photoresist composition and pattern forming method using the same | 默克专利有限公司 | 2023-06-06 | — | — | CN | disclosed |
| WO-2023085414-A1 | POLYCYCLIC AROMATIC HYDROCARBON-BASED PHOTO-CURABLE RESIN COMPOSITION | 日産化学株式会社 | 2023-05-19 | — | — | WO | disclosed |
| CN-116125581-A | Polarizing element protective film, method for producing same, transfer body for polarizing element protective film, polarizing plate, and image display device | 大日本印刷株式会社 | 2023-05-16 | — | — | CN | disclosed |
| CN-116113885-A | Method for using composition containing carboxylic acid ester, lithographic composition containing carboxylic acid ester, and method for producing resist pattern | 默克专利有限公司 | 2023-05-12 | — | — | CN | disclosed |
| US-20230138855-A1 | HARDCOAT FILM, METHOD FOR PRODUCING SAME, AND DISPLAY DEVICE | KANEKA CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| CN-116057088-A | Copolymer, copolymer solution, photosensitive resin composition, cured product, method for producing copolymer, and method for producing copolymer solution | 株式会社日本触媒 | 2023-05-02 | — | — | CN | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230120038-A1 | PROCESS FOR GENERATING ACID ANHYDRIDES | HYCONIX, INC. (US) | 2023-04-20 | — | — | US | disclosed |
| EP-4167028-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-19 | — | — | EP | disclosed |
| CN-111775530-B | Sheet material | 大日本印刷株式会社 | 2023-04-18 | — | — | CN | disclosed |
| WO-2023058368-A1 | METHOD FOR PRODUCING GLASS SUBSTRATE, PRETREATMENT METHOD FOR GLASS SUBSTRATE, AND METHOD FOR PRODUCING MULTILAYER BODY COMPRISING GLASS SUBSTRATE | 日産化学株式会社 | 2023-04-13 | — | — | WO | disclosed |
| CN-115885217-A | Negative resist film laminate and pattern forming method | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-115847981-A | Decorative sheet and decorative plate | 大日本印刷株式会社 | 2023-03-28 | — | — | CN | disclosed |
| US-11608306-B2 | Process for generating acid anhydrides | HYCONIX, INC. (US) | 2023-03-21 | — | — | US | disclosed |
| WO-2023033094-A1 | WAFER EDGE PROTECTIVE-FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING | 日産化学株式会社 | 2023-03-09 | — | — | WO | disclosed |
| EP-3357685-B1 | COSMETIC SHEET AND COSMETIC PLATE | DAINIPPON PRINTING CO LTD (JP) | 2023-03-01 | — | — | EP | disclosed |
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |
| WO-2023008306-A1 | LAMINATE, OUTDOOR LAMINATE, AND HARD COAT LAYER-FORMING MATERIAL | デクセリアルズ株式会社 | 2023-02-02 | — | — | WO | disclosed |
| US-11561472-B2 | Radiation sensitive composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| CN-115594875-A | Anti-glare film coating liquid and anti-glare film | 宁波甬安光科新材料科技有限公司（CN） | 2023-01-13 | — | — | CN | disclosed |
| CN-110554568-B | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2022-12-27 | — | — | CN | disclosed |
| CN-115508920-A | Anti-glare anti-reflective film for displays | 宁波甬安光科新材料科技有限公司 | 2022-12-23 | — | — | CN | disclosed |
| CN-115480447-A | Negative photosensitive resin composition | DIC株式会社 | 2022-12-16 | — | — | CN | disclosed |
| WO-2022253787-A1 | METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN | MERCK PATENT GMBH (DE) | 2022-12-08 | — | — | WO | disclosed |
| US-20220382157-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-12-01 | — | — | US | disclosed |
| US-20220373891-A1 | MATERIALS AND METHODS FOR FORMING RESIST BOTTOM LAYER | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-11-24 | — | — | US | disclosed |
| CN-108459469-B | Pattern forming method | 信越化学工业株式会社 | 2022-11-11 | — | — | CN | disclosed |
| US-20220334482-A1 | PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-10-20 | — | — | US | disclosed |
| US-20220317570-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-06 | — | — | US | disclosed |
| EP-4067999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-10-05 | — | — | EP | disclosed |
| US-11460774-B2 | Photosensitive resin composition, photosensitive dry film, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-04 | — | — | US | disclosed |
| CN-115113482-A | Negative photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-09-27 | — | — | CN | disclosed |
| WO-2022191328-A1 | FILM AND METHOD FOR PRODUCING SAME, LAMINATED FILM, AND DISPLAY | 株式会社カネカ | 2022-09-15 | — | — | WO | disclosed |
| US-11442364-B2 | Materials and methods for forming resist bottom layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-09-13 | — | — | US | disclosed |
| US-11441113-B2 | Cell treatment system | KATAOKA CORPORATION (JP) | 2022-09-13 | — | — | US | disclosed |
| EP-4050054-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-08-31 | — | — | EP | disclosed |
| CN-114911133-A | Method for patterning a stack and manufacturing a semiconductor structure | 台湾积体电路制造股份有限公司 | 2022-08-16 | — | — | CN | disclosed |
| US-20220212452-A1 | DECORATIVE SHEET AND DECORATIVE LAMINATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-20220184932-A1 | DECORATIVE SHEET AND DECORATIVE PLATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2022-06-16 | — | — | US | disclosed |
| CN-110875175-B | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2022-06-10 | — | — | CN | disclosed |
| US-20220179316-A1 | POLYIMIDE RESIN, POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM AND SEMICONDUCTOR DEVICE | LG CHEM, LTD. (KR) | 2022-06-09 | — | — | US | disclosed |
| CN-114600045-A | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2022-06-07 | — | — | CN | disclosed |
| US-20220162698-A1 | PHOTOACTIVE COMPOUNDS AND METHODS FOR BIOMOLECULE DETECTION AND SEQUENCING | VIBRANT HOLDINGS, LLC | 2022-05-26 | — | — | US | disclosed |
| US-11318703-B2 | Cosmetic sheet and cosmetic plate | DAI NIPPON PRINTING CO., LTD. (JP) | 2022-05-03 | — | — | US | disclosed |
| CN-114424122-A | Hard mask composition, hard mask layer and pattern forming method | 三星SDI株式会社 | 2022-04-29 | — | — | CN | disclosed |
| US-20220075227-A1 | OPTICAL FILM, POLARIZER PROTECTIVE FILM, TRANSFER BODY FOR POLARIZER PROTECTIVE FILM, POLARIZATION PLATE, IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING POLARIZER PROTECTIVE FILM | DAI NIPPON PRINTING CO., LTD. (JP) | 2022-03-10 | — | — | US | disclosed |
| EP-3579029-B1 | OPTICAL FILM, POLARIZATION PLATE, AND IMAGE DISPLAY DEVICE | DAINIPPON PRINTING CO LTD (JP) | 2022-03-09 | — | — | EP | disclosed |
| US-11256174-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-02-22 | — | — | US | disclosed |
| EP-3950327-A1 | DECORATIVE SHEET AND DECORATIVE LAMINATE | Dai Nippon Printing Co., Ltd. (JP) | 2022-02-09 | — | — | EP | disclosed |
| EP-3950325-A1 | DECORATIVE SHEET AND DECORATIVE PLATE | Dai Nippon Printing Co., Ltd. (JP) | 2022-02-09 | — | — | EP | disclosed |
| EP-3951499-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-02-09 | — | — | EP | disclosed |
| WO-2022023230-A1 | METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN | MERCK PATENT GMBH (DE) | 2022-02-03 | — | — | WO | disclosed |
| EP-3671345-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2022-02-02 | — | — | EP | disclosed |
| CN-113748020-A | Transparent resin film, method for producing transparent resin film, and decorative material | 大日本印刷株式会社 | 2021-12-03 | — | — | CN | disclosed |
| US-20210347722-A1 | PROCESS FOR GENERATING ACID ANHYDRIDES | HYCONIX, INC. (US) | 2021-11-11 | — | — | US | disclosed |
| EP-3309614-B1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL CORP (JP) | 2021-11-10 | — | — | EP | disclosed |
| US-11168365-B2 | Photoactive compounds and methods for biomolecule detection and sequencing | VIBRANT HOLDINGS, LLC (US) | 2021-11-09 | — | — | US | disclosed |
| US-11170812-B2 | Magnetic recording medium including specified compound, magnetic recording and reproducing apparatus, and composition for magnetic recording medium | FUJIFILM CORPORATION (JP) | 2021-11-09 | — | — | US | disclosed |
| CN-113631375-A | Transparent resin film, decorative material, and method for producing decorative material | 大日本印刷株式会社 | 2021-11-09 | — | — | CN | disclosed |
| CN-113498380-A | Decorative sheet | 凸版印刷株式会社 | 2021-10-12 | — | — | CN | disclosed |
| CN-106610566-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2021-10-08 | — | — | CN | disclosed |
| CN-113466983-A | Polarizing laminate and image display device comprising same | 东友精细化工有限公司 | 2021-10-01 | — | — | CN | disclosed |
| US-11127592-B2 | Photosensitive groups in resist layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2021-09-21 | — | — | US | disclosed |
| CN-109563371-B | Polysiloxane composition comprising acetal-protected silanol groups | 日产化学株式会社 | 2021-09-21 | — | — | CN | disclosed |
| CN-113382854-A | Decorative material | 大日本印刷株式会社 | 2021-09-10 | — | — | CN | disclosed |
| CN-110226112-B | Optical film, polarizing plate and image display device | 大日本印刷株式会社 | 2021-09-07 | — | — | CN | disclosed |
| CN-113348188-A | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2021-09-03 | — | — | CN | disclosed |
| EP-3513968-B1 | COSMETIC SHEET AND COSMETIC PLATE | DAINIPPON PRINTING CO LTD (JP) | 2021-08-18 | — | — | EP | disclosed |
| WO-2021153607-A1 | POLYORGANOSILOXANE COMPOUND, METHOD FOR PRODUCING SAME, HARD COAT COMPOSITION, HARD COAT FILM AND METHOD FOR PRODUCING SAME | 株式会社カネカ | 2021-08-05 | — | — | WO | disclosed |
| CN-105404096-B | Chemically amplified positive resist dry film, dry film laminate and method for producing laminate | 信越化学工业株式会社 | 2021-07-16 | — | — | CN | disclosed |
| US-20210179795-A1 | HARD COAT COMPOSITION, HARD COAT-EQUIPPED POLYIMIDE FILM, METHOD FOR MANUFACTURING THE SAME, AND IMAGE DISPLAY DEVICE | KANEKA CORPORATION (JP) | 2021-06-17 | — | — | US | disclosed |
| US-11029599-B2 | Chemically amplified positive photoresist composition and pattern forming method using same | MERCK PATENT GMBH (DE) | 2021-06-08 | — | — | US | disclosed |
| US-11022885-B2 | Photosensitive middle layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2021-06-01 | — | — | US | disclosed |
| WO-2021079679-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | 信越化学工業株式会社 | 2021-04-29 | — | — | WO | disclosed |
| CN-106444288-B | Chemically amplified positive resist composition and pattern forming method | 信越化学工业株式会社 | 2021-04-09 | — | — | CN | disclosed |
| US-20210079324-A1 | LASER PROCESSING MACHINE | KATAOKA CORPORATION (JP) | 2021-03-18 | — | — | US | disclosed |
| US-20210071121-A1 | CELL CULTURE VESSEL | KATAOKA CORPORATION (JP) | 2021-03-11 | — | — | US | disclosed |
| US-10908322-B2 | Antistatic hardcoat film, process for producing same, polarizer, and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2021-02-02 | — | — | US | disclosed |
| US-10908333-B2 | Optical film, polarization plate, and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2021-02-02 | — | — | US | disclosed |
| US-20210023819-A1 | DECORATIVE SHEET AND DECORATIVE BOARD | DAI NIPPON PRINTING CO., LTD. (JP) | 2021-01-28 | — | — | US | disclosed |
| US-20210017666-A1 | IN-SITU FINGERPRINTING FOR ELECTROCHEMICAL DEPOSITION AND/OR ELECTROCHEMICAL ETCHING | Nova Measuring Instruments GmbH (DE) | 2021-01-21 | — | — | US | disclosed |
| US-10876086-B2 | Cell treatment method, laser processing machine, and cell culture vessel | KATAOKA CORPORATION (JP) | 2020-12-29 | — | — | US | disclosed |
| US-10876219-B2 | In-situ fingerprinting for electrochemical deposition and/or electrochemical etching | ANCOSYS GMBH (DE) | 2020-12-29 | — | — | US | disclosed |
| EP-3753727-A1 | DECORATIVE SHEET AND DECORATIVE BOARD | Dai Nippon Printing Co., Ltd. (JP) | 2020-12-23 | — | — | EP | disclosed |
| CN-106876251-B | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2020-12-11 | — | — | CN | disclosed |
| EP-3163374-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-12-02 | — | — | EP | disclosed |
| EP-3526644-B1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING SAME | MERCK PATENT GMBH (DE) | 2020-11-25 | — | — | EP | disclosed |
| CN-107663275-B | Gap filling polymer for filling fine pattern gap and method for manufacturing semiconductor device using the same | 爱思开海力士有限公司 | 2020-11-24 | — | — | CN | disclosed |
| CN-105301905-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2020-11-20 | — | — | CN | disclosed |
| US-10815572-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-27 | — | — | US | disclosed |
| CN-111775530-A | Sheet material | 大日本印刷株式会社 | 2020-10-16 | — | — | CN | disclosed |
| US-20200325432-A1 | CELL TREATMENT SYSTEM | KATAOKA CORPORATION (JP) | 2020-10-15 | — | — | US | disclosed |
| CN-111757806-A | Decorative sheet and decorative plate | 大日本印刷株式会社 | 2020-10-09 | — | — | CN | disclosed |
| US-10768527-B2 | Resist solvents for photolithography applications | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-09-08 | — | — | US | disclosed |
| EP-3689602-A1 | COSMETIC SHEET AND COSMETIC PLATE | Dainippon Printing Co., Ltd. (JP) | 2020-08-05 | — | — | EP | disclosed |
| EP-2955576-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-07-22 | — | — | EP | disclosed |
| US-20200223193-A1 | COSMETIC SHEET AND COSMETIC PLATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2020-07-16 | — | — | US | disclosed |
| EP-3672944-A1 | CLEANING COMPOSITIONS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2020-07-01 | — | — | EP | disclosed |
| CN-111338181-A | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2020-06-26 | — | — | CN | disclosed |
| US-20200201182-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-25 | — | — | US | disclosed |
| EP-3671345-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-06-24 | — | — | EP | disclosed |
| CN-111132830-A | Decorative sheet and decorative plate | 大日本印刷株式会社 | 2020-05-08 | — | — | CN | disclosed |
| US-10619126-B2 | Cleaning compositions and methods of use therefor | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2020-04-14 | — | — | US | disclosed |
| US-20200110338-A1 | Photosensitive Material and Method of Lithography | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-04-09 | — | — | US | disclosed |
| US-20200095635-A1 | Photoactive Compounds and Methods for Biomolecule Detection and Sequencing | VIBRANT HOLDINGS, LLC | 2020-03-26 | — | — | US | disclosed |
| CN-110875175-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2020-03-10 | — | — | CN | disclosed |
| US-20200075052-A1 | MAGNETIC RECORDING MEDIUM, MAGNETIC RECORDING AND REPRODUCING APPARATUS, AND COMPOSITION FOR MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2020-03-05 | — | — | US | disclosed |
| US-20200073243-A1 | Photosensitive Middle Layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-03-05 | — | — | US | disclosed |
| US-20200050110-A1 | Resist Solvents for Photolithography Applications | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-02-13 | — | — | US | disclosed |
| CN-110764177-A | Optical multilayer film, optical member including the same, and display device | SKC株式会社 | 2020-02-07 | — | — | CN | disclosed |
| CN-110660651-A | Method for forming semiconductor structure | 台湾积体电路制造股份有限公司 | 2020-01-07 | — | — | CN | disclosed |
| US-20190391308-A1 | OPTICAL FILM, POLARIZATION PLATE, AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2019-12-26 | — | — | US | disclosed |
| CN-110554568-A | method for manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MFG CO LTD | 2019-12-10 | — | — | CN | disclosed |
| US-20190352594-A1 | CULTURE VESSEL HOUSING APPARATUS | KATAOKA CORPORATION (JP) | 2019-11-21 | — | — | US | disclosed |
| EP-3367164-B1 | PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2019-11-13 | — | — | EP | disclosed |
| US-10457025-B2 | Sheet | DAI NIPPON PRINTING CO., LTD. (JP) | 2019-10-29 | — | — | US | disclosed |
| EP-3526644-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING SAME | Ridgefield Acquisition (LU) | 2019-08-21 | — | — | EP | disclosed |
| US-20190235382-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING SAME | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2019-08-01 | — | — | US | disclosed |
| EP-3513968-A1 | COSMETIC SHEET AND COSMETIC PLATE | Dai Nippon Printing Co., Ltd. (JP) | 2019-07-24 | — | — | EP | disclosed |
| US-20190194745-A1 | Photoactive Compounds and Methods for Biomolecule Detection and Sequencing | VIBRANT HOLDINGS, LLC | 2019-06-27 | — | — | US | disclosed |
| US-20190185707-A1 | ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2019-06-20 | — | — | US | disclosed |
| US-20190184688-A1 | COSMETIC SHEET AND COSMETIC PLATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2019-06-20 | — | — | US | disclosed |
| CN-109804311-A | Chemically amplified positive photo agent composition and the pattern forming method for using it | 睿智弗尤德收购公司 | 2019-05-24 | — | — | CN | disclosed |
| EP-3327504-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2019-05-15 | — | — | EP | disclosed |
| US-10290900-B2 | Non-aqueous electrolytic solution and lithium ion secondary battery comprising same | NIPPON SHOKUBAI CO., LTD. (JP) | 2019-05-14 | — | — | US | disclosed |
| EP-3467091-A1 | CELL TREATMENT SYSTEM | Kataoka Corporation (JP) | 2019-04-10 | — | — | EP | disclosed |
| US-20190077124-A1 | DECORATIVE SHEET FOR FLOORS AND DECORATIVE PANEL FOR FLOORS | DAI NIPPON PRINTING CO., LTD. (JP) | 2019-03-14 | — | — | US | disclosed |
| CN-106795275-B | Actinic-radiation curable composition | 株式会社钟化 | 2019-03-05 | — | — | CN | disclosed |
| WO-2019040394-A1 | CLEANING COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2019-02-28 | — | — | WO | disclosed |
| EP-3056552-B1 | ACTIVE ENERGY-RAY-CURABLE RESIN COMPOSITION FOR COATING ORGANIC OR INORGANIC SUBSTRATE | KANEKA CORP (JP) | 2019-02-20 | — | — | EP | disclosed |
| EP-3437859-A1 | DECORATIVE SHEET FOR FLOORS AND DECORATIVE PANEL FOR FLOORS | Dai Nippon Printing Co., Ltd. (JP) | 2019-02-06 | — | — | EP | disclosed |
| CN-109312162-A | Thermoplastic resin composition, formed body, film and laminated body | 株式会社可乐丽 | 2019-02-05 | — | — | CN | disclosed |
| US-20180354076-A1 | CELL PROCESSING METHOD, LASER PROCESSING MACHINE | KATAOKA CORPORATION (JP) | 2018-12-13 | — | — | US | disclosed |
| WO-2018218250-A2 | PHOTOACTIVE COMPOUNDS AND METHODS FOR BIOMOLECULE DETECTION AND SEQUENCING | VIBRANT HOLDINGS, LLC (US) | 2018-11-29 | — | — | WO | disclosed |
| US-10131810-B2 | Active energy-ray-curable resin composition for coating organic or inorganic substrate | KANCKA CORPORATION (JP) | 2018-11-20 | — | — | US | disclosed |
| US-20180269102-A1 | FORMATION METHOD OF SEMICONDUCTOR DEVICE STRUCTURE USING MULTILAYER RESIST LAYER | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2018-09-20 | — | — | US | disclosed |
| US-10079178-B1 | Formation method of semiconductor device structure using multilayer resist layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD (TW) | 2018-09-18 | — | — | US | disclosed |
| US-20180257328-A1 | COSMETIC SHEET AND COSMETIC PLATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2018-09-13 | — | — | US | disclosed |
| CN-105324420-B | Composition for encapsulating film, and electronic device including the same | LG化学株式会社 | 2018-09-04 | — | — | CN | disclosed |
| EP-3367164-A1 | PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-08-29 | — | — | EP | disclosed |
| US-20180239255-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-08-23 | — | — | US | disclosed |
| EP-3357685-A1 | COSMETIC SHEET AND COSMETIC PLATE | Dai Nippon Printing Co., Ltd. (JP) | 2018-08-08 | — | — | EP | disclosed |
| CN-105408435-B | Active energy line curing resin composition for coating organic/inorganic substrate | 株式会社钟化 | 2018-07-24 | — | — | CN | disclosed |
| US-20180201884-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREFOR | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2018-07-19 | — | — | US | disclosed |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-10007181-B2 | Chemically amplified positive resist dry film, dry film laminate and method of preparing laminate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| EP-3327504-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-20180142193-A1 | CELL TREATMENT METHOD, LASER PROCESSING MACHINE, AND CELL CULTURE VESSEL | KATAOKA CORPORATION (JP) | 2018-05-24 | — | — | US | disclosed |
| US-20180143535-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-24 | — | — | US | disclosed |
| EP-2821780-B1 | In-situ fingerprinting for electrochemical deposition and/or electrochemical etching | ANCOSYS GMBH (DE) | 2018-05-23 | — | — | EP | disclosed |
| US-9978594-B1 | Formation method of semiconductor device structure using patterning stacks | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2018-05-22 | — | — | US | disclosed |
| US-20180138034-A1 | FORMATION METHOD OF SEMICONDUCTOR DEVICE STRUCTURE USING PATTERNING STACKS | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2018-05-17 | — | — | US | disclosed |
| EP-3315600-A1 | CELL TREATMENT METHOD AND LASER BEAM MACHINE | Kataoka Corporation (JP) | 2018-05-02 | — | — | EP | disclosed |
| EP-3309614-A1 | RADIATION SENSITIVE COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2018-04-18 | — | — | EP | disclosed |
| EP-3305888-A1 | CELL TREATMENT METHOD, LASER PROCESSING MACHINE, AND CELL CULTURE VESSEL | Kataoka Corporation (JP) | 2018-04-11 | — | — | EP | disclosed |
| US-20180043669-A1 | SHEET | DAI NIPPON PRINTING CO., LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| EP-3275648-A1 | SHEET | Dai Nippon Printing Co., Ltd. (JP) | 2018-01-31 | — | — | EP | disclosed |
| EP-3128368-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2018-01-24 | — | — | EP | disclosed |
| US-9766545-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-09-19 | — | — | US | disclosed |
| CN-105324407-B | Active energy ray-curable composition | 株式会社钟化 | 2017-07-28 | — | — | CN | disclosed |
| US-9704711-B2 | Silicon-based middle layer composition | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-07-11 | — | — | US | disclosed |
| CN-106876251-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2017-06-20 | — | — | CN | disclosed |
| US-20170168398-A1 | PHOTOSENSITIVE MATERIAL AND METHOD OF LITHOGRAPHY | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2017-06-15 | — | — | US | disclosed |
| CN-106795275-A | Actinic-radiation curable composition | 株式会社钟化 | 2017-05-31 | — | — | CN | disclosed |
| EP-3163374-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-05-03 | — | — | EP | disclosed |
| US-20170115567-A1 | Chemically Amplified Positive Resist Composition and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170117582-A1 | NON-AQUEOUS ELECTROLYTIC SOLUTION AND LITHIUM ION SECONDARY BATTERY COMPRISING SAME | NIPPON SHOKUBAI CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9618656-B2 | Anti-glare film, method for producing anti-glare film, polarizer and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9606435-B2 | Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9606271-B2 | Anti-glare film, method for producing anti-glare film, polarizer, and image display device having different size particles with impregnation layers | DAI NIPPON PRINTING CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| EP-2993521-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE | SHINETSU CHEMICAL CO (JP) | 2017-03-22 | — | — | EP | disclosed |
| US-20170038684-A1 | Chemically Amplified Positive Resist Composition and Pattern Forming Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |
| EP-3128368-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-02-08 | — | — | EP | disclosed |
| EP-2692779-B1 | COLORED RESIN PARTICLE, METHOD FOR PRODUCING SAME, AND USE THEREOF | SEKISUI PLASTICS (JP) | 2017-01-25 | — | — | EP | disclosed |
| US-9529121-B2 | Anti-glare film, method for producing anti-glare film, polarizer and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9519217-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| US-20160284537-A1 | SILICON-BASED MIDDLE LAYER COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-09-29 | — | — | US | disclosed |
| EP-3056552-A1 | ACTIVE ENERGY-RAY-CURABLE RESIN COMPOSITION FOR COATING ORGANIC OR INORGANIC SUBSTRATE | Kaneka Corporation (JP) | 2016-08-17 | — | — | EP | disclosed |
| US-9405040-B2 | Optical layered body, method of producing the same, polarizer and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160152861-A1 | ACTIVE ENERGY-RAY-CURABLE RESIN COMPOSITION FOR COATING ORGANIC OR INORGANIC SUBSTRATE | KANEKA CORPORATION (JP) | 2016-06-02 | — | — | US | disclosed |
| US-20160070170-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-03-10 | — | — | US | disclosed |
| EP-2993521-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST DRY FILM, DRY FILM LAMINATE AND METHOD OF PREPARING LAMINATE | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-03-09 | — | — | EP | disclosed |
| EP-2955576-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-16 | — | — | EP | disclosed |
| US-20150355543-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-10 | — | — | US | disclosed |
| EP-1391476-B1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2015-12-09 | — | — | EP | disclosed |
| US-20150331324-A1 | Methods for Small Trench Patterning Using Chemical Amplified Photoresist Compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-11-19 | — | — | US | disclosed |
| US-9146469-B2 | Middle layer composition for trilayer patterning stack | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-09-29 | — | — | US | disclosed |
| EP-1975711-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| US-9097844-B2 | Optical layered body, polarizer, and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-9093276-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-07-28 | — | — | US | disclosed |
| US-9075306-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-9063421-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| EP-2103592-B1 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-06-03 | — | — | EP | disclosed |
| US-9017928-B2 | Methods for manufacturing resin structure and micro-structure | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-9017905-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-8993114-B2 | Hard coat film, polarizer and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8980525-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-17 | — | — | US | disclosed |
| US-8968982-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8951717-B2 | Methods for manufacturing resin structure and micro-structure | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-10 | — | — | US | disclosed |
| EP-2825523-A1 | NOVEL SULFONATE-BASED TRIMEBUTINE SALTS | Gicare Pharma Inc. (CA) | 2015-01-21 | — | — | EP | disclosed |
| US-20150008132-A1 | IN-SITU FINGERPRINTING FOR ELECTROCHEMICAL DEPOSITION AND/OR ELECTROCHEMICAL ETCHING | Nova Measuring Instruments GmbH (DE) | 2015-01-08 | — | — | US | disclosed |
| EP-2821780-A1 | In-situ fingerprinting for electrochemical deposition and/or electrochemical etching | Ancosys GmbH (DE) | 2015-01-07 | — | — | EP | disclosed |
| EP-2081084-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-12-24 | — | — | EP | disclosed |
| US-20140356790-A1 | METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE SACRIFICIAL FILM-FORMING COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2014-12-04 | — | — | US | disclosed |
| EP-2533099-B1 | Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition | SHINETSU CHEMICAL CO (JP) | 2014-10-29 | — | — | EP | disclosed |
| EP-2479611-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-10-15 | — | — | EP | disclosed |
| US-20140272709-A1 | MIDDLE LAYER COMPOSITION FOR TRILAYER PATTERNING STACK | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-09-18 | — | — | US | disclosed |
| US-8835091-B2 | Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20140255833-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| US-20140220497-A1 | METHODS FOR MANUFACTURING RESIN STRUCTURE AND MICRO-STRUCTURE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |
| US-8753797-B2 | Surface-modified middle layers | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-06-17 | — | — | US | disclosed |
| US-8741548-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8715784-B2 | Method of producing optical layered body, optical layered body, polarizer and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20140086862-A1 | COLORED RESIN PARTICLES, METHOD FOR PRODUCING THE SAME, AND USE THEREOF | SEKISUI PLASTICS CO., LTD. (JP) | 2014-03-27 | — | — | US | disclosed |
| US-20140087294-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-27 | — | — | US | disclosed |
| US-20140072914-A1 | METHODS FOR MANUFACTURING RESIN STRUCTURE AND MICRO-STRUCTURE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-13 | — | — | US | disclosed |
| US-20140065552-A1 | Methods For Small Trench Patterning Using Chemical Amplified Photoresist Compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-03-06 | — | — | US | disclosed |
| EP-2692779-A1 | COLORED RESIN PARTICLE, METHOD FOR PRODUCING SAME, AND USE THEREOF | Sekisui Plastics Co., Ltd. (JP) | 2014-02-05 | — | — | EP | disclosed |
| US-8592137-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2013-11-26 | — | — | US | disclosed |
| US-8580915-B2 | Process for preparing stable photoresist compositions | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2013-11-12 | — | — | US | disclosed |
| US-20130295390-A1 | HARD COAT FILM, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20130286478-A1 | ANTI-GLARE FILM, METHOD FOR PRODUCING ANTI-GLARE FILM, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20130279010-A1 | ANTI-GLARE FILM, METHOD FOR PRODUCING ANTI-GLARE FILM, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| US-20130271832-A1 | ANTISTATIC HARDCOAT FILM, PROCESS FOR PRODUCING SAME, POLARIZER, AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD (JP) | 2013-10-17 | — | — | US | disclosed |
| US-20130250413-A1 | ANTI-GLARE FILM, METHOD FOR PRODUCING ANTI-GLARE FILM, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| WO-2013134869-A1 | NOVEL SULFONATE-BASED TRIMEBUTINE SALTS | GICARE PHARMA INC. (CA) | 2013-09-19 | — | — | WO | disclosed |
| EP-1204001-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-09-11 | — | — | EP | disclosed |
| US-20130222906-A1 | OPTICAL LAYERED BODY, POLARIZER, AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| EP-2146246-B1 | Negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-28 | — | — | EP | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-8493660-B2 | Optical layered body comprising a light-transmitting substrate and antiglare layer, polarizer and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-07-23 | — | — | US | disclosed |
| US-8485673-B2 | Method for producing optical layered body, production apparatus of optical layered body, optical layered body, polarizer and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-07-16 | — | — | US | disclosed |
| EP-2100887-B1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| US-20130155381-A1 | METHODS FOR SMALL TRENCH PATTERNING USING CHEMICAL AMPLIFIED PHOTORESIST COMPOSITIONS | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) | 2013-06-20 | — | — | US | disclosed |
| EP-1791025-B1 | Negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-20130129988-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20130115469-A1 | CURABLE RESIN COMPOSITION FOR HARD COAT LAYER, METHOD FOR PRODUCING HARD COAT FILM, HARD COAT FILM, POLARIZING PLATE AND DISPLAY PANEL | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-05-09 | — | — | US | disclosed |
| CN-101506693-B | Optical laminate, polarizing plate and image display device | DAINIPPON PRINTING CO LTD | 2013-05-08 | — | — | CN | disclosed |
| US-8431219-B2 | Optical layered body including an antiglare layer containing organic particles and nonspherical silica particles | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8422133-B2 | Optical layered body, polarizer, and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8399168-B2 | Method for producing toner, two-component developer, developing device and image forming apparatus | SHARP KABUSHIKI KAISHA (JP) | 2013-03-19 | — | — | US | disclosed |
| EP-1803773-B1 | POLYMERIZABLE LIQUID-CRYSTAL COMPOSITION AND LIQUID-CRYSTAL FILM MADE FROM THE COMPOSITION | NIPPON OIL CORP (JP) | 2013-02-27 | — | — | EP | disclosed |
| US-20130026044-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| EP-2551722-A1 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-01-30 | — | — | EP | disclosed |
| US-8354162-B2 | Curable resin composition for anti-glare layer, and anti-glare film | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-01-15 | — | — | US | disclosed |
| US-8339609-B2 | Evaluation method of fouling, fouling evaluation apparatus, production method of optical member, optical layered body, and display product | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-12-25 | — | — | US | disclosed |
| EP-2533099-A2 | Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-12-12 | — | — | EP | disclosed |
| US-20120292286-A1 | METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE SACRIFICIAL FILM-FORMING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| US-8314936-B2 | Evaluation method of fouling, fouling evaluation apparatus, production method of optical member, optical layered body, and display product | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| EP-1850155-B1 | HOMEOTROPICALLY ORIENTED LIQUID-CRYSTAL FILM, OPTICAL FILM COMPRISING THE SAME, AND IMAGE DISPLAY | NIPPON OIL CORP (JP) | 2012-11-14 | — | — | EP | disclosed |
| US-20120264857-A1 | PROCESS FOR PREPARING STABLE PHOTORESIST COMPOSITIONS | DUPONT ELECTRONIC POLYMERS LP | 2012-10-18 | — | — | US | disclosed |
| US-20120243115-A1 | OPTICAL LAYERED BODY AND METHOD FOR PRODUCING OPTICAL LAYERED BODY | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-09-27 | — | — | US | disclosed |
| US-8268531-B2 | Photoacid generator compounds and compositions | CORNELL RESEARCH FOUNDATION, INC. (US) | 2012-09-18 | — | — | US | disclosed |
| EP-1308782-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-09-05 | — | — | EP | disclosed |
| EP-1378795-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-08-29 | — | — | EP | disclosed |
| US-8252504-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-28 | — | — | US | disclosed |
| EP-2479611-A2 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-8226209-B2 | Inkjet printhead and method of manufacturing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-07-24 | — | — | US | disclosed |
| US-20120184100-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120184101-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-8216766-B2 | Polymer, polymer preparation method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-10 | — | — | US | disclosed |
| US-8207278-B2 | Process for preparing stable photoresist compositions | DUPONT ELECTRONIC POLYMERS LP (US) | 2012-06-26 | — | — | US | disclosed |
| EP-1117003-B1 | Process of preparing a chemical amplification type resist composition | SHINETSU CHEMICAL CO (JP) | 2012-06-20 | — | — | EP | disclosed |
| EP-2466348-A1 | LIQUID-CRYSTAL FILM AND OPTICAL ELEMENT OBTAINED USING SAME | JX Nippon Oil & Energy Corporation (JP) | 2012-06-20 | — | — | EP | disclosed |
| US-8203673-B2 | Elliptical polarizer and vertical alignment type liquid crystal display device comprising the same | NIPPON OIL CORPORATION (JP) | 2012-06-19 | — | — | US | disclosed |
| US-20120147469-A1 | EVALUATION METHOD OF FOULING, FOULING EVALUATION APPARATUS, PRODUCTION METHOD OF OPTICAL MEMBER, OPTICAL LAYERED BODY, AND DISPLAY PRODUCT | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120147378-A1 | EVALUATION METHOD OF FOULING, FOULING EVALUATION APPARATUS, PRODUCTION METHOD OF OPTICAL MEMBER, OPTICAL LAYERED BODY, AND DISPLAY PRODUCT | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120133882-A1 | LIQUID CRYSTAL FILM AND OPTICAL ELEMENT PRODUCED USING SAME | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-8178238-B2 | Positive-electrode active material for lithium-ion secondary battery, positive electrode, manufacturing method thereof, and lithium-ion secondary battery | SONY CORPORATION (JP) | 2012-05-15 | — | — | US | disclosed |
| EP-1990339-B1 | DIOXETANE COMPOUND, CATIONICALLY POLYMERIZABLE COMPOSITION, OPTICAL FILM AND LIQUID CRYSTAL DISPLAY UNIT | NIPPON OIL CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-8163461-B2 | Photoacid generator compounds and compositions | CORNELL RESEARCH FOUNDATION, INC. (US) | 2012-04-24 | — | — | US | disclosed |
| EP-1684118-B1 | Patterning process using a negative resist composition | SHINETSU CHEMICAL CO (JP) | 2012-04-18 | — | — | EP | disclosed |
| US-8144330-B2 | Evaluation method of fouling, fouling evaluation apparatus, production method of optical member, optical layered body, and display product | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-03-27 | — | — | US | disclosed |
| US-8137766-B2 | Homeotropic alignment liquid crystal film, optical film comprising the same, and image display device | NIPPON OIL CORPORATION (JP) | 2012-03-20 | — | — | US | disclosed |
| US-8134659-B2 | Elliptical polarizer and vertical alignment type liquid crystal display device using the same | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2012-03-13 | — | — | US | disclosed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-8101335-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-8057981-B2 | Resist composition, resist protective coating composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-15 | — | — | US | disclosed |
| US-8053165-B2 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-08 | — | — | US | disclosed |
| US-8043788-B2 | Alkali soluble resin; immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-8039198-B2 | Sulfonium salt-containing polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-18 | — | — | US | disclosed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | disclosed |
| US-8030515-B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| EP-1422255-B1 | MAIN CHAIN TYPE LIQUID CRYSTAL POLYESTER LIQUID CRYSTALLINE COMPOSITION METHOD FOR PRODUCING LIQUID CRYSTAL FILM OPTICAL FILM AND DISPLAY | NIPPON OIL CORP (JP) | 2011-09-28 | — | — | EP | disclosed |
| EP-2081083-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-09-21 | — | — | EP | disclosed |
| US-8021822-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-20 | — | — | US | disclosed |
| US-8017302-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-13 | — | — | US | disclosed |
| US-8003295-B2 | Patterning process and resist composition used therein | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-23 | — | — | US | disclosed |
| US-7998543-B2 | Dioxetane compound, cationically polymerizable composition, optical film, and liquid crystal display device | NIPPON OIL CORPORATION (JP) | 2011-08-16 | — | — | US | disclosed |
| US-7998657-B2 | Ester compounds and their preparation, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-16 | — | — | US | disclosed |
| US-7993811-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-09 | — | — | US | disclosed |
| US-7985528-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-26 | — | — | US | disclosed |
| US-20110177464-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-21 | — | — | US | disclosed |
| US-7982380-B2 | Front filter for plasma display and plasma display | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-07-19 | — | — | US | disclosed |
| US-7981589-B2 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-19 | — | — | US | disclosed |
| US-7977027-B2 | Base resin is a polyvinylphenol derivative having an alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali; a sulfonium phtoacid generator, tris(2-(methoxymethoxy)ethyl)amine oxide, a solvent; photoresist; high resolution | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20110160481-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-30 | — | — | US | disclosed |
| EP-2090598-B1 | Polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-06-29 | — | — | EP | disclosed |
| EP-2101217-B1 | Sulfonium salt-containing polymer, resist compositon, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-05-11 | — | — | EP | disclosed |
| US-7928262-B2 | Onium salts, oxime sulfonates and sulfonyloxyimides derived from these sulfonium salts are effective photoacid generators in chemically amplified resist compositions; sensitive to high-energy radiation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-04-19 | — | — | US | disclosed |
| CN-101568859-B | elliptical polarizer and vertical alignment type liquid crystal display device using the same | NIPPON OIL CORP | 2011-04-13 | — | — | CN | disclosed |
| US-20110082255-A1 | Process for preparing stable photoresist compositions | RUSSELL WILLIAM RICHARD | 2011-04-07 | — | — | US | disclosed |
| US-7919226-B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20110063547-A1 | ELLIPTICAL POLARIZER AND VERTICAL ALIGNMENT TYPE LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2011-03-17 | — | — | US | disclosed |
| US-7902385-B2 | Ester compounds and their preparation, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-03-08 | — | — | US | disclosed |
| US-20110054133-A1 | RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-03-03 | — | — | US | disclosed |
| EP-2290414-A1 | ELLIPTICAL LIGHT POLARIZING PLATE AND VERTICALLY ORIENTED LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME | JX Nippon Oil & Energy Corporation (JP) | 2011-03-02 | — | — | EP | disclosed |
| EP-2081085-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-03-02 | — | — | EP | disclosed |
| US-20110039204-A1 | ESTER COMPOUNDS AND THEIR PREPARATION, POLYMERS, RESIST COMPOSITIONS AND PATTERNING PROCESS | OHASHI MASAKI | 2011-02-17 | — | — | US | disclosed |
| CN-101331630-B | Negative electrode and method for producing same, and battery and method for producing same | SONY CORP | 2011-01-26 | — | — | CN | disclosed |
| US-7871752-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20110008732-A1 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS | CORNELL RESEARCH FOUNDATION, INC. (US) | 2011-01-13 | — | — | US | disclosed |
| US-7868199-B2 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | EUDYNA DEVICES INC. (JP) | 2011-01-11 | — | — | US | disclosed |
| US-7862983-B2 | Process for preparing stable photoresist compositions | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2011-01-04 | — | — | US | disclosed |
| EP-1505443-B1 | Resist polymer, resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-12-22 | — | — | EP | disclosed |
| US-7839570-B2 | Optical layered body, polarizer and image display device | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-11-23 | — | — | US | disclosed |
| US-7833694-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | disclosed |
| US-7824043-B2 | Reflection preventing layered product and optical member | ZEON CORPORATION (JP) | 2010-11-02 | — | — | US | disclosed |
| US-7824839-B2 | cationic lactone containing perfluorinated sulfonate or sulfonimides with iodonium or sulfonium anions as photoacid generator, a polyhydroxystyrene homo or copolymer and a solvent (propylene glycol/1,2-/, monoalkyl ether, ethyl lactone ); semiconductor, heat exposure, pattern forming; development | CORNELL RESEARCH FOUNDATION, INC. (US) | 2010-11-02 | — | — | US | disclosed |
| US-20100221653-A1 | Process for preparing stable photoresist compositions | DuPont Electronic Polymers L>P> (US) | 2010-09-02 | — | — | US | disclosed |
| US-20100208182-A1 | METHOD FOR MANUFACTURING OPTICAL FILM | NIPPON OIL CORPORATION (JP) | 2010-08-19 | — | — | US | disclosed |
| US-7771913-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7771914-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-20100195311-A1 | OPTICAL LAYERED BODY, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-08-05 | — | — | US | disclosed |
| US-7763182-B2 | Liquid crystalline composition with improved adhesivity, liquid crystal film comprising the composition, and liquid crystal display device equipped with the film | NIPPON OIL CORPORATION (JP) | 2010-07-27 | — | — | US | disclosed |
| US-20100177397-A1 | FRONT FILTER FOR PLASMA DISPLAY AND PLASMA DISPLAY | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20100171916-A1 | HOMEOTROPIC ALIGNMENT LIQUID CRYSTAL FILM, OPTICAL FILM COMPRISING THE SAME, AND IMAGE DISPLAY DEVICE | NIPPON OIL CORPORATION (JP) | 2010-07-08 | — | — | US | disclosed |
| US-20100167068-A1 | OPTICAL LAYERED BODY, METHOD OF PRODUCING THE SAME, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-07-01 | — | — | US | disclosed |
| EP-2202546-A1 | METHOD FOR PRODUCING OPTICAL FILM | Nippon Oil Corporation (JP) | 2010-06-30 | — | — | EP | disclosed |
| US-7741429-B2 | Process for preparing stable photoresist compositions | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2010-06-22 | — | — | US | disclosed |
| US-7732024-B2 | Homeotropic alignment liquid crystal film, optical film comprising the same, and image display device | NIPPON OIL CORPORATION (JP) | 2010-06-08 | — | — | US | disclosed |
| US-7727704-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-01 | — | — | US | disclosed |
| US-7718342-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-18 | — | — | US | disclosed |
| US-20100118309-A1 | Evaluation Method of Fouling, Fouling Evaluation Apparatus, Production Method of Optical Member, Optical Layered Body, and Display Product | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20100112296-A1 | CURABLE RESIN COMPOSITION FOR ANTI-GLARE LAYER, AND ANTI-GLARE FILM | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-05-06 | — | — | US | disclosed |
| US-20100105785-A1 | Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same | SHEEHAN MICHAEL T | 2010-04-29 | — | — | US | disclosed |
| US-20100097705-A1 | METHOD FOR PRODUCING OPTICAL LAYERED BODY, PRODUCTION APPARATUS OF OPTICAL LAYERED BODY, OPTICAL LAYERED BODY, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO. LTD (JP) | 2010-04-22 | — | — | US | disclosed |
| EP-1783551-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-04-14 | — | — | EP | disclosed |
| US-7691561-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-06 | — | — | US | disclosed |
| US-20100079547-A1 | INKJET PRINTHEAD AND METHOD OF MANUFACTURING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| US-7687222-B2 | Polymerizable ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-7678530-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-16 | — | — | US | disclosed |
| US-20100062366-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100062373-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100062374-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100062372-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100055597-A1 | METHOD FOR PRODUCING TONER, TWO-COMPONENT DEVELOPER, DEVELOPING DEVICE AND IMAGE FORMING APPARATUS | SHARP KABUSHIKI KAISHA (JP) | 2010-03-04 | — | — | US | disclosed |
| US-7666571-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-7662538-B2 | Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same | Du Pont Electronic Polymers L.P. (US) | 2010-02-16 | — | — | US | disclosed |
| US-20100026936-A1 | Elliptical Polarizer and Vertical Alignment Type Liquid Crystal Display Device Comprising the Same | NIPPON OIL CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-2146246-A1 | Negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-7638260-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-29 | — | — | US | disclosed |
| US-7629108-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-08 | — | — | US | disclosed |
| US-7622242-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-24 | — | — | US | disclosed |
| US-7618763-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-17 | — | — | US | disclosed |
| US-7618765-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-17 | — | — | US | disclosed |
| US-7618764-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-17 | — | — | US | disclosed |
| US-20090280434-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-12 | — | — | US | disclosed |
| US-7611821-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-03 | — | — | US | disclosed |
| CN-101568859-A | Elliptical polarizer and vertical alignment type liquid crystal display device using the same | NIPPON OIL CORP (JP) | 2009-10-28 | — | — | CN | disclosed |
| US-20090258315-A1 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS | CORNELL RESEARCH FOUNDATION, INC. (US) | 2009-10-15 | — | — | US | disclosed |
| US-7601479-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-13 | — | — | US | disclosed |
| US-20090252932-A1 | ACTINIC ENERGY RAY CURABLE RESION COMPOSITION AND USE THEREOF | KURARAY CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| CN-100547441-C | Vertical orientated liquid crystal film, the blooming that comprises this film and image display unit | NIPPON OIL CORP (JP) | 2009-10-07 | — | — | CN | disclosed |
| US-7598015-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-7598016-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20090246686-A1 | POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090239179-A1 | HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-24 | — | — | US | disclosed |
| EP-2103592-A2 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-23 | — | — | EP | disclosed |
| US-20090233223-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| EP-2100887-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-2101217-A1 | Sulfonium salt-containing polymer, resist compositon, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-16 | — | — | EP | disclosed |
| US-20090214960-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20090207492-A1 | OPTICAL LAYERED BODY, POLARIZER, AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090208673-A1 | Liquid Crystalline Composition with Improved Adhesivity, Liquid Crystal Film Comprising the Composition, and Liquid Crystal Display Device Equipped with the Film | NIPPON OIL CORPORATION (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090208867-A1 | Resist Composition, Resist Protective Coating Composition, and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090208873-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| EP-2090598-A1 | Polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-7575150-B2 | Flux composition for solder, solder paste, and method of soldering | NOF CORPORATION (JP) | 2009-08-18 | — | — | US | disclosed |
| CN-101506693-A | Optical laminate, polarizing plate and image display device | DAINIPPON PRINTING CO LTD (JP) | 2009-08-12 | — | — | CN | disclosed |
| US-7569324-B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| US-7569326-B2 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| US-7569277-B2 | Optical laminate | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| EP-2083290-A1 | ELLIPTIC POLARIZING PLATE AND VERTICALLY ALIGNED LIQUID CRYSTAL DISPLAY USING THE SAME | Nippon Oil Corporation (JP) | 2009-07-29 | — | — | EP | disclosed |
| US-20090186297-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186298-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186296-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| EP-2081083-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081085-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081084-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-7556909-B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-2070901-A1 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-06-17 | — | — | EP | disclosed |
| US-7541133-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-06-02 | — | — | US | disclosed |
| US-20090136868-A1 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS | CORNELL RESEARCH FOUNDATION, INC. | 2009-05-28 | — | — | US | disclosed |
| US-7537880-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-20090123851-A1 | POSITIVE-ELECTRODE ACTIVE MATERIAL FOR LITHIUM-ION SECONDARY BATTERY, POSITIVE ELECTRODE, MANUFACTURING METHOD THEREOF, AND LITHIUM-ION SECONDARY BATTERY | SONY CORPORATION (JP) | 2009-05-14 | — | — | US | disclosed |
| US-7531290-B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7527912-B2 | Photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| US-7514204-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20090087786-A1 | PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-7511169-B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-31 | — | — | US | disclosed |
| US-20090081588-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090075482-A1 | PROCESS FOR FORMING A PATTERN INCLUDING ON A SEMICONDUCTOR DEVICE | NEC ELECTRONICS CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-20090075074-A1 | OPTICAL LAYERED BODY, METHOD OF PRODUCING THE SAME, POLARIZER, AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-03-19 | — | — | US | disclosed |
| US-20090068379-A1 | DIOXETANE COMPOUND, CATIONICALLY POLYMERIZABLE COMPOSITION, OPTICAL FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | NIPPON OIL CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| US-7501223-B2 | Polymer, resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-10 | — | — | US | disclosed |
| US-7498126-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20090053651-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-7494760-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20090035699-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| CN-100458519-C | Liquid crystal film and liquid crystal display element having the film | NIPPON OIL CORP (JP) | 2009-02-04 | — | — | CN | disclosed |
| US-7479361-B2 | Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process | NEC ELECTRONICS CORPORATION (JP) | 2009-01-20 | — | — | US | disclosed |
| US-20090015926-A1 | OPTICAL LAYERED BODY, METHOD OF PRODUCING THE SAME, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-01-15 | — | — | US | disclosed |
| US-20090011365-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| US-7471924-B2 | Cleaning unit and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2008-12-30 | — | — | US | disclosed |
| US-20080318160-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | RITTAL GMBH & CO. KG (DE) | 2008-12-25 | — | — | US | disclosed |
| CN-101331630-A | Negative electrode and method for producing same, and battery and method for producing same | SONY CORP (JP) | 2008-12-24 | — | — | CN | disclosed |
| US-7468236-B2 | Amine compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-23 | — | — | US | disclosed |
| EP-1990339-A1 | DIOXETANE COMPOUND, CATIONICALLY POLYMERIZABLE COMPOSITION, OPTICAL FILM AND LIQUID CRYSTAL DISPLAY UNIT | Nippon Oil Corporation (JP) | 2008-11-12 | — | — | EP | disclosed |
| US-20080268370-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-10-30 | — | — | US | disclosed |
| US-20080254386-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-10-16 | — | — | US | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241751-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| EP-1975711-A1 | Chemically amplified negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2008-10-01 | — | — | EP | disclosed |
| US-20080227032-A1 | ENVIRONMENTAL FRIENDLY PHOTOACID GENERATORS (PAGs) WITH NO PERFLUOROOCTYL SULFONATES | CORNELL RESEARCH FOUNDATION, INC. (US) | 2008-09-18 | — | — | US | disclosed |
| US-20080221290-A1 | METHOD OF PRODUCING OPTICAL LAYERED BODY, OPTICAL LAYERED BODY, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| EP-1966251-A1 | PROCESS FOR PREPARING STABLE PHOTORESIST COMPOSITIONS | Dupont Electronic Polymers L.P. (US) | 2008-09-10 | — | — | EP | disclosed |
| US-7416765-B2 | Polymerizable liquid crystalline composition and liquid crystal film made from the composition | NIPPON OIL CORPORATION (JP) | 2008-08-26 | — | — | US | disclosed |
| EP-1497339-B1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC TECHNOLOGIES (US) | 2008-07-30 | — | — | EP | disclosed |
| US-20080174875-A1 | OPTICAL LAYERED BODY, POLARIZER AND IMAGE DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-07-24 | — | — | US | disclosed |
| US-7393627-B2 | Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS) | CORNELL RESEARCH FOUNDATION, INC. (US) | 2008-07-01 | — | — | US | disclosed |
| US-20080124656-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080124652-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-29 | — | — | US | disclosed |
| US-20080124653-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-29 | — | — | US | disclosed |
| US-20080118860-A1 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080118863-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-22 | — | — | US | disclosed |
| CN-100388097-C | Polymerizable liquid crystalline composition and liquid crystal film produced from the same | NIPPON OIL CORP (JP) | 2008-05-14 | — | — | CN | disclosed |
| US-20080102407-A1 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-01 | — | — | US | disclosed |
| US-20080102405-A1 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-01 | — | — | US | disclosed |
| US-20080096128-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
| US-20080090173-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-17 | — | — | US | disclosed |
| US-20080090179-A1 | Novel polymer, resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-04-17 | — | — | US | disclosed |
| US-20080090172-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-04-17 | — | — | US | disclosed |
| US-20080085469-A1 | Novel photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | disclosed |
| US-20080073414-A1 | FLUX COMPOSITION FOR SOLDER, SOLDER PASTE, AND METHOD OF SOLDERING | NOF CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-7335458-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-02-26 | — | — | US | disclosed |
| US-20080026331-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| CN-101116019-A | Homeotropically oriented liquid-crystal film, optical film comprising the same, and image display | NIPPON OIL CORP SHIN NIHON SEK (JP) | 2008-01-30 | — | — | CN | disclosed |
| US-20080019729-A1 | Charging member cleaning roller, charging device, process cartridge, and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20080013177-A1 | Reflection Preventing Layered Product and Optical Member | ZEON CORPORATION (JP) | 2008-01-17 | — | — | US | disclosed |
| US-20080008961-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |
| US-20080008959-A1 | Resin comprising monomers of cyclopentyl- or cyclohexyl (meth)acrylate; hydroxyadamantyl (meth)acrylate; 3,8-epoxy-6-oxabicyclo[3.2.1]octyl (meth)acrylat;, and/or fluoroalkyl (meth)acrylate; ArF lithography; resolution; forms a pattern with high rectangularity | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |
| US-20080008960-A1 | Mixture of an adamantane acrylic ester resin which becomes soluble in alkaline developer under action of an acid and sulfonium salt acid generator; microlithography with advantages of resolution, pattern density dependence and mask fidelity; use in precise microfabrication | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |
| US-20080008962-A1 | Polymerizable ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-10 | — | — | US | disclosed |
| US-20080008965-A1 | Ester compounds and their preparation, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-10 | — | — | US | disclosed |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-7312016-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-7312013-B2 | Photoreactive composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-7312281-B2 | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2007-12-25 | — | — | US | disclosed |
| US-20070292768-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-12-20 | — | — | US | disclosed |
| US-20070287009-A1 | Polarizing Plate Protective Film, Reflection Preventive Polarizing Plate and Optical Product | ZEON CORPORATION (JP) | 2007-12-13 | — | — | US | disclosed |
| US-20070287096-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-12-13 | — | — | US | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070263152-A1 | Homeotropic Alignment Liquid Crystal Film, Optical Film Comprising the Same, and Image Display Device | NIPPON OIL CORPORATION (JP) | 2007-11-15 | — | — | US | disclosed |
| WO-2007124092-A2 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS | CORNELL RESEARCH FOUNDATION, INC. (US) | 2007-11-01 | — | — | WO | disclosed |
| EP-1850155-A1 | HOMEOTROPICALLY ORIENTED LIQUID-CRYSTAL FILM, OPTICAL FILM COMPRISING THE SAME, AND IMAGE DISPLAY | Nippon Oil Corporation (JP) | 2007-10-31 | — | — | EP | disclosed |
| US-7288363-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-30 | — | — | US | disclosed |
| US-7282316-B2 | Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-16 | — | — | US | disclosed |
| US-20070231738-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070231741-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-7276324-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-02 | — | — | US | disclosed |
| US-7267923-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-11 | — | — | US | disclosed |
| EP-1829850-A2 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-7261995-B2 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-28 | — | — | US | disclosed |
| US-20070189671-A1 | Method for manufacturing optical waveguide chip | SR CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-7252925-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-07 | — | — | US | disclosed |
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20070164255-A1 | POLYMERIZABLE LIQUID CRYSTALLINE COMPOSITION AND LIQUID CRYSTAL FILM MADE FROM THE COMPOSITION | NIPPON OIL CORPORATION (JP) | 2007-07-19 | — | — | US | disclosed |
| US-7244798-B2 | (Meth) acrylic compound having an oxetanyl group and liquid crystal film produced by using same | NIPPON OIL CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| US-20070160929-A1 | photoresists; photomasks; heat treatment; high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. | 2007-07-12 | — | — | US | disclosed |
| WO-2007078445-A1 | PROCESS FOR PREPARING STABLE PHOTORESIST COMPOSITIONS | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2007-07-12 | — | — | WO | disclosed |
| EP-1428823-B1 | LIQUID-CRYSTALLINE OXETANE COMPOUND, POLYMERIZABLE LIQUID-CRYSTALLINE COMPOSITION, PROCESS FOR PRODUCING LIQUID-CRYSTAL FILM, OPTICAL FILM, AND LIQUID-CRYSTAL DISPLAY | NIPPON OIL CORP (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1803773-A1 | POLYMERIZABLE LIQUID-CRYSTAL COMPOSITION AND LIQUID-CRYSTAL FILM MADE FROM THE COMPOSITION | Nippon Oil Corporation (JP) | 2007-07-04 | — | — | EP | disclosed |
| US-20070148594-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-06-28 | — | — | US | disclosed |
| US-20070148584-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070148587-A1 | Process for preparing stable photoresist compositions | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2007-06-28 | — | — | US | disclosed |
| US-7235343-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-26 | — | — | US | disclosed |
| CN-1983031-A | Photosensitive resin composition for organic light emitting diodes | DONGJIN SEMICHEM CO LTD (KR) | 2007-06-20 | — | — | CN | disclosed |
| EP-1791025-A2 | Negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-30 | — | — | EP | disclosed |
| US-20070111139-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070105042-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-10 | — | — | US | disclosed |
| EP-1136885-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2007-05-09 | — | — | EP | disclosed |
| EP-1783551-A2 | Resist composition and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2007-05-09 | — | — | EP | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099113-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099112-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| EP-1780199-A1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| EP-1780198-A1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-20070087287-A1 | Amine compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-04-19 | — | — | US | disclosed |
| EP-1405850-B1 | (Meth)acrylic compound having an oxetanyl group and liquid crystal film produced by using the same | NIPPON OIL CORP (JP) | 2007-03-07 | — | — | EP | disclosed |
| US-20070037091-A1 | 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability | KOITABASHI RYUJI | 2007-02-15 | — | — | US | disclosed |
| US-20070020005-A1 | Cleaning unit and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2007-01-25 | — | — | US | disclosed |
| US-7160610-B2 | Decorative material | DAI NIPPON PRINTING CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7135270-B2 | Resist polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-11-14 | — | — | US | disclosed |
| EP-1439025-B1 | FLUX COMPOSITION FOR SOLDER, SOLDER PASTE AND METHOD OF SOLDERING | NOF CORP (JP) | 2006-11-02 | — | — | EP | disclosed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | disclosed |
| US-7125590-B2 | Liquid crystal film and liquid crystal display device equipped with same | NIPPON OIL CORPORATION (JP) | 2006-10-24 | — | — | US | disclosed |
| US-20060228648-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-10-12 | — | — | US | disclosed |
| EP-1710230-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-10-11 | — | — | EP | disclosed |
| EP-1077391-B1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-09-27 | — | — | EP | disclosed |
| CN-1276817-C | Flux composition for solder, solder paste, and method of soldering | NOF CORP (JP) | 2006-09-27 | — | — | CN | disclosed |
| US-7109311-B2 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-09-19 | — | — | US | disclosed |
| EP-1701184-A1 | POLARIZING PLATE PROTECTIVE FILM, POLARIZING PLATE WITH REFLECTION PREVENTING FUNCTION AND OPTICAL PRODUCT | ZEON CORPORATION (JP) | 2006-09-13 | — | — | EP | disclosed |
| US-7101651-B2 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO.,LTD. (JP) | 2006-09-05 | — | — | US | disclosed |
| WO-2006091375-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2006-08-31 | — | — | WO | disclosed |
| US-20060188810-A1 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-24 | — | — | US | disclosed |
| EP-1693707-A1 | Positive resist composition, and patterning process using the same | Shinetsu Chemical Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
| CN-1821879-A | Positive resist composition, manufacture method and application of the same | SHINETSU CHEMICAL CO (JP) | 2006-08-23 | — | — | CN | disclosed |
| US-20060183051-A1 | Positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-17 | — | — | US | disclosed |
| US-7087273-B2 | Liquid crystalline oxetane compound, polymerizable liquid crystalline composition, method for producing liquid crystal film, optical film, and liquid crystal display | NIPPON OIL CORPORATION (JP) | 2006-08-08 | — | — | US | disclosed |
| US-20060166133-A1 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-27 | — | — | US | disclosed |
| EP-1684118-A1 | Negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-07-26 | — | — | EP | disclosed |
| US-20060152713-A1 | Optical laminate | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-07-13 | — | — | US | disclosed |
| EP-1469058-B1 | Liquid crystal film and liquid crystal display device equipped with same | NIPPON OIL CORP (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-7070711-B2 | Polymerizable liquid crystalline composition and liquid crystal film produced from the same | NIPPON OIL CORPORATION (JP) | 2006-07-04 | — | — | US | disclosed |
| EP-1524309-B1 | Polymerizable liquid crystalline composition and liquid crystal film produced from the same | NIPPON OIL CORP (JP) | 2006-06-07 | — | — | EP | disclosed |
| CN-1782877-A | Anti-corrosion agent composition | DAICEL CHEM (JP) | 2006-06-07 | — | — | CN | disclosed |
| US-7056640-B2 | Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-06-06 | — | — | US | disclosed |
| WO-2006052380-A1 | DERIVATIZED POLYHYDROXYSTRYRENE (DPHS)WITH A NOVOLAK TYPE STRUCTURE AND BLOCKED DPHS (BDPHS) AND PROCESSES FOR PREPARING THE SAME | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2006-05-18 | — | — | WO | disclosed |
| EP-1656572-A1 | FILM FOR PLASMA DISPLAY FILTER AND PLASMA DISPLAY FILTER COMPRISING THE SAME | LG Chem, Ltd. (KR) | 2006-05-17 | — | — | EP | disclosed |
| US-20060099531-A1 | Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-05-11 | — | — | US | disclosed |
| EP-1085984-B1 | I INKJET RECEPTOR MEDIA AND COATING SOLUTIONS THEREFOR | MINNESOTA MINING & MFG (US) | 2005-12-28 | — | — | EP | disclosed |
| US-20050282083-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-22 | — | — | US | disclosed |
| US-20050282082-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-22 | — | — | US | disclosed |
| US-20050271978-A1 | Resist polymer, making method, and chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-08 | — | — | US | disclosed |
| US-20050238993-A1 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-27 | — | — | US | disclosed |
| US-20050233245-A1 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-20 | — | — | US | disclosed |
| US-20050227164-A1 | Near infrared absorbing film and plasma display filter comprising the same | LG CHEM LTD. (KR) | 2005-10-13 | — | — | US | disclosed |
| WO-2005089355-A2 | ENVIRONMENTALLY FRIENDLY PHOTOACID GENERATORS (PAGS) WITH NO PERFLUOROOCTYL SULFONATES (PFOS) | CORNELL RESEARCH FOUNDATION, INC. (US) | 2005-09-29 | — | — | WO | disclosed |
| US-6949323-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20050208420-A1 | Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS) | CORNELL RESEARCH FOUNDATION, INC. | 2005-09-22 | — | — | US | disclosed |
| US-20050208424-A1 | (Meth)acrylate polymer comprising (co)monomers having adamantane group such as 2-ethyl-2-adamantyl-methacrylate, 10.0 g of hydroxyadamantyl methacrylate, 15.2 g of 4,8-dioxatricyclo[4.2.1.03,7]nonan-5-on-2-yl methacrylate; sensitive to high energy radiation; resolution; micropatterning | SHIN-ETSU CHEMICAL CO., LTD. | 2005-09-22 | — | — | US | disclosed |
| US-6916591-B2 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-07-12 | — | — | US | disclosed |
| US-20050142488-A1 | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity | DUPONT ELECTRONIC POLYMERS L.P. | 2005-06-30 | — | — | US | disclosed |
| US-6899829-B2 | Conductive polymer colloidal compositions with selectivity for non-conductive surfaces | SHIPLEY COMPANY, L.L.C. (US) | 2005-05-31 | — | — | US | disclosed |
| US-20050106500-A1 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-05-19 | — | — | US | disclosed |
| US-6894141-B2 | Main chain type liquid crystalline polyester, liquid crystalline composition, method for producing liquid crystal film and optical film, and display having optical film | NIPPON OIL CORPORATION (JP) | 2005-05-17 | — | — | US | disclosed |
| US-20050101752-A1 | (Meth) acrylic compound having an oxetanyl group and liquid crystal film produced by using same | NIPPON OIL CORPORATION | 2005-05-12 | — | — | US | disclosed |
| US-20050095533-A1 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-05-05 | — | — | US | disclosed |
| US-20050089796-A1 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-28 | — | — | US | disclosed |
| US-20050082513-A1 | Polymerizable liquid crystalline composition and liquid crystal film produced from the same | NIPPON OIL CORPORATION (JP) | 2005-04-21 | — | — | US | disclosed |
| EP-1524309-A1 | Polymerizable liquid crystalline composition and liquid crystal film produced from the same | Nippon Oil Corporation (JP) | 2005-04-20 | — | — | EP | disclosed |
| CN-1607436-A | Polymerizable liquid crystalline composition and liquid crystal film produced from the same | NIPPON OIL CORP (JP) | 2005-04-20 | — | — | CN | disclosed |
| US-6869748-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | disclosed |
| US-20050058938-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-17 | — | — | US | disclosed |
| CN-1595250-A | Liquid crystal film and liquid crystal display element having the film | NIPPON OIL CORP (JP) | 2005-03-16 | — | — | CN | disclosed |
| US-6864324-B2 | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity | CHEM FIRST ELECTRONIC MATERIALS L.P. (US) | 2005-03-08 | — | — | US | disclosed |
| US-20050048395-A1 | Novel sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. | 2005-03-03 | — | — | US | disclosed |
| US-6861198-B2 | Negative resist material and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-01 | — | — | US | disclosed |
| US-20050042531-A1 | Film for plasma display filter and plasma display filter comprising the same | LG CHEM, LTD. (KR) | 2005-02-24 | — | — | US | disclosed |
| WO-2005017579-A1 | FILM FOR PLASMA DISPLAY FILTER AND PLASMA DISPLAY FILTER COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2005-02-24 | — | — | WO | disclosed |
| US-20050031988-A1 | Resist polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-02-10 | — | — | US | disclosed |
| US-20050031989-A1 | Resist polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-02-10 | — | — | US | disclosed |
| EP-1505443-A2 | Resist polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-02-09 | — | — | EP | disclosed |
| WO-2005005140-A1 | NEAR INFRARED ABSORBING FILM AND PLASMA DISPLAY FILTER COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2005-01-20 | — | — | WO | disclosed |
| EP-1497339-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | Dupont Electronic Technologies L.P. (US) | 2005-01-19 | — | — | EP | disclosed |
| US-20050003170-A1 | Decorative material | TAKEUCHI HAJIME (JP) | 2005-01-06 | — | — | US | disclosed |
| US-6838224-B2 | Chemical amplification, positive resist compositions | SHI-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-04 | — | — | US | disclosed |
| US-6835804-B2 | Effecting deblocking reaction on an addition polymer in presence of acid catalyst | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20040260031-A1 | Preparation of polymer and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040259373-A1 | Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process | NEC ELECTRONICS CORPORATION (JP) | 2004-12-23 | — | — | US | disclosed |
| CN-1556738-A | Flux composition for solder, solder paste, and method of soldering | 日本油脂株式会社 | 2004-12-22 | — | — | CN | disclosed |
| US-20040250919-A1 | Flux composition for solder, solder paste, and method of soldering | NOF CORPORATION (JP) | 2004-12-16 | — | — | US | disclosed |
| US-20040248039-A1 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-12-09 | — | — | US | disclosed |
| US-20040242798-A1 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-12-02 | — | — | US | disclosed |
| CN-1550896-A | Processes for preparing photoresist compositions and the product | ��Ļ���Ű˾ | 2004-12-01 | — | — | CN | disclosed |
| EP-1479700-A1 | Processes for preparing photoresist compositions | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2004-11-24 | — | — | EP | disclosed |
| US-20040229162-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-18 | — | — | US | disclosed |
| US-20040209006-A1 | Liquid crystal film and liquid crystal display device equipped with same | NIPPON OIL CORPORATION (JP) | 2004-10-21 | — | — | US | disclosed |
| EP-1469058-A1 | Liquid crystal film and liquid crystal display device equipped with same | Nippon Oil Corporation (JP) | 2004-10-20 | — | — | EP | disclosed |
| US-20040202956-A1 | a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-10-14 | — | — | US | disclosed |
| US-6790525-B2 | CROSSLINKED RESIN SURFACE PROTECTIVE LAYER; WEAR RESISTANCE; WALLS, FURNITURE | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-09-14 | — | — | US | disclosed |
| US-20040173773-A1 | Liquid crystalline oxetane compound, polymerizable liquid crystalline composition, method for producing liquid crystal film, optical film, and liquid crystal display | NIPPON OIL CORPORATION | 2004-09-09 | — | — | US | disclosed |
| US-20040171788-A1 | Main chain type liquid crystal polyester, liquid crystalline composition, method for producing liquid crystal film, optical film and display | NOBLE VENTURE FINANCE I LIMITED (GB) | 2004-09-02 | — | — | US | disclosed |
| US-20040167322-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-08-26 | — | — | US | disclosed |
| US-20040166432-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-08-26 | — | — | US | disclosed |
| EP-1439025-A1 | FLUX COMPOSITION FOR SOLDER, SOLDER PASTE, AND METHOD OF SOLDERING | NOF CORPORATION (JP) | 2004-07-21 | — | — | EP | disclosed |
| EP-1428823-A1 | LIQUID-CRYSTALLINE OXETANE COMPOUND, POLYMERIZABLE LIQUID-CRYSTALLINE COMPOSITION, PROCESS FOR PRODUCING LIQUID-CRYSTAL FILM, OPTICAL FILM, AND LIQUID-CRYSTAL DISPLAY | Nippon Oil Corporation (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-6746817-B2 | ACID LABILE GROUPS INCREASE ALKALI SOLUBILITY; HAVING INCREASED ALKALI DISSOLUTION RATE BEFORE AND AFTER RADIATION EXPOSURE, HIGH SENSITIVITY, HIGH RESOLUTION, AND ETCHING RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-08 | — | — | US | disclosed |
| EP-1422255-A1 | MAIN CHAIN TYPE LIQUID CRYSTAL POLYESTER LIQUID CRYSTALLINE COMPOSITION METHOD FOR PRODUCING LIQUID CRYSTAL FILM OPTICAL FILM AND DISPLAY | Nippon Oil Corporation (JP) | 2004-05-26 | — | — | EP | disclosed |
| EP-1405850-A1 | (Meth)acrylic compound having an oxetanyl group and liquid crystal film produced by using the same | Nippon Oil Corporation (JP) | 2004-04-07 | — | — | EP | disclosed |
| US-6713612-B2 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-30 | — | — | US | disclosed |
| EP-1391476-A1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-02-25 | — | — | EP | disclosed |
| US-20040033432-A1 | Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-19 | — | — | US | disclosed |
| US-20040033440-A1 | Photoacid generators, chemically amplified positive resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-19 | — | — | US | disclosed |
| US-6692893-B2 | ONIUM SALTS OF ARYLSULFONYLOXYNAPHTHALENESULFONATE ANIONS WITH IODONIUM OR SULFONIUM CATIONS; USE IN DEEP ULTRAVIOLET LITHOGRAPHY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| US-6689530-B2 | ULTRAVIOLET LITHOGRAPHY MICROFABRICATION WITH IMPROVED RESOLUTION AND PATTERN PROFILE AFTER DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-10 | — | — | US | disclosed |
| US-20040023153-A1 | Resist compostion and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |
| US-20040023151-A1 | Negative resist material and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. | 2004-02-05 | — | — | US | disclosed |
| US-6682869-B2 | IN POLYMER | SHIN-ETU CHEMICAL CO., LTD. (JP) | 2004-01-27 | — | — | US | disclosed |
| EP-1378795-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-01-07 | — | — | EP | disclosed |
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| US-6653044-B2 | Addition copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-25 | — | — | US | disclosed |
| US-20030215738-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-20 | — | — | US | disclosed |
| US-6641975-B2 | Ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate; enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-04 | — | — | US | disclosed |
| WO-2003089480-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |
| US-20030199641-A1 | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity | CHEMFIRST ELECTRONIC MATERIALS LP | 2003-10-23 | — | — | US | disclosed |
| US-20030180653-A1 | Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| US-6593056-B2 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-07-15 | — | — | US | disclosed |
| US-20030118934-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-26 | — | — | US | disclosed |
| EP-1308782-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-20020146573-A1 | Polymer composition, cured product, laminate and method for producing the cured product | JSR CORPORATION (JP) | 2002-10-10 | — | — | US | disclosed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | disclosed |
| US-20020111459-A1 | Preparation of polymer, and resist composition using the polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-15 | — | — | US | disclosed |
| EP-1229092-A2 | Polymer composition, cured product, laminate and method for producing the cured product | JSR Corporation (JP) | 2002-08-07 | — | — | EP | disclosed |
| US-6416928-B1 | HALOGENONIUM OR SULFONIUM SALTS OF SULFONATED DIPHENYLALKANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-20020081521-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-27 | — | — | US | disclosed |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-6395446-B1 | CONTAINING SULFONYLDIAZOMETHANE COMPOUND AS ACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| US-20020059762-A1 | Decorative material | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-05-23 | — | — | US | disclosed |
| EP-1204001-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-08 | — | — | EP | disclosed |
| US-6383612-B1 | PIGMENT METAL SALT COATING IMPREGNATED INTO POROUS MEMBRANE; AROMATIC OR ALIPHATIC DRYING AGENT WITH SULFONIC, CARBOXYLIC, PHENOLIC, AND/OR HYDROXYL FUNCTIONAL GROUPS; WATERPROOFING, COLORFASTNESS, NONSMEARING | 3M INNOVATIVE PROPERTIES COMPANY | 2002-05-07 | — | — | US | disclosed |
| US-20020039701-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-04 | — | — | US | disclosed |
| US-6338931-B1 | PHOTOACID GENERATOR OF SULFONYLDIAZOMETHANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-15 | — | — | US | disclosed |
| US-20010038971-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010036593-A1 | Chemical amplification type resist composition | SHIN-ETSU CHEMICAL CO., LTD. | 2001-11-01 | — | — | US | disclosed |
| US-20010035394-A1 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| US-20010033994-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010031421-A1 | Chemical amplification resist compositions | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-10-18 | — | — | US | disclosed |
| EP-1136885-A1 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-26 | — | — | EP | disclosed |
| CN-1314906-A | Salts of paroxetine | SMITHKLINE BEECHAM PLC (GB) | 2001-09-26 | — | — | CN | disclosed |
| EP-1117003-A1 | Chemical amplification type resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-6235093-B1 | SOLUTIONS OF WATER AND NOBLE METALS FOR REDUCTION | DAIWA FINE CHEMICALS CO., LTD. (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-1085984-A1 | INK-DRYING AGENTS FOR INKJET RECEPTOR MEDIA | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 2001-03-28 | — | — | EP | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| US-6080522-A | CONTAINING PHOTORESIST AND POLYMER | CLARIANT INTERNAITONAL, LTD. (CH) | 2000-06-27 | — | — | US | disclosed |
| EP-0770708-B1 | Electrolytic process for producing lead sulfonate and tin sulfonate for solder plating use | DAIWA FINE CHEMICALS CO LTD (JP) | 2000-01-19 | — | — | EP | disclosed |
| WO-1999065702-A1 | INK-DRYING AGENTS FOR INKJET RECEPTOR MEDIA | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1999-12-23 | — | — | WO | disclosed |
| EP-0922998-A1 | RADIATION-SENSITIVE RESIST COMPOSITION WITH HIGH HEAT RESISTANCE | Clariant International Ltd. (CH) | 1999-06-16 | — | — | EP | disclosed |
| US-5847218-A | Sulfonium salts and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-08 | — | — | US | disclosed |
| EP-0770708-A1 | Electrolytic process for producing lead sulfonate and tin sulfonate for solder plating use | Daiwa Fine Chemicals Co., Ltd. (JP) | 1997-05-02 | — | — | EP | disclosed |
| US-5618404-A | APPLYING DIRECT CURRENT VOLTAGE TO AN ANODE MADE OF LEAD OR TIN IN AN ELECTROLYTE SOLUTION CONTAINING AN ORGANIC SULFONIC ACIDS; IONIZATION | DAIWA FINE CHEMICALS CO., LTD. (JP) | 1997-04-08 | — | — | US | disclosed |
| EP-0361351-B1 | Application of a painted film to a three-dimensional object | CIBA GEIGY AG (CH) | 1996-04-03 | — | — | EP | disclosed |
| US-5409592-A | Sulfate bath containing tin-II ions,, antioxidant and throwing power improver; storage stability | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 1995-04-25 | — | — | US | disclosed |
| US-5354881-A | Stable solutions used in treating inorganic fibers to promote adhesion | PPG INDUSTRIES, INC. (US) | 1994-10-11 | — | — | US | disclosed |
| WO-1994012167-A1 | PHARMACEUTICAL COMPOSITIONS FOR LOCAL USE AGAINST INSECT BITES AND STINGS | FARMIN S.R.L. (IT) | 1994-06-09 | — | — | WO | disclosed |
| US-5190988-A | Ultraviolet-curable organopolysiloxane composition containing a benzoinsulphonate initiator and metal catalyst | SHIN-ETSU CHEMICAL COMPANY, LIMITED (JP) | 1993-03-02 | — | — | US | disclosed |
| US-4985147-A | CHITOSAN MEMBRANE, SALT FORMATION WITH SULFURIC OR PHOSPHORIC ACID | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1991-01-15 | — | — | US | disclosed |
| US-4944881-A | MODIFIED ALGINATES, CHITOSANS, CELLULOSE | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1990-07-31 | — | — | US | disclosed |
| EP-0361351-A2 | Application of a painted film to a three-dimensional object | CIBA-GEIGY AG (CH) | 1990-04-04 | — | — | EP | disclosed |
| EP-0274353-B1 | PROCESS FOR THE PREPARATION OF BENZOIN SULFONATES | CIBA-GEIGY AG (CH) | 1990-02-07 | — | — | EP | disclosed |
| US-4837350-A | Process for the preparation of benzoin sulfonates | CIBA-GEIGY CORPORATION (US) | 1989-06-06 | — | — | US | disclosed |
| US-4808313-A | ALGINIC ACID CROSSLINKED WITH METAL CATION | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1989-02-28 | — | — | US | disclosed |
| EP-0123066-B1 | REACTION OF CARBONYLHYDRAZINES AND ORGANIC PEROXIDES TO FOAM UNSATURATED POLYESTER RESINS | PENNWALT CORPORATION (US) | 1988-10-12 | — | — | EP | disclosed |
| EP-0274353-A1 | Process for the preparation of benzoin sulfonates | CIBA-GEIGY AG (CH) | 1988-07-13 | — | — | EP | disclosed |
| EP-0255558-A1 | Baths or organic sulfonate solution for bismuth and bismuth alloy plating | Daiwa Fine Chemicals Co., Ltd. (JP) | 1988-02-10 | — | — | EP | disclosed |
| US-4692269-A | BLOWING AGENTS; CLOSED-CELL FOAMS | PENNWALT CORPORATION (US) | 1987-09-08 | — | — | US | disclosed |
| EP-0220751-A2 | Foamable and cross-linkable unsaturated polyester composition | PENNWALT CORPORATION (US) | 1987-05-06 | — | — | EP | disclosed |
| EP-0220364-A2 | Reaction of certain hydrazide compounds with free radical initiators to produce crosslinked polymer foams | PENNWALT CORPORATION (US) | 1987-05-06 | — | — | EP | disclosed |
| JP-S6294381-A | THERMAL RECORDING MATERIAL | HODOGAYA CHEM CO LTD | 1987-04-30 | — | — | JP | disclosed |
| EP-0219595-A2 | A gas-realising composition for tailoring gas evolution of system | PENNWALT CORPORATION (US) | 1987-04-29 | — | — | EP | disclosed |
| EP-0216990-A2 | Foaming and vulcanizing of elastomeric polymers | PENNWALT CORPORATION (US) | 1987-04-08 | — | — | EP | disclosed |
| US-4636528-A | Foaming of unsaturated polyester resin at elevated temperatures | PENNWALT CORPORATION (US) | 1987-01-13 | — | — | US | disclosed |
| US-4607059-A | T-ALKYLHYDROZINIUM SALT OR CARBONYLHYDRAZINE, METAL OXIDE, SULFUR OR SULFUR DONOR COMPOUND | PENNWALT CORPORATION (US) | 1986-08-19 | — | — | US | disclosed |
| US-4607060-A | FREE RADICAL CATALYSIS | PENNWALT CORPORATION (US) | 1986-08-19 | — | — | US | disclosed |
| US-4588752-A | CLOSED-CELL, TERT-ALKYLHYDRAZINIUM SALT OR HYDRAZIDE FOAMING AGENT | PENNWALT CORPORATION (US) | 1986-05-13 | — | — | US | disclosed |
| EP-0060120-B1 | PROCESS FOR PREPARING 4-HALOAZETIDIN-2-ONES | ELI LILLY AND COMPANY (US) | 1984-12-19 | — | — | EP | disclosed |
| EP-0123066-A1 | Reaction of carbonylhydrazines and organic peroxides to foam unsaturated polyester resins | PENNWALT CORPORATION (US) | 1984-10-31 | — | — | EP | disclosed |
| US-4435525-A | PEROXIDE AND TRANSITION METAL SALT CURING AGENT | PENNWALT CORPORATION (US) | 1984-03-06 | — | — | US | disclosed |
| US-4358410-A | Process for the preparation of meta sulfobenzoic acid and meta hydroxybenzoic acid therefrom | BUFFALO COLOR CORPORATION (US) | 1982-11-09 | — | — | US | disclosed |
| US-4277366-A | CONTAINING AN AROMATIC NITRO COMPOUND; INHIBITS CORROSION OF STEELS | UNION CARBIDE CORPORATION (US) | 1981-07-07 | — | — | US | disclosed |
| US-4277366-A | CONTAINING AN AROMATIC NITRO COMPOUND; INHIBITS CORROSION OF STEELS | UNION CARBIDE CORPORATION (US) | 1981-07-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (37 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040033432-A1 | Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | POLL, PIM3, VEGFA | LMNA 1744/4885CES2 2015/4885CES1 4135/4885 |
| US-20260020362-A1 | RIBBED SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE | SOST, CASK, STRADA | LMNA 3774/4885CES2 2943/4885CES1 2022/4885 |
| US-20080227032-A1 | ENVIRONMENTAL FRIENDLY PHOTOACID GENERATORS (PAGs) WITH NO PERFLUOROOCTYL SULFONATES | PFAS, FPGS, GSS | LMNA 3833/4885CES2 2564/4885CES1 2983/4885 |
| US-20050101752-A1 | (Meth) acrylic compound having an oxetanyl group and liquid crystal film produced by using same | METTL3, METTL14, METTL16 | LMNA 2397/4885CES2 492/4885CES1 3465/4885 |
| US-20090068379-A1 | DIOXETANE COMPOUND, CATIONICALLY POLYMERIZABLE COMPOSITION, OPTICAL FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | OCIAD1, OCIAD2, DAXX | LMNA 3096/4885CES2 3843/4885CES1 4284/4885 |
| US-20080102405-A1 | Nitrogen-containing organic compound, resist composition and patterning process | MDM4, MUS81, NOP2 | LMNA 1522/4885CES2 3488/4885CES1 4812/4885 |
| US-12607937-B2 | Photoresist top coating material for etching rate control | ERCC1, ERCC2, RAD23B | LMNA 1553/4885CES2 1447/4885CES1 3557/4885 |
| US-20090239179-A1 | HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | RAD51, REV1, H1-0 | LMNA 1374/4885CES2 2904/4885CES1 1959/4885 |
| US-20080124656-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, HCN4 | LMNA 3551/4885CES2 1381/4885CES1 2534/4885 |
| US-20090035699-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | C1R, AFF1, HRH3 | LMNA 1164/4885CES2 2106/4885CES1 1216/4885 |
| US-11608306-B2 | Process for generating acid anhydrides | CA1, CA9, CA6 | LMNA 3438/4885CES2 649/4885CES1 886/4885 |
| US-20210347722-A1 | PROCESS FOR GENERATING ACID ANHYDRIDES | CA1, CA9, CA6 | LMNA 3438/4885CES2 649/4885CES1 886/4885 |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | WDR5, RER1, H1-5 | LMNA 666/4885CES2 2829/4885CES1 2736/4885 |
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | VEGFA, DNMT3A, PIM3 | LMNA 815/4885CES2 1696/4885CES1 2871/4885 |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, TST | LMNA 3638/4885CES2 2507/4885CES1 3529/4885 |
| US-11561472-B2 | Radiation sensitive composition | RER1, RAD1, RAD51 | LMNA 211/4885CES2 333/4885CES1 775/4885 |
| US-20090136868-A1 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS | ASIC1, PPA1, PPOX | LMNA 3586/4885CES2 3112/4885CES1 3651/4885 |
| US-20080008965-A1 | Ester compounds and their preparation, polymers, resist compositions and patterning process | ESR1, H1-2, H1-4 | LMNA 813/4885CES2 453/4885CES1 1131/4885 |
| US-20030215738-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | CCNH, PAH, POLH | LMNA 2395/4885CES2 1822/4885CES1 1181/4885 |
| US-20080085469-A1 | Novel photoacid generators, resist compositions, and patterning process | RER1, SCO2, ASIC3 | LMNA 3936/4885CES2 2114/4885CES1 2150/4885 |
| US-20090258315-A1 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS | ASIC1, PPA1, ALAD | LMNA 3464/4885CES2 3198/4885CES1 3766/4885 |
| US-20110008732-A1 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS | ASIC1, PPA1, PPOX | LMNA 3586/4885CES2 3112/4885CES1 3651/4885 |
| US-20070292768-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | PTH1R, ASIC1, PPA1 | LMNA 2585/4885CES2 3489/4885CES1 3773/4885 |
| US-20140086862-A1 | COLORED RESIN PARTICLES, METHOD FOR PRODUCING THE SAME, AND USE THEREOF | NOS2, NOS1, PRMT5 | LMNA 2245/4885CES2 1610/4885CES1 4298/4885 |
| US-20100062373-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | RER1, ASH2L, PHF2 | LMNA 1852/4885CES2 4305/4885CES1 4055/4885 |
| US-20110160481-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, TST | LMNA 3638/4885CES2 2507/4885CES1 3529/4885 |
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | ABL1, PI4K2B, FES | LMNA 2199/4885CES2 2439/4885CES1 3759/4885 |
| US-20030180653-A1 | Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process | CACNA1A, KCNA1, POLL | LMNA 2767/4885CES2 2075/4885CES1 2148/4885 |
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | AFF1, FASN, FAR1 | LMNA 2757/4885CES2 578/4885CES1 552/4885 |
| US-20040167322-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | POLL, VEGFA, PIM3 | LMNA 535/4885CES2 1946/4885CES1 3348/4885 |
| US-20230120038-A1 | PROCESS FOR GENERATING ACID ANHYDRIDES | CA1, CA9, CA6 | LMNA 3438/4885CES2 649/4885CES1 886/4885 |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | RER1, RAD1, RAD51 | LMNA 247/4885CES2 595/4885CES1 1104/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | LMNA 1043/4885CES2 2549/4885CES1 1919/4885 |
| US-12535738-B2 | Photoresist top coating material for etching rate control | ALKBH2, TOP2A, KDM2A | LMNA 88/4885CES2 288/4885CES1 1261/4885 |
| US-20040166432-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | VEGFA, POLL, PIM3 | LMNA 597/4885CES2 1564/4885CES1 2844/4885 |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | PNN, PI4K2B, PI4K2A | LMNA 1536/4885CES2 2376/4885CES1 3547/4885 |
| US-20100062374-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | RER1, ARCN1, ASH2L | LMNA 1215/4885CES2 3229/4885CES1 2714/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.