Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2130829 | 1.00 | LMNA (0.39) | LMNATHRB | |
| SCHEMBL13881475 | 0.96 | LMNA (0.44) | LMNATHRB | |
| SCHEMBL12522087 | 0.96 | LMNA (0.44) | LMNATHRB | |
| SCHEMBL13881471 | 0.96 | LMNA (0.44) | LMNATHRB | |
| SCHEMBL8740867 | 0.96 | LMNA (0.44) | LMNATHRB | |
| SCHEMBL15325987 | 0.96 | LMNA (0.44) | LMNATHRB | |
| SCHEMBL15325988 | 0.96 | LMNA (0.44) | LMNATHRB | |
| SCHEMBL15326926 | 0.96 | LMNA (0.44) | LMNATHRB | |
| SCHEMBL8723430 | 0.96 | LMNA (0.44) | LMNATHRB | |
| SCHEMBL9650550 | 0.96 | LMNA (0.44) | LMNATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 616 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024117514-A1 | GLASS CERAMIC AND COOKTOP USING SAME | 삼성전자주식회사 | 2024-06-06 | — | — | WO | claimed |
| US-20240182355-A1 | GLASS-CERAMIC AND COOKTOP USING SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-06-06 | — | — | US | claimed |
| WO-2022142152-A1 | CONTENT MEASUREMENT METHOD FOR CLINDAMYCIN PHOSPHATE VAGINAL TABLET | 海南海神同洲制药有限公司 | 2022-07-07 | — | — | WO | claimed |
| CN-107185415-A | It is a kind of for desalination composite membrane of industrial pollution seawater and preparation method thereof | 长沙无道工业设计有限公司 | 2017-09-22 | — | — | CN | claimed |
| CN-107174975-A | A kind of desalinization composite membrane for producing hydrogen-rich direct drinking and preparation method thereof | 长沙无道工业设计有限公司 | 2017-09-19 | — | — | CN | claimed |
| CN-105482604-B | A kind of aqueous anti-doodling paint and preparation method thereof | 杭州吉华高分子材料股份有限公司 | 2017-08-25 | — | — | CN | claimed |
| CN-107081076-A | A kind of desalinization composite membrane for producing magnetization direct drinking and preparation method thereof | 长沙无道工业设计有限公司 | 2017-08-22 | — | — | CN | claimed |
| US-20080108749-A1 | Fluoropolymer nanoemulsions | NANOMAX TECHNOLOGY COMPANY LIMITED | 2008-05-08 | — | — | US | claimed |
| EP-1511833-B1 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORP (US) | 2007-01-10 | — | — | EP | claimed |
| EP-1511833-A4 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORP (US) | 2005-07-06 | — | — | EP | claimed |
| EP-1511833-A2 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | Kyzen Corporation (US) | 2005-03-09 | — | — | EP | claimed |
| US-6699829-B2 | ALSO CONTAINING ADDITIVE SELECTED FROM HIGHLY FLUORINATED COMPOUND AND ENHANCEMENT AGENT OR MIXTURES | KYZEN CORPORATION | 2004-03-02 | — | — | US | claimed |
| WO-2003104365-A2 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORPORATION (US) | 2003-12-18 | — | — | WO | claimed |
| US-20030228997-A1 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORPORATION | 2003-12-11 | — | — | US | claimed |
| US-20030083220-A1 | Low ozone depleting brominated compound mixtures for use in solvent and cleaning applications | KYZEN CORPORATION | 2003-05-01 | — | — | US | claimed |
| EP-0747404-B1 | Method for producing a fluorine-containing copolymer | ASAHI GLASS CO LTD (JP) | 1999-09-01 | — | — | EP | claimed |
| US-5811473-A | ADHESION PROMOTER COMPRISING A POLYFLUOROALKANE COMPOUND, AN ALKANOL, A TRANSITION METAL COMPOUND AND AN AMINE COMPOUND | LOCTITE CORPORATION (US) | 1998-09-22 | — | — | US | claimed |
| US-5663251-A | Method for producing a fluorine-containing copolymer | ASAHI GLASS COMPANY LTD. (JP) | 1997-09-02 | — | — | US | claimed |
| EP-0747404-A1 | Method for producing a fluorine-containing copolymer | ASAHI GLASS COMPANY LTD. (JP) | 1996-12-11 | — | — | EP | claimed |
| JP-5269301-A | — | — | None | — | — | JP | disclosed |
| JP-6157615-A | — | — | None | — | — | JP | disclosed |
| US-20260146194-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2026-05-28 | — | — | US | disclosed |
| US-12559659-B2 | Stabilized fluoroolefin compositions and methods for their production, storage and usage | THE CHEMOURS COMPANY FC, LLC (US) | 2026-02-24 | — | — | US | disclosed |
| US-12516275-B2 | Composition; cleaning agent, aerosol composition, draining agent, foaming agent, or heat-transfer medium containing the composition; system using the heat-transfer medium; and method of cleaning articles | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12486480-B2 | Lacquer for treating 3D printing-created printed matter | LUVANTIX ADM., CO. LTD (KR) | 2025-12-02 | — | — | US | disclosed |
| US-20250313738-A1 | STABILIZED FLUOROOLEFIN REFRIGERANT COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2025-10-09 | — | — | US | disclosed |
| EP-3963021-B1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR USAGE | CHEMOURS CO FC LLC (US) | 2025-08-27 | — | — | EP | disclosed |
| EP-4600334-A2 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2025-08-13 | — | — | EP | disclosed |
| EP-4053241-B1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | CHEMOURS CO FC LLC (US) | 2025-07-23 | — | — | EP | disclosed |
| US-12359107-B2 | Stabilized fluoroolefin refrigerant compositions and methods for their production, storage and usage | THE CHEMOURS COMPANY FC, LLC (US) | 2025-07-15 | — | — | US | disclosed |
| US-20250224161-A1 | METHOD FOR EXCHANGING HEAT IN VAPOR COMPRESSION HEAT TRANSFER SYSTEMS AND VAPOR COMPRESSION HEAT TRANSFER SYSTEMS COMPRISING INTERMEDIATE HEAT EXCHANGERS WITH DUAL-ROW EVAPORATORS OR CONDENSERS | THE CHEMOURS COMPANY FC, LLC (US) | 2025-07-10 | — | — | US | disclosed |
| US-20250197705-A1 | HYDROCARBON ADDITIVES FOR 1234YF COMPOSITION AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2025-06-19 | — | — | US | disclosed |
| US-12287129-B2 | Method for exchanging heat in vapor compression heat transfer systems and vapor compression heat transfer systems comprising intermediate heat exchangers with dual-row evaporators or condensers | THE CHEMOURS COMPANY FC, LLC (US) | 2025-04-29 | — | — | US | disclosed |
| US-20250066653-A1 | FLUOROOLEFIN COMPOSITIONS CONTAINING A DYE AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2025-02-27 | — | — | US | disclosed |
| US-12227653-B2 | Fluorinated coumarins | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2025-02-18 | — | — | US | disclosed |
| EP-4493637-A1 | HYDROCARBON ADDITIVES FOR 1234YF COMPOSITION AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2025-01-22 | — | — | EP | disclosed |
| US-12187952-B2 | Coolant and method for preparing thereof | ZHUOCONG (SHANGHAI) ENVIRONMENTAL PROTECTION TECHNOLOGY DEVELOPMENT CO., LTD. (CN) | 2025-01-07 | — | — | US | disclosed |
| US-12180178-B2 | Heteroaryl azole compound and pest control agent | NIPPON SODA CO., LTD. (JP) | 2024-12-31 | — | — | US | disclosed |
| US-20240425740-A1 | STABILIZED FLUOROOLEFIN REFRIGERANT COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC. (US) | 2024-12-26 | — | — | US | disclosed |
| EP-4219647-B1 | CONTAINER COMPRISING STABILIZED FLUOROOLEFIN COMPOSITIONS | CHEMOURS CO FC LLC (US) | 2024-12-25 | — | — | EP | disclosed |
| EP-4466323-A1 | FLUOROOLEFIN COMPOSITIONS CONTAINING A DYE AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2024-11-27 | — | — | EP | disclosed |
| EP-4461791-A2 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2024-11-13 | — | — | EP | disclosed |
| US-12134726-B2 | Stabilized fluoroolefin refrigerant compositions and methods for their production, storage and usage | THE CHEMOURS COMPANY FC, LLC (US) | 2024-11-05 | — | — | US | disclosed |
| CN-118749019-A | Hydrocarbon additives for 1234yf compositions and methods of producing, storing, and using the same | 科慕埃弗西有限公司 | 2024-10-08 | — | — | CN | disclosed |
| CN-118725731-A | Coating composition, coating, preparation method and application | 宁波天璇新材料科技有限公司 | 2024-10-01 | — | — | CN | disclosed |
| EP-4122997-B1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | CHEMOURS CO FC LLC (US) | 2024-09-11 | — | — | EP | disclosed |
| CN-118525136-A | System and method for controlling temperature in absorber | 通用电气技术有限公司 | 2024-08-20 | — | — | CN | disclosed |
| CN-118302501-A | Fluoroolefin compositions containing dyes and methods of making, storing and using same | 科慕埃弗西有限公司 | 2024-07-05 | — | — | CN | disclosed |
| WO-2024117514-A1 | GLASS CERAMIC AND COOKTOP USING SAME | 삼성전자주식회사 | 2024-06-06 | — | — | WO | disclosed |
| US-20240182355-A1 | GLASS-CERAMIC AND COOKTOP USING SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-06-06 | — | — | US | disclosed |
| EP-4357444-A2 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHOD FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2024-04-24 | — | — | EP | disclosed |
| US-20240125524-A1 | METHOD FOR EXCHANGING HEAT IN VAPOR COMPRESSION HEAT TRANSFER SYSTEMS AND VAPOR COMPRESSION HEAT TRANSFER SYSTEMS COMPRISING INTERMEDIATE HEAT EXCHANGERS WITH DUAL-ROW EVAPORATORS OR CONDENSERS | THE CHEMOURS COMPANY FC, LLC (US) | 2024-04-18 | — | — | US | disclosed |
| US-20240117191-A1 | Fluorinated Coumarins | 3M INNOVATIVE PROPERTIES COMPANY | 2024-04-11 | — | — | US | disclosed |
| EP-4349694-A2 | A VAPOR COMPRESSION HEAT TRANSFER SYSTEM | The Chemours Company FC, LLC (US) | 2024-04-10 | — | — | EP | disclosed |
| EP-4206298-B1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHOD FOR THEIR PRODUCTION, STORAGE AND USAGE | CHEMOURS CO FC LLC (US) | 2024-04-03 | — | — | EP | disclosed |
| EP-4160127-B1 | A VAPOR COMPRESSION HEAT TRANSFER SYSTEM | CHEMOURS CO FC LLC (US) | 2024-02-28 | — | — | EP | disclosed |
| US-20240043777-A1 | Composition; Cleaning Agent, Aerosol Composition, Draining Agent, Foaming Agent, or Heat-Transfer Medium Containing the Composition; System Using the Heat-Transfer Medium; And Method of Cleaning Articles | CENTRAL GLASS CO., LTD. (JP) | 2024-02-08 | — | — | US | disclosed |
| US-11867436-B2 | Method for exchanging heat in vapor compression heat transfer systems and vapor compression heat transfer systems comprising intermediate heat exchangers with dual-row evaporators or condensers | THE CHEMOURS COMPANY FC, LLC (US) | 2024-01-09 | — | — | US | disclosed |
| US-11851602-B2 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | THE CHEMOURS COMPANY FC, LLC (US) | 2023-12-26 | — | — | US | disclosed |
| US-20230400764-A1 | ORGANOMETALLIC COMPOUND COMPRISING A METAL COMBINED WITH AT LEAST ONE LIGAND CONTAINING FOUR OR MORE FLUORINE ATOMS, RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-12-14 | — | — | US | disclosed |
| US-20230383159-A1 | STABILIZED FLUOROOLEFIN REFRIGERANT COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2023-11-30 | — | — | US | disclosed |
| CN-117083364-A | Composition, cleaning agent comprising composition, aerosol composition, water scavenger, foaming agent or heat-conducting medium, system using heat-conducting medium, and method for cleaning article | 中央硝子株式会社 | 2023-11-17 | — | — | CN | disclosed |
| WO-2023220137-A1 | PYRAZINE DERIVATIVES AND USES THEREOF | FOGHORN THERAPEUTICS INC. (US) | 2023-11-16 | — | — | WO | disclosed |
| CN-117043201-A | Compositions and articles comprising perfluoropolyether bottle brush polymers and methods of making and using the same | 唐纳森公司 | 2023-11-10 | — | — | CN | disclosed |
| US-11807656-B2 | Polycyclic aromatic compound and light emission layer-forming composition | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2023-11-07 | — | — | US | disclosed |
| WO-2023184541-A1 | BATTERY PACK AND ELECTRIC DEVICE COMPRISING SAME | 宁德时代新能源科技股份有限公司 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023177855-A1 | HYDROCARBON ADDITIVES FOR 1234YF COMPOSITION AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2023-09-21 | — | — | WO | disclosed |
| WO-2023162565-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |
| CN-116669844-A | Articles including filter media and fluoropolymers and methods of making and using the same | 唐纳森公司 | 2023-08-29 | — | — | CN | disclosed |
| WO-2023157526-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, COMPOUND, AND RESIN | 富士フイルム株式会社 | 2023-08-24 | — | — | WO | disclosed |
| US-20230266675-A1 | INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR VERIFYING COMPOSITION | FUJIFILM CORPORATION (JP) | 2023-08-24 | — | — | US | disclosed |
| WO-2023157635-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUND | 富士フイルム株式会社 | 2023-08-24 | — | — | WO | disclosed |
| EP-4219647-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHOD FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2023-08-02 | — | — | EP | disclosed |
| WO-2023141098-A1 | FLUOROOLEFIN COMPOSITIONS CONTAINING A DYE AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2023-07-27 | — | — | WO | disclosed |
| US-20230235930-A1 | METHOD FOR EXCHANGING HEAT IN VAPOR COMPRESSION HEAT TRANSFER SYSTEMS AND VAPOR COMPRESSION HEAT TRANSFER SYSTEMS COMPRISING INTERMEDIATE HEAT EXCHANGERS WITH DUAL-ROW EVAPORATORS OR CONDENSERS | THE CHEMOURS COMPANY FC, LLC (US) | 2023-07-27 | — | — | US | disclosed |
| US-11703758-B2 | Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-07-18 | — | — | US | disclosed |
| EP-4206298-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHOD FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2023-07-05 | — | — | EP | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| WO-2023120250-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND COMPOUND | 富士フイルム株式会社 | 2023-06-29 | — | — | WO | disclosed |
| EP-3978580-B1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHOD FOR THEIR PRODUCTION, STORAGE AND USAGE | CHEMOURS CO FC LLC (US) | 2023-06-14 | — | — | EP | disclosed |
| WO-2023095561-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-01 | — | — | WO | disclosed |
| US-20230161253-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| EP-3775091-B1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | CHEMOURS CO FC LLC (US) | 2023-04-12 | — | — | EP | disclosed |
| US-11624534-B2 | Method for exchanging heat in vapor compression heat transfer systems and vapor compression heat transfer systems comprising intermediate heat exchangers with dual-row evaporators or condensers | THE CHEMOURS COMPANY FC, LLC (US) | 2023-04-11 | — | — | US | disclosed |
| EP-4160127-A1 | A VAPOR COMPRESSION HEAT TRANSFER SYSTEM | The Chemours Company FC, LLC (US) | 2023-04-05 | — | — | EP | disclosed |
| EP-3959284-B1 | LIQUID DISPERSION WITH ENHANCED THERMAL CONDUCTIVITY CONTAINING INORGANIC PARTICLES | EVONIK OPERATIONS GMBH (DE) | 2023-03-29 | — | — | EP | disclosed |
| EP-4122997-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2023-01-25 | — | — | EP | disclosed |
| US-11556056-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-17 | — | — | US | disclosed |
| EP-3556783-B1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL CO (JP) | 2022-12-28 | — | — | EP | disclosed |
| EP-4106024-A1 | METHOD FOR PREPARATION OF A P-TYPE SEMICONDUCTING LAYER, P-TYPE SEMICONDUCTING LAYER OBTAINED BY SAID METHOD, ORGANIC ELECTRONIC DEVICE COMPRISING THE P-TYPE SEMICONDUCTING LAYER, DISPLAY DEVICE COMPRISING THE ORGANIC ELECTRONIC DEVICE, METAL COMPOUND AND USE OF SAID METAL COMPOUND FOR THE P-TYPE SEMICONDUCTING LAYER | Novaled GmbH (DE) | 2022-12-21 | — | — | EP | disclosed |
| EP-3737470-B1 | 3-PHENYL-4-HEXYNOIC ACID DERIVATIVES AS GPR40 AGONISTS | Celon Pharma Sa (PL) | 2022-12-14 | — | — | EP | disclosed |
| EP-3775092-B1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | CHEMOURS CO FC LLC (US) | 2022-11-30 | — | — | EP | disclosed |
| CN-115135995-A | Penetrating fluid, cleaning agent and developer for penetration flaw detection test method | 中央硝子株式会社 | 2022-09-30 | — | — | CN | disclosed |
| EP-4053241-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2022-09-07 | — | — | EP | disclosed |
| EP-3741824-B1 | IMMERSION-TYPE HEAT-DISSIPATION COOLING LIQUID FOR POWER LITHIUM BATTERY AND PREPARATION METHOD THEREFOR | ZHUOCONG SHANGHAI ENVIRONMENTAL PROTECTION TECH DEVELOPMENT CO LTD (CN) | 2022-08-31 | — | — | EP | disclosed |
| US-20220204829-A1 | LIQUID DISPERSION WITH ENHANCED THERMAL CONDUCTIVITY CONTAINING INORGANIC PARTICLES | EVONIK OPERATIONS GMBH (DE) | 2022-06-30 | — | — | US | disclosed |
| US-20220195276-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2022-06-23 | — | — | US | disclosed |
| US-11327399-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-10 | — | — | US | disclosed |
| EP-3978580-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHOD FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2022-04-06 | — | — | EP | disclosed |
| EP-3963021-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2022-03-09 | — | — | EP | disclosed |
| EP-3959284-A1 | LIQUID DISPERSION WITH ENHANCED THERMAL CONDUCTIVITY CONTAINING INORGANIC PARTICLES | Evonik Operations GmbH (DE) | 2022-03-02 | — | — | EP | disclosed |
| US-11261273-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-03-01 | — | — | US | disclosed |
| US-11249223-B2 | Base with low-reflection film | AGC Inc. (JP) | 2022-02-15 | — | — | US | disclosed |
| US-11214635-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-01-04 | — | — | US | disclosed |
| EP-3581594-B1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL CO (JP) | 2021-12-29 | — | — | EP | disclosed |
| US-20210395274-A1 | POLYCYCLIC AROMATIC COMPOUND AND LIGHT EMISSION LAYER-FORMING COMPOSITION | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2021-12-23 | — | — | US | disclosed |
| US-11198748-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-14 | — | — | US | disclosed |
| US-20210380859-A1 | EPOXIDE AND FLUORINATED EPOXIDE STABILIZERS FOR FLUOROOLEFINS | THE CHEMOURS COMPANY FC, LLC (US) | 2021-12-09 | — | — | US | disclosed |
| CN-113767158-A | Stabilized fluoroolefin compositions and methods for their production, storage and use | 科慕埃弗西有限公司 | 2021-12-07 | — | — | CN | disclosed |
| US-20210355360-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | THE CHEMOURS COMPANY FC, LLC (US) | 2021-11-18 | — | — | US | disclosed |
| US-11136341-B2 | Polycyclic aromatic compound and light emission layer-forming composition | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2021-10-05 | — | — | US | disclosed |
| US-11130894-B2 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | THE CHEMOURS COMPANY FC, LLC (US) | 2021-09-28 | — | — | US | disclosed |
| US-11124685-B2 | Compositions comprising fluoroolefins and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2021-09-21 | — | — | US | disclosed |
| US-20210286263-A1 | ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-11121422-B2 | Fluorinated ionic liquids with high oxygen solubility for metal-air batteries | TOYOTA MOTOR EUROPE (BE) | 2021-09-14 | — | — | US | disclosed |
| US-11119408-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-14 | — | — | US | disclosed |
| CN-113168099-A | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | 富士胶片株式会社 | 2021-07-23 | — | — | CN | disclosed |
| US-20210207014-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | THE CHEMOURS COMPANY FC, LLC (US) | 2021-07-08 | — | — | US | disclosed |
| US-20210200097-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| US-11046877-B1 | Compositions comprising fluoroolefins and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2021-06-29 | — | — | US | disclosed |
| US-11046876-B2 | Compositions comprising fluoroolefins and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2021-06-29 | — | — | US | disclosed |
| US-20210108119-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2021-04-15 | — | — | US | disclosed |
| US-10975028-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-04-13 | — | — | US | disclosed |
| US-20210079281-A1 | IMMERSION TYPE HEAT DISSIPATION COOLING LIQUID FOR POWER LITHIUM BATTERY AND METHOD FOR PREPARING THEREOF | ZHUOCONG (SHANGHAI) ENVIRONMENTAL PROTECTION TECHNOLOGY DEVELOPMENT CO., LTD. (CN) | 2021-03-18 | — | — | US | disclosed |
| EP-3775092-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2021-02-17 | — | — | EP | disclosed |
| EP-3775091-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | The Chemours Company FC, LLC (US) | 2021-02-17 | — | — | EP | disclosed |
| US-20210040368-A1 | STABILIZED FLUOROOLEFIN REFRIGERANT COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2021-02-11 | — | — | US | disclosed |
| US-10915022-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-02-09 | — | — | US | disclosed |
| CN-112262195-A | Stabilized fluoroolefin refrigerant compositions and methods for their production, storage and use | 科慕埃弗西有限公司 | 2021-01-22 | — | — | CN | disclosed |
| US-10882839-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-01-05 | — | — | US | disclosed |
| US-20200399198-A1 | 3-PHENYL-4-HEXYNOIC ACID DERIVATIVES AS GPR40 AGONISTS | CELON PHARMA S.A. (PL) | 2020-12-24 | — | — | US | disclosed |
| CN-112074585-A | Stabilized fluoroolefin compositions and methods for their production, storage and use | 科慕埃弗西有限公司 | 2020-12-11 | — | — | CN | disclosed |
| WO-2020243135-A1 | FUSED HETEROCYCLIC DERIVATIVES | Janssen Sciences Ireland Unlimited Company (IE) | 2020-12-03 | — | — | WO | disclosed |
| EP-3741824-A1 | IMMERSION-TYPE HEAT-DISSIPATION COOLING LIQUID FOR POWER LITHIUM BATTERY AND PREPARATION METHOD THEREFOR | Zhuocong (Shanghai) Environmental Protection Technology Development Co., Ltd. (CN) | 2020-11-25 | — | — | EP | disclosed |
| US-10838300-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-11-17 | — | — | US | disclosed |
| WO-2020222865-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2020-11-05 | — | — | WO | disclosed |
| WO-2020222864-A1 | STABILIZED FLUOROOLEFIN COMPOSITIONS AND METHODS FOR THEIR PRODUCTION, STORAGE AND USAGE | THE CHEMOURS COMPANY FC, LLC (US) | 2020-11-05 | — | — | WO | disclosed |
| US-20200339853-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | THE CHEMOURS COMPANY FC, LLC (US) | 2020-10-29 | — | — | US | disclosed |
| US-10816902-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-27 | — | — | US | disclosed |
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-15 | — | — | US | disclosed |
| US-10795258-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-06 | — | — | US | disclosed |
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-15 | — | — | US | disclosed |
| EP-3216840-B1 | COMPOSITIONS COMPRISING 1,1,1,4,4,4-HEXAFLUORO-2-BUTENE AND USES THEREOF | CHEMOURS CO FC LLC (US) | 2020-09-02 | — | — | EP | disclosed |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-08-18 | — | — | US | disclosed |
| US-20200259089-A1 | POLYCYCLIC AROMATIC COMPOUND AND LIGHT EMITTING LAYER-FORMING COMPOSITION | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2020-08-13 | — | — | US | disclosed |
| US-10725380-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20200231720-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-07-23 | — | — | US | disclosed |
| CN-111345116-A | Encapsulant for organic electroluminescent display element | 电化株式会社 | 2020-06-26 | — | — | CN | disclosed |
| US-10689402-B2 | Polycyclic aromatic compound and light emission layer-forming composition | JNC CORPORATION (JP) | 2020-06-23 | — | — | US | disclosed |
| US-20200190116-A1 | POLYCYCLIC AROMATIC COMPOUND AND LIGHT EMISSION LAYER-FORMING COMPOSITION | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2020-06-18 | — | — | US | disclosed |
| US-10680186-B2 | Polycyclic aromatic compound and light emitting layer-forming composition | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2020-06-09 | — | — | US | disclosed |
| US-10670963-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-06-02 | — | — | US | disclosed |
| US-10662165-B2 | Fluorochemical piperazine carboxamides | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2020-05-26 | — | — | US | disclosed |
| US-20200140734-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | THE CHEMOURS COMPANY FC, LLC (US) | 2020-05-07 | — | — | US | disclosed |
| US-20200115605-A1 | EPOXIDE AND FLUORINATED EPOXIDE STABILIZERS FOR FLUOROOLEFINS | THE CHEMOURS COMPANY FC, LLC (US) | 2020-04-16 | — | — | US | disclosed |
| EP-2420546-B2 | Terephthalate stabilizers for fluoroolefins | CHEMOURS CO FC LLC (US) | 2020-04-08 | — | — | EP | disclosed |
| US-10599033-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-03-24 | — | — | US | disclosed |
| US-10571805-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-02-25 | — | — | US | disclosed |
| US-10563107-B2 | Compositions comprising fluoroolefins and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2020-02-18 | — | — | US | disclosed |
| US-10564544-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-02-18 | — | — | US | disclosed |
| US-10550302-B2 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | THE CHEMOURS COMPANY FC, LLC (US) | 2020-02-04 | — | — | US | disclosed |
| EP-3556783-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Sumitomo Chemical Company, Limited (JP) | 2019-10-23 | — | — | EP | disclosed |
| EP-3556781-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Sumitomo Chemical Company, Limited (JP) | 2019-10-23 | — | — | EP | disclosed |
| US-20190292287-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-09-26 | — | — | US | disclosed |
| US-10359700-B2 | Salt, acid generator, photoresist composition and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-07-23 | — | — | US | disclosed |
| EP-2856528-B1 | METAL COMPLEXES COMPRISING CONDENSED HETEROAROMATIC RINGS | MERCK PATENT GMBH (DE) | 2019-07-03 | — | — | EP | disclosed |
| US-10329467-B2 | Compositions comprising fluoroolefins and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2019-06-25 | — | — | US | disclosed |
| US-20190190104-A1 | FLUORINATED IONIC LIQUIDS WITH HIGH OXYGEN SOLUBILITY FOR METAL-AIR BATTERIES | TOYOTA MOTOR EUROPE (BE) | 2019-06-20 | — | — | US | disclosed |
| CN-109851531-A | A kind of preparation method of acrylic acid (N- methyl perfluoro alkylsulfonamido) ethyl ester | 武汉松石科技股份有限公司 | 2019-06-07 | — | — | CN | disclosed |
| US-20190135771-A1 | FLUOROCHEMICAL PIPERAZINE CARBOXAMIDES | 3M INNOVATIVE PROPERTIES COMPANY | 2019-05-09 | — | — | US | disclosed |
| US-20190112265-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-04-18 | — | — | US | disclosed |
| US-20190112286-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-04-18 | — | — | US | disclosed |
| EP-3470491-A1 | PHOSPHORUS-CONTAINING STABILIZERS FOR FLUOROOLEFINS | The Chemours Company FC, LLC (US) | 2019-04-17 | — | — | EP | disclosed |
| US-10209618-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-02-19 | — | — | US | disclosed |
| US-10189826-B2 | Heterocyclic compounds and methods of use | MEDIVATION TECHNOLOGIES LLC (US) | 2019-01-29 | — | — | US | disclosed |
| US-20190025698-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-01-24 | — | — | US | disclosed |
| US-20190011837-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-01-10 | — | — | US | disclosed |
| US-10168616-B2 | Photoresist composition and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-01-01 | — | — | US | disclosed |
| US-20180373149-A1 | PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-12-27 | — | — | US | disclosed |
| US-20180373146-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-12-27 | — | — | US | disclosed |
| US-10160721-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-12-25 | — | — | US | disclosed |
| US-20180348632-A1 | PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-12-06 | — | — | US | disclosed |
| EP-2410032-B1 | Phosphorus-containing stabilizers for fluoroolefins | CHEMOURS CO FC LLC (US) | 2018-11-14 | — | — | EP | disclosed |
| US-10126650-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-11-13 | — | — | US | disclosed |
| US-20180258061-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-09-13 | — | — | US | disclosed |
| US-20180259851-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-09-13 | — | — | US | disclosed |
| US-10073343-B2 | Non-ionic compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-09-11 | — | — | US | disclosed |
| US-20180198128-A1 | FLUORINATED-POLYMER COATED ELECTRODES | SOUTH DAKOTA BOARD OF REGENTS (US) | 2018-07-12 | — | — | US | disclosed |
| US-9996002-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-06-12 | — | — | US | disclosed |
| EP-3038622-B1 | HETEROCYCLIC COMPOUNDS AND METHODS OF USE | MEDIVATION TECH LLC (US) | 2018-05-30 | — | — | EP | disclosed |
| US-9983478-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-29 | — | — | US | disclosed |
| US-9971241-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20180127628-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT | 2018-05-10 | — | — | US | disclosed |
| US-20180113382-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-26 | — | — | US | disclosed |
| US-9951159-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-24 | — | — | US | disclosed |
| US-20180094000-A1 | POLYCYCLIC AROMATIC COMPOUND AND LIGHT EMISSION LAYER-FORMING COMPOSITION | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2018-04-05 | — | — | US | disclosed |
| US-20180094000-A1 | POLYCYCLIC AROMATIC COMPOUND AND LIGHT EMISSION LAYER-FORMING COMPOSITION | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2018-04-05 | — | — | US | disclosed |
| US-20180065925-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-20180051013-A1 | Heterocyclic Compounds and Methods of Use | MEDIVATION TECHNOLOGIES LLC | 2018-02-22 | — | — | US | disclosed |
| CN-107699099-A | A kind of fluorescent visual type electronic protection coating composition and preparation method thereof | 浙江大学 | 2018-02-16 | — | — | CN | disclosed |
| US-9890311-B2 | Compositions comprising fluoroolefins and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2018-02-13 | — | — | US | disclosed |
| US-20180040821-A1 | POLYCYCLIC AROMATIC COMPOUND AND LIGHT EMITTING LAYER-FORMING COMPOSITION | KWANSEI GAKUIN EDUCATIONAL FOUNDATION (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20180031969-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-02-01 | — | — | US | disclosed |
| US-9880466-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-01-30 | — | — | US | disclosed |
| US-9879177-B2 | Metal complexes comprising condensed heteroaromatic rings | MERCK PATENT GMBH (DE) | 2018-01-30 | — | — | US | disclosed |
| US-9879177-B2 | Metal complexes comprising condensed heteroaromatic rings | MERCK PATENT GMBH (DE) | 2018-01-30 | — | — | US | disclosed |
| US-9869930-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9869929-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9857683-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-01-02 | — | — | US | disclosed |
| US-20170362483-A1 | EPOXIDE AND FLUORINATED EPOXIDE STABILIZERS FOR FLUOROOLEFINS | THE CHEMOURS COMPANY FC, LLC | 2017-12-21 | — | — | US | disclosed |
| EP-2731188-B1 | ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY INCLUDING SAME | LG CHEMICAL LTD (KR) | 2017-11-22 | — | — | EP | disclosed |
| US-9822060-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-21 | — | — | US | disclosed |
| US-20170329224-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |
| US-20170329219-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |
| US-20170329223-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9810981-B2 | Pattern formation method, etching method, electronic device manufacturing method, and electronic device | FUJIFILM CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |
| US-9809669-B2 | Salt, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-07 | — | — | US | disclosed |
| CN-104804603-B | A kind of super-hydrophobic ice-covering-proof coating with magnetic heating performance and preparation method thereof | 浙江大学 | 2017-10-31 | — | — | CN | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9777204-B2 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | THE CHEMOURS COMPANY FC, LLC (US) | 2017-10-03 | — | — | US | disclosed |
| WO-2017162834-A1 | USE OF DDX3 INHIBITORS AS ANTIPROLIFERATIVE AGENTS | AZIENDA OSPEDALIERA UNIVERSITARIA SENESE (IT) | 2017-09-28 | — | — | WO | disclosed |
| US-9771346-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-26 | — | — | US | disclosed |
| CN-107188569-A | A kind of desalinization composite membrane based on graphene oxide and preparation method thereof | 长沙无道工业设计有限公司 | 2017-09-22 | — | — | CN | disclosed |
| CN-107185415-A | It is a kind of for desalination composite membrane of industrial pollution seawater and preparation method thereof | 长沙无道工业设计有限公司 | 2017-09-22 | — | — | CN | disclosed |
| CN-107174975-A | A kind of desalinization composite membrane for producing hydrogen-rich direct drinking and preparation method thereof | 长沙无道工业设计有限公司 | 2017-09-19 | — | — | CN | disclosed |
| EP-3216840-A1 | COMPOSITIONS COMPRISING 1,1,1,4,4,4-HEXAFLUORO-2-BUTENE AND USES THEREOF | The Chemours Company FC, LLC (US) | 2017-09-13 | — | — | EP | disclosed |
| US-9760005-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9758466-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| CN-107117755-A | A kind of high ammonia-nitrogen wastewater processing and ammonia recovery system and its method | 杭州开源环保工程有限公司 | 2017-09-01 | — | — | CN | disclosed |
| US-20170247323-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-31 | — | — | US | disclosed |
| CN-105482604-B | A kind of aqueous anti-doodling paint and preparation method thereof | 杭州吉华高分子材料股份有限公司 | 2017-08-25 | — | — | CN | disclosed |
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| CN-107081076-A | A kind of desalinization composite membrane for producing magnetization direct drinking and preparation method thereof | 长沙无道工业设计有限公司 | 2017-08-22 | — | — | CN | disclosed |
| US-20170222156-A1 | LIGHT-EMITTING ELEMENT, LIGHT-EMITTING DEVICE, ELECTRONIC DEVICE, AND LIGHTING DEVICE | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2017-08-03 | — | — | US | disclosed |
| WO-2017108569-A1 | PESTICIDALLY ACTIVE PYRAZOLE DERIVATIVES | SYNGENTA PARTICIPATIONS AG (CH) | 2017-06-29 | — | — | WO | disclosed |
| WO-2017106930-A1 | COMPOUNDS | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2017-06-29 | — | — | WO | disclosed |
| US-20170173938-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND | FUJIFILM CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |
| US-20170168394-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-15 | — | — | US | disclosed |
| US-9671691-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9670172-B2 | Heterocyclic compounds and methods of use | MEDIVATION TECHNOLOGIES, INC. (US) | 2017-06-06 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9671692-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-20170146908-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME | FUJIFILM CORPORATION (JP) | 2017-05-25 | — | — | US | disclosed |
| US-9644056-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-09 | — | — | US | disclosed |
| US-9645490-B2 | Salt, acid generator, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-09 | — | — | US | disclosed |
| US-9638996-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9638997-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-20170115569-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170115568-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| EP-2420546-B1 | Terephthalate stabilizers for fluoroolefins | CHEMOURS CO FC LLC (US) | 2017-04-26 | — | — | EP | disclosed |
| US-9612533-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-04-04 | — | — | US | disclosed |
| CN-104558447-B | Inorganic nano composite anti-doodling resin and preparation method thereof | 杭州吉华高分子材料股份有限公司 | 2017-03-22 | — | — | CN | disclosed |
| US-9599897-B2 | Salt, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-03-21 | — | — | US | disclosed |
| US-20170073560-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | THE CHEMOURS COMPANY FC, LLC | 2017-03-16 | — | — | US | disclosed |
| US-9580402-B2 | Salt, acid generator, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-28 | — | — | US | disclosed |
| US-9575408-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-21 | — | — | US | disclosed |
| US-9563123-B2 | Photoresist composition, compound and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9562032-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9563124-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9563125-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9562122-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20170017154-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2017-01-19 | — | — | US | disclosed |
| US-20170017153-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2017-01-19 | — | — | US | disclosed |
| US-9540557-B2 | Compositions comprising fluoroolefins and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2017-01-10 | — | — | US | disclosed |
| US-20160377980-A1 | RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-12-29 | — | — | US | disclosed |
| US-20160377978-A1 | RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-12-29 | — | — | US | disclosed |
| US-20160377979-A1 | RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-12-29 | — | — | US | disclosed |
| US-9519218-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-12-13 | — | — | US | disclosed |
| US-9513549-B2 | Compound, resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-12-06 | — | — | US | disclosed |
| US-20160349613-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20160347897-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20160342083-A1 | PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-20160334702-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-11-17 | — | — | US | disclosed |
| EP-3091320-A1 | A VAPOR COMPRESSION HEAT TRANSFER SYSTEM | The Chemours Company FC, LLC (US) | 2016-11-09 | — | — | EP | disclosed |
| US-20160313645-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-2057245-B1 | PHOSPHORUS-CONTAINING STABILIZERS FOR FLUOROOLEFINS | CHEMOURS CO FC LLC (US) | 2016-10-05 | — | — | EP | disclosed |
| US-9448475-B2 | Photoresist composition, compound and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-09-20 | — | — | US | disclosed |
| US-9429841-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-30 | — | — | US | disclosed |
| US-20160244400-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-25 | — | — | US | disclosed |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-18 | — | — | US | disclosed |
| WO-2016128541-A1 | HUMAN HELICASE DDX3 INHIBITORS AS THERAPEUTIC AGENTS | AZIENDA OSPEDALIERA UNIVERSITARIA SENESE (IT) | 2016-08-18 | — | — | WO | disclosed |
| US-9417528-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-9410064-B2 | Compositions comprising fluoroolefins and uses thereof | THE CHEMOURS COMPANY FC, LLC (US) | 2016-08-09 | — | — | US | disclosed |
| US-9405191-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20160200702-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-07-14 | — | — | US | disclosed |
| US-20160195809-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-07-07 | — | — | US | disclosed |
| US-9373506-B2 | Method for treating surface of diamond thin film, method for forming transistor, and sensor device | YOKOGAWA ELECTRIC CORPORATION (JP) | 2016-06-21 | — | — | US | disclosed |
| US-20160168115-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160170300-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160170298-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160154304-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-02 | — | — | US | disclosed |
| US-20160147146-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160145205-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160145186-A1 | NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160147157-A1 | PATTERN FORMATION METHOD, PATTERN, AND ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE USING SAME | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20160130212-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160130210-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131975-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-9315709-B2 | Refrigerant additive compositions containing perfluoropolyethers | THE CHEMOURS COMPANY FC, LLC (US) | 2016-04-19 | — | — | US | disclosed |
| EP-2057247-B1 | ASCORBIC ACID STABILIZERS FOR FLUOROOLEFINS | DU PONT (US) | 2016-04-13 | — | — | EP | disclosed |
| EP-2145150-B1 | METHOD FOR EXCHANGING HEAT IN A VAPOR COMPRESSION HEAT TRANSFER SYSTEM AND A VAPOR COMPRESSION HEAT TRANSFER SYSTEM COMPRISING AN INTERMEDIATE HEAT EXCHANGER WITH A DUAL-ROW EVAPORATOR OR CONDENSER | DU PONT (US) | 2016-04-13 | — | — | EP | disclosed |
| US-9291893-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9290590-B2 | Polymeric anti-static agent | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2016-03-22 | — | — | US | disclosed |
| US-20160075806-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20160077433-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20160077430-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20160077432-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20160077429-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20160077431-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| CN-101626885-B | Metal polymer composites with enhanced viscoelastic and thermal properties | WILD RIVER CONSULTING GROUP LLC (US) | 2016-03-09 | — | — | CN | disclosed |
| US-20160062234-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160052860-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-20160053032-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-20160052859-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-20160052861-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| EP-2054361-B1 | PROCESSES FOR SEPARATION OF FLUOROOLEFINS FROM HYDROGEN FLUORIDE BY AZEOTROPIC DISTILLATION | DU PONT (US) | 2016-02-17 | — | — | EP | disclosed |
| US-20160032164-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | THE CHEMOURS COMPANY FC, LLC (US) | 2016-02-04 | — | — | US | disclosed |
| US-9250532-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9229321-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| CN-102439083-B | Low-density hollow glass microspheres polymer composites | Tundra Composites, LLC (US) | 2015-12-16 | — | — | CN | disclosed |
| US-20150337192-A1 | EPOXIDE AND FLUORINATED EPOXIDE STABILIZERS FOR FLUOROOLEFINS | JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT | 2015-11-26 | — | — | US | disclosed |
| US-20150338735-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-11-26 | — | — | US | disclosed |
| US-9176379-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-11-03 | — | — | US | disclosed |
| CN-105001661-A | Metal polymer composite material with enhanced viscoelasticity and thermal performance | WILD RIVER CONSULTING GROUP LLC | 2015-10-28 | — | — | CN | disclosed |
| US-20150286137-A1 | PHOTORESIST COMPOSITION AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-10-08 | — | — | US | disclosed |
| CN-104945615-A | Fluorine-containing acryl compound, method for making the same, curable composition and substrate | SHINETSU CHEMICAL CO | 2015-09-30 | — | — | CN | disclosed |
| US-9134607-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-15 | — | — | US | disclosed |
| US-9133381-B2 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | THE CHEMOURS COMPANY FC, LLC (US) | 2015-09-15 | — | — | US | disclosed |
| US-20150253662-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-9128376-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| US-20150248056-A1 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-03 | — | — | US | disclosed |
| US-20150248052-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-03 | — | — | US | disclosed |
| US-20150241769-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-08-27 | — | — | US | disclosed |
| US-20150212408-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20150212407-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-07-30 | — | — | US | disclosed |
| US-9086627-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| US-9075310-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20150168828-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-18 | — | — | US | disclosed |
| EP-2736987-B1 | COPPER COMPLEXES OF AMINO-FUNCTIONAL ORGANOSILICON COMPOUNDS AND THEIR USE | WACKER CHEMIE AG (DE) | 2015-06-17 | — | — | EP | disclosed |
| US-9052591-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-09 | — | — | US | disclosed |
| US-9040231-B2 | — | — | 2015-05-26 | — | — | US | disclosed |
| US-9040219-B2 | Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate | FUJIFILM CORPORATION (JP) | 2015-05-26 | — | — | US | disclosed |
| US-20150135745-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT | 2015-05-21 | — | — | US | disclosed |
| US-20150105843-A1 | METAL COMPLEXES COMPRISING CONDENSED HETEROAROMATIC RINGS | UDC IRELAND LIMITED (IE) | 2015-04-16 | — | — | US | disclosed |
| US-20150105843-A1 | METAL COMPLEXES COMPRISING CONDENSED HETEROAROMATIC RINGS | UDC IRELAND LIMITED (IE) | 2015-04-16 | — | — | US | disclosed |
| US-9000238-B2 | Processes for separation of fluoroolefins from hydrogen fluoride by azeotropic distillation | E I DU PONT DE NEMOURS AND COMPANY (US) | 2015-04-07 | — | — | US | disclosed |
| US-20150068227-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT | 2015-03-12 | — | — | US | disclosed |
| WO-2015031650-A1 | HETEROCYCLIC COMPOUNDS AND METHODS OF USE | CHAKRAVARTY SARVAJIT (US) | 2015-03-05 | — | — | WO | disclosed |
| US-20150065519-A1 | HETEROCYCLIC COMPOUNDS AND METHODS OF USE | MEDIVATION TECHNOLOGIES LLC | 2015-03-05 | — | — | US | disclosed |
| US-20150064622-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-05 | — | — | US | disclosed |
| EP-2843080-A1 | Method for treating surface of diamond thin film, method for forming transistor, and sensor device | Yokogawa Electric Corporation (JP) | 2015-03-04 | — | — | EP | disclosed |
| US-20150054000-A1 | METHOD FOR TREATING SURFACE OF DIAMOND THIN FILM, METHOD FOR FORMING TRANSISTOR, AND SENSOR DEVICE | WASEDA UNIVERSITY (JP) | 2015-02-26 | — | — | US | disclosed |
| EP-2353048-B1 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM CORP (JP) | 2015-02-25 | — | — | EP | disclosed |
| US-8951709-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-02-10 | — | — | US | disclosed |
| US-8940473-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-01-27 | — | — | US | disclosed |
| US-8911640-B2 | Compositions comprising fluoroolefins and uses thereof | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-12-16 | — | — | US | disclosed |
| US-8889888-B2 | Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8835095-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2542533-B1 | FLUORALKYL-SUBSTITUTED 2-AMIDOBENZIMIDAZOLES AND THEIR USE FOR INCREASING STRESS TOLERANCE IN PLANTS | BAYER IP GMBH (DE) | 2014-09-10 | — | — | EP | disclosed |
| US-20140245760-A1 | REFRIGERANT ADDITIVE COMPOSITIONS CONTAINING PERFLUOROPOLYETHERS | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-09-04 | — | — | US | disclosed |
| US-20140248556-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-09-04 | — | — | US | disclosed |
| US-8815114-B2 | Phenol stabilizers for fluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-08-26 | — | — | US | disclosed |
| US-20140234761-A1 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-08-21 | — | — | US | disclosed |
| US-20140227637-A1 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-8778594-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8758641-B2 | Refrigerant additive compositions containing perfluoropolyethers | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-06-24 | — | — | US | disclosed |
| US-8741543-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8735047-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8709699-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-04-29 | — | — | US | disclosed |
| CN-101909684-B | Medicinal inhalation devices and components thereof | 3M INNOVATIVE PROPERTIES CO | 2014-03-19 | — | — | CN | disclosed |
| US-8668791-B2 | Ascorbic acid, terephthalate and nitromethane stabilizers for fluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-03-11 | — | — | US | disclosed |
| US-8663900-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8663494-B2 | Terpene, terpenoid, and fullerene stabilizers for fluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-03-04 | — | — | US | disclosed |
| US-8652753-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-02-18 | — | — | US | disclosed |
| US-20140030654-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-30 | — | — | US | disclosed |
| US-20140020416-A1 | EPOXIDE AND FLUORINATED EPOXIDE STABILIZERS FOR FLUOROOLEFINS | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-01-23 | — | — | US | disclosed |
| US-20140023971-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-23 | — | — | US | disclosed |
| EP-2433921-B1 | Processes for separation of fluoroolefins from hydrogen fluoride by azeotropic distillation | DU PONT (US) | 2014-01-15 | — | — | EP | disclosed |
| CN-101909685-B | Medicinal inhalation devices and components thereof | 3M INNOVATIVE PROPERTIES CO | 2013-12-18 | — | — | CN | disclosed |
| US-8592132-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-11-26 | — | — | US | disclosed |
| US-8574812-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20130283834-A1 | PHENOL STABILIZERS FOR FLUOROOLEFINS | THE CHEMOURS COMPANY FC, LLC | 2013-10-31 | — | — | US | disclosed |
| US-8568956-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-29 | — | — | US | disclosed |
| US-8563217-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-22 | — | — | US | disclosed |
| US-8563219-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-22 | — | — | US | disclosed |
| US-8563218-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-22 | — | — | US | disclosed |
| WO-2013151697-A1 | METHODS AND COMPOUNDS FOR IDENTIFYING GLYCOSYLTRANSFERASE INHIBITORS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2013-10-10 | — | — | WO | disclosed |
| WO-2013152279-A1 | CHEMOENZYMATIC METHODS FOR SYNTHESIZING MOENOMYCIN ANALOGS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2013-10-10 | — | — | WO | disclosed |
| CN-101909682-B | Medicinal inhalation device and components thereof | 3M INNOVATIVE PROPERTIES CO | 2013-09-18 | — | — | CN | disclosed |
| US-8535555-B2 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-09-17 | — | — | US | disclosed |
| US-8535556-B2 | Compositions comprising iodotrifluoromethane and stabilizers | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-09-17 | — | — | US | disclosed |
| US-8529786-B2 | Phosphorus-containing stabilizers for fluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-09-10 | — | — | US | disclosed |
| US-8529703-B2 | Cleaning agent, cleaning method and cleaning apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2013-09-10 | — | — | US | disclosed |
| US-20130213063-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-08-22 | — | — | US | disclosed |
| US-20130199219-A1 | REFRIGERANT ADDITIVE COMPOSITIONS CONTAINING PERFLUOROPOLYETHERS | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-08-08 | — | — | US | disclosed |
| WO-2013115345-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-08-08 | — | — | WO | disclosed |
| US-8496846-B2 | Phenol stabilizers for fluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-07-30 | — | — | US | disclosed |
| EP-1951838-B1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | DU PONT (US) | 2013-07-17 | — | — | EP | disclosed |
| US-8481655-B2 | Copper complexes of amino-functional organosilicon compounds and their use | WACKER CHEMICAL CORPORATION (US) | 2013-07-09 | — | — | US | disclosed |
| EP-2602660-A1 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-12 | — | — | EP | disclosed |
| WO-2013069813-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-05-16 | — | — | WO | disclosed |
| WO-2013069811-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-05-16 | — | — | WO | disclosed |
| US-20130122427-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| EP-2591296-A2 | CASCADE REFRIGERATION SYSTEM WITH FLUOROOLEFIN REFRIGERANT | E. I. du Pont de Nemours and Company (US) | 2013-05-15 | — | — | EP | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| WO-2013062133-A1 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-05-02 | — | — | WO | disclosed |
| US-20130109809-A1 | POLYMERIC ANTI-STATIC AGENT | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2013-05-02 | — | — | US | disclosed |
| WO-2013062066-A1 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-05-02 | — | — | WO | disclosed |
| US-8426657-B2 | Refrigerant additive compositions containing perfluoropolyethers | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-04-23 | — | — | US | disclosed |
| US-8425795-B2 | Compositions comprising fluoroolefins and uses thereof | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-04-23 | — | — | US | disclosed |
| US-8419962-B2 | Method for disposing a microstructure | PANASONIC CORPORATION (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8420292-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-16 | — | — | US | disclosed |
| WO-2013047902-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |
| US-8394286-B2 | Thiol and thioether stabilizers for fluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-03-12 | — | — | US | disclosed |
| US-8383004-B2 | Amine stabilizers for fluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-02-26 | — | — | US | disclosed |
| US-8378016-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-19 | — | — | US | disclosed |
| US-20130030101-A1 | Copper Complexes Of Amino-Functional Organosilicon Compounds And Their Use | WACKER CHEMICAL CORPORATION (US) | 2013-01-31 | — | — | US | disclosed |
| US-20130022916-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022920-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022924-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022915-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022925-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022910-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022919-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022921-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022922-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022928-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120305382-A1 | PROCESSES FOR SEPARATION OF FLUOROOLEFINS FROM HYDROGEN FLUORIDE BY AZEOTROPIC DISTILLATION | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-12-06 | — | — | US | disclosed |
| CN-101400727-B | Metal polymer composites with enhanced properties | WILDER RIVER CONSULTING GROUP CO | 2012-10-24 | — | — | CN | disclosed |
| US-20120264059-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-18 | — | — | US | disclosed |
| US-8273928-B2 | Processes for separation of fluoroolefins from hydrogen fluoride by azeotropic distillation | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-09-25 | — | — | US | disclosed |
| US-20120219912-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219908-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219898-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219905-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219906-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120216551-A1 | CASCADE REFRIGERATION SYSTEM WITH FLUOROOLEFIN REFRIGERANT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-08-30 | — | — | US | disclosed |
| US-20120219909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219904-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219899-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| EP-2041055-B1 | PROCESS FOR SEPARATING A FLUOROOLEFIN FROM HF BY LIQUID-LIQUID EXTRACTION | DU PONT (US) | 2012-08-22 | — | — | EP | disclosed |
| US-20120207978-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-16 | — | — | US | disclosed |
| EP-2082995-B1 | Method of reducing the surface tension, of forming a stable foam and to increase the wetting of a coating | 3M INNOVATIVE PROPERTIES CO (US) | 2012-08-08 | — | — | EP | disclosed |
| US-20120156620-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120100483-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120100482-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120085110-A1 | TERPENE, TERPENOID, AND FULLERENE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-04-12 | — | — | US | disclosed |
| US-20120074349-A1 | ASCORBIC ACID, TEREPHTHALATE AND NITROMETHANE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-03-29 | — | — | US | disclosed |
| EP-2433921-A1 | Processes for separation of fluoroolefins from hydrogen fluoride by azeotropic distillation | E. I. du Pont de Nemours and Company (US) | 2012-03-28 | — | — | EP | disclosed |
| US-20120047925-A1 | PHENOL STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-03-01 | — | — | US | disclosed |
| US-20120052445-A1 | IMAGE FORMING MATERIAL, PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD FOR MANUFACTURING A PLANOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120042668-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-02-23 | — | — | US | disclosed |
| EP-2420546-A2 | Terephthalate stabilizers for fluoroolefins | E. I. du Pont de Nemours and Company (US) | 2012-02-22 | — | — | EP | disclosed |
| EP-2410032-A2 | Phosphorus-containing stabilizers for fluoroolefins | E.I. Du Pont De Nemours And Company (US) | 2012-01-25 | — | — | EP | disclosed |
| US-8101094-B2 | Terpene, terpenoid, and fullerene stabilizers for fluoroolefins | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-24 | — | — | US | disclosed |
| US-20120011864-A1 | Refrigerant Additive Compositions Containing Perfluoropolyethers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-19 | — | — | US | disclosed |
| US-8097181-B2 | fluoroolefins as new working fluids with low global warming potential (GWP), stabilized against oxidative degradation with e.g. diphenyl terephthalate | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-17 | — | — | US | disclosed |
| US-8058070-B2 | Method of determining the components of a fluoroolefin composition, method of recharging a fluid system in response thereto, and sensors used therefor | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-11-15 | — | — | US | disclosed |
| US-8049046-B2 | Refrigerant additive compositions containing perfluoropolyethers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-11-01 | — | — | US | disclosed |
| US-20110259022-A1 | EPOXIDE AND FLUORINATED EPOXIDE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY | 2011-10-27 | — | — | US | disclosed |
| US-8024937-B2 | Method for leak detection in heat transfer systems | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-09-27 | — | — | US | disclosed |
| WO-2011107504-A1 | FLUOROALKYL-SUBSTITUTED 2-AMIDOBENZIMIDAZOLES AND THE USE THEREOF FOR BOOSTING STRESS TOLERANCE IN PLANTS | BAYER CROPSCIENCE AG (DE) | 2011-09-09 | — | — | WO | disclosed |
| US-8012368-B2 | Compositions comprising fluoroolefins and uses thereof | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-09-06 | — | — | US | disclosed |
| EP-2359076-A2 | ABSORPTION POWER CYCLE SYSTEM | E. I. du Pont de Nemours and Company (US) | 2011-08-24 | — | — | EP | disclosed |
| US-20110177455-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-21 | — | — | US | disclosed |
| US-20110165519-A1 | RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME | ANDO NOBUO | 2011-07-07 | — | — | US | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| WO-2011056824-A2 | CASCADE REFRIGERATION SYSTEM WITH FLUOROOLEFIN REFRIGERANT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-05-12 | — | — | WO | disclosed |
| US-20110088418-A1 | COMPOSITIONS COMPRISING IONIC LIQUIDS AND FLUOROOLEFINS AND USE THEREOF IN ABSORPTION CYCLE SYSTEMS | E. I. DU PONT DE NEMOURS AND COMPANY | 2011-04-21 | — | — | US | disclosed |
| EP-2300552-A1 | COMPOSITIONS COMPRISING IONIC LIQUIDS AND FLUOROOLEFINS AND USE THEREOF IN ABSORPTION CYCLE SYSTEMS | E. I. du Pont de Nemours and Company (US) | 2011-03-30 | — | — | EP | disclosed |
| EP-2295518-A2 | Compositions Comprising Fluoroolefins and Uses Thereof | E. I. du Pont de Nemours and Company (US) | 2011-03-16 | — | — | EP | disclosed |
| US-20110041530-A1 | AMINE STABILIZERS FOR FLUOROOLEFINS | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 2011-02-24 | — | — | US | disclosed |
| US-20110037017-A1 | COMPOSITIONS COMPRISING IODOTRIFLUOROMETHANE AND STABILIZERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-02-17 | — | — | US | disclosed |
| US-20110014567-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20110005723-A1 | IONIC LIQUID STABILIZER COMPOSITIONS | E. I. DU PONT DE NEMOURS AND COMPANY | 2011-01-13 | — | — | US | disclosed |
| US-20100308259-A1 | PROCESS FOR SEPARATING A FLUOROOLEFIN FROM HF BY LIQUID-LIQUID EXTRACTION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-12-09 | — | — | US | disclosed |
| CN-101909682-A | Medicinal inhalation device and components thereof | 3M INNOVATIVE PROPERTIES CO | 2010-12-08 | — | — | CN | disclosed |
| CN-101909683-A | Medicinal inhalation device and components thereof | 3M INNOVATIVE PROPERTIES CO | 2010-12-08 | — | — | CN | disclosed |
| CN-101909684-A | Medicinal inhalation devices and components thereof | 3M INNOVATIVE PROPERTIES CO | 2010-12-08 | — | — | CN | disclosed |
| CN-101909685-A | Medicinal inhalation devices and components thereof | 3M INNOVATIVE PROPERTIES CO | 2010-12-08 | — | — | CN | disclosed |
| US-20100301259-A1 | PHOSPHORUS-CONTAINING STABILIZERS FOR FLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-12-02 | — | — | US | disclosed |
| US-7838190-B2 | Electrophotographic photosensitive member with surface layer of fluororesin particles and polyolefin with perfluoroalkyl group | CANON KABUSHIKI KAISHA (JP) | 2010-11-23 | — | — | US | disclosed |
| US-20100288965-A1 | TERPENE, TERPENOID, AND FULLERENE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-18 | — | — | US | disclosed |
| US-20100288966-A1 | ASCORBIC ACID, TEREPHTHALATE AND NITROMETHANE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-18 | — | — | US | disclosed |
| US-7824839-B2 | cationic lactone containing perfluorinated sulfonate or sulfonimides with iodonium or sulfonium anions as photoacid generator, a polyhydroxystyrene homo or copolymer and a solvent (propylene glycol/1,2-/, monoalkyl ether, ethyl lactone ); semiconductor, heat exposure, pattern forming; development | CORNELL RESEARCH FOUNDATION, INC. (US) | 2010-11-02 | — | — | US | disclosed |
| US-7803975-B2 | Process for separating a fluoroolefin from HF by liquid-liquid extraction | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-09-28 | — | — | US | disclosed |
| US-7799496-B2 | Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2010-09-21 | — | — | US | disclosed |
| US-20100200799-A1 | IONIC LIQUID STABILIZER COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-08-12 | — | — | US | disclosed |
| US-7759532-B2 | Refrigerant additive compositions containing perfluoropolyethers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-07-20 | — | — | US | disclosed |
| WO-2010080467-A2 | ABSORPTION POWER CYCLE SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-07-15 | — | — | WO | disclosed |
| US-20100154419-A1 | ABSORPTION POWER CYCLE SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-06-24 | — | — | US | disclosed |
| US-20100132387-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-06-03 | — | — | US | disclosed |
| EP-2190488-A1 | IONIC LIQUID STABILIZER COMPOSITIONS | E. I. du Pont de Nemours and Company (US) | 2010-06-02 | — | — | EP | disclosed |
| US-20100127208-A1 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-05-27 | — | — | US | disclosed |
| US-7708903-B2 | refrigerants as heat exchanger; comprising 1,1,1,4,4,5,5,5-octafluoro-2-pentene mixture | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-05-04 | — | — | US | disclosed |
| US-7704657-B2 | Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2010-04-27 | — | — | US | disclosed |
| US-20100090155-A1 | THIOL AND THIOETHER STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-04-15 | — | — | US | disclosed |
| EP-2156158-A1 | METHOD FOR LEAK DETECTION IN HEAT TRANSFER SYSTEM | E. I. Du Pont de Nemours and Company (US) | 2010-02-24 | — | — | EP | disclosed |
| US-20100021409-A1 | Film Forming Personal Care Compositions | THE PROCTER & GAMBLE COMPANY | 2010-01-28 | — | — | US | disclosed |
| EP-2145150-A2 | METHOD FOR EXCHANGING HEAT IN A VAPOR COMPRESSION HEAT TRANSFER SYSTEM AND A VAPOR COMPRESSION HEAT TRANSFER SYSTEM COMPRISING AN INTERMEDIATE HEAT EXCHANGER WITH A DUAL-ROW EVAPORATOR OR CONDENSER | E. I. Du Pont de Nemours and Company (US) | 2010-01-20 | — | — | EP | disclosed |
| WO-2010006006-A1 | COMPOSITIONS COMPRISING IONIC LIQUIDS AND FLUOROOLEFINS AND USE THEREOF IN ABSORPTION CYCLE SYSTEMS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-01-14 | — | — | WO | disclosed |
| CN-101626885-A | Metal polymer composites with enhanced viscoelastic and thermal properties | WILD RIVER CONSULTING GROUP LL | 2010-01-13 | — | — | CN | disclosed |
| US-20090288431-A1 | PHENOL STABILIZERS FOR FLUOROOLEFINS | THE CHEMOURS COMPANY FC, LLC | 2009-11-26 | — | — | US | disclosed |
| US-20090229633-A1 | CLEANING AGENT, CLEANING METHOD AND CLEANING APPARATUS | TOKUYAMA METEL CORPORATION (JP) | 2009-09-17 | — | — | US | disclosed |
| EP-2082995-A1 | Fluorochemical surfactants containing nonafluorobutanesulfonamide segments | 3M Innovative Properties Company (US) | 2009-07-29 | — | — | EP | disclosed |
| US-20090180800-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2009-07-16 | — | — | US | disclosed |
| US-7553594-B2 | Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2009-06-30 | — | — | US | disclosed |
| US-7553594-B2 | Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2009-06-30 | — | — | US | disclosed |
| EP-2071403-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY, METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC DEVICE | Canon Kabushiki Kaisha (JP) | 2009-06-17 | — | — | EP | disclosed |
| EP-2069456-A1 | AMINE STABILIZERS FOR FLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-06-17 | — | — | EP | disclosed |
| EP-2069455-A1 | TERPENE, TERPENOID, AND FULLERENE STABILIZERS FOR FLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-06-17 | — | — | EP | disclosed |
| EP-2071404-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY, METHOD FOR PRODUCING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC DEVICE | Canon Kabushiki Kaisha (JP) | 2009-06-17 | — | — | EP | disclosed |
| EP-2064533-A2 | METHOD OF DETECTING LEAKS OF FLUOROOLEFIN COMPOSITIONS AND SENSORS USED THEREFOR | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-06-03 | — | — | EP | disclosed |
| US-20090136868-A1 | PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS | CORNELL RESEARCH FOUNDATION, INC. | 2009-05-28 | — | — | US | disclosed |
| US-20090130576-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2009-05-21 | — | — | US | disclosed |
| US-20090120619-A1 | METHOD FOR EXCHANGING HEAT IN VAPOR COMPRESSION HEAT TRANSFER SYSTEMS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-05-14 | — | — | US | disclosed |
| EP-2057246-A1 | THIOL AND THIOETHER STABILIZERS FOR FLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-05-13 | — | — | EP | disclosed |
| EP-2057245-A2 | PHOSPHORUS-CONTAINING STABILIZERS FOR FLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-05-13 | — | — | EP | disclosed |
| EP-2057247-A2 | ASCORBIC ACID, TEREPHTHALATE, OR NITROMETHANE STABILIZERS FOR FLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-05-13 | — | — | EP | disclosed |
| US-7531495-B2 | Cleaning agent, cleaning method and cleaning apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-05-12 | — | — | US | disclosed |
| EP-2054361-A1 | PROCESSES FOR SEPARATION OF FLUOROOLEFINS FROM HYDROGEN FLUORIDE BY AZEOTROPIC DISTILLATION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-05-06 | — | — | EP | disclosed |
| EP-2003148-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2009-04-22 | — | — | EP | disclosed |
| WO-2009042847-A1 | IONIC LIQUID STABILIZER COMPOSITIONS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-04-02 | — | — | WO | disclosed |
| EP-2041055-A2 | PROCESS FOR SEPARATING A FLUOROOLEFIN FROM HF BY LIQUID-LIQUID EXTRACTION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-04-01 | — | — | EP | disclosed |
| CN-101400727-A | Metal polymer composites with enhanced properties | WILDER RIVER CONSULTING GROUP (US) | 2009-04-01 | — | — | CN | disclosed |
| CN-100453585-C | Method for producing thermoplastic resin microporous film | TONEN SEKIYUKAGAKU KK (JP) | 2009-01-21 | — | — | CN | disclosed |
| US-20080314073-A1 | METHOD FOR LEAK DETECTION IN HEAT TRANSFER SYSTEMS | E. L. DU PONT DE NEMOURS AND COMPANY (US) | 2008-12-25 | — | — | US | disclosed |
| WO-2008157757-A1 | METHOD FOR LEAK DETECTION IN HEAT TRANSFER SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-12-24 | — | — | WO | disclosed |
| EP-2003148-A2 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |
| US-20080295580-A1 | METHOD OF DETERMINING THE COMPONENTS OF A FLUOROOLEFIN COMPOSITION, METHOD OF RECHARGING A FLUID SYSTEM IN RESPONSE THERETO, AND SENSORS USED THEREFOR | E. I. DU PONT DE NEMOURS AND COMPANY | 2008-12-04 | — | — | US | disclosed |
| EP-0994089-B1 | POLYMER-CONTAINING SOLUTION AND METHOD FOR FORMING POLYMER FILM | NIPPON ZEON CO (JP) | 2008-11-26 | — | — | EP | disclosed |
| WO-2008140809-A2 | METHOD FOR EXCHANGING HEAT IN A VAPOR COMPRESSION HEAT TRANSFER SYSTEM AND A VAPOR COMPRESSION HEAT TRANSFER SYSTEM COMPRISING AN INTERMEDIATE HEAT EXCHANGER WITH A DUAL-ROW EVAPORATOR OR CONDENSER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-11-20 | — | — | WO | disclosed |
| US-20080199794-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2008-08-21 | — | — | US | disclosed |
| US-20080199795-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2008-08-21 | — | — | US | disclosed |
| US-20080199795-A1 | ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2008-08-21 | — | — | US | disclosed |
| EP-1951838-A2 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-08-06 | — | — | EP | disclosed |
| US-20080108749-A1 | Fluoropolymer nanoemulsions | NANOMAX TECHNOLOGY COMPANY LIMITED | 2008-05-08 | — | — | US | disclosed |
| WO-2008042066-A1 | AMINE STABILIZERS FOR FLUOROOLEFINS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-04-10 | — | — | WO | disclosed |
| US-20080069177-A1 | METHOD OF DETECTING LEAKS OF FLUOROOLEFIN COMPOSITIONS AND SENSORS USED THEREFOR | E. I. DU PONT DE NEMOURS AND COMPANY | 2008-03-20 | — | — | US | disclosed |
| WO-2008033568-A2 | DETERMINATION OF THE COMPONENTS OF A FLUOROOLEFIN COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-20 | — | — | WO | disclosed |
| WO-2008033570-A2 | METHOD OF DETECTING LEAKS OF FLUOROOLEFIN COMPOSITIONS AND SENSORS USED THEREFOR | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-20 | — | — | WO | disclosed |
| WO-2008027515-A2 | PHOSPHORUS-CONTAINING STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027595-A1 | ALKYL SILANE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027512-A2 | FUNCTIONALIZED PERFLUOROPOLYETHER STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027596-A2 | BENZOPHENONE DERIVATIVE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027519-A1 | OXETANE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027514-A1 | TERPENE, TERPENOID, AND FULLERENE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027513-A2 | ARYL-ALKYL ETHER, POLYOXYALKYLATED AROMATIC, AND ALKYLATED AROMATIC STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027516-A1 | LACTONES FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027517-A1 | THIOL AND THIOETHER STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008027518-A2 | ASCORBIC ACID, TEREPHTHALATE, OR NITROMETHANE STABILIZERS FOR FLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-03-06 | — | — | WO | disclosed |
| WO-2008024508-A1 | PROCESSES FOR SEPARATION OF FLUOROOLEFINS FROM HYDROGEN FLUORIDE BY AZEOTROPIC DISTILLATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-02-28 | — | — | WO | disclosed |
| US-20080051612-A1 | PROCESSES FOR SEPARATION OF FLUOROOLEFINS FROM HYDROGEN FLUORIDE BY AZEOTROPIC DISTILLATION | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 2008-02-28 | — | — | US | disclosed |
| US-7335458-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-02-26 | — | — | US | disclosed |
| WO-2008008519-A2 | PROCESS FOR SEPARATING A FLUOROOLEFIN FROM HF BY LIQUID-LIQUID EXTRACTION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-01-17 | — | — | WO | disclosed |
| US-20080011678-A1 | Process for separating a fluoroolefin from HF by liquid-liquid extraction | THE CHEMOURS COMPANY FC, LLC | 2008-01-17 | — | — | US | disclosed |
| WO-2008002509-A2 | PERFLUORO STYRENE POLYMERS AND THEIR USE AS SURFACTANT AND SUBSTRATE TREATING REAGENTS | THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) | 2008-01-03 | — | — | WO | disclosed |
| US-20070284555-A1 | Refrigerant additive compositionis containing perfluoropolyethers | THE CHEMOURS COMPANY FC, LLC | 2007-12-13 | — | — | US | disclosed |
| WO-2007126760-A2 | COMPOSITIONS COMPRISING IODOTRIFLUOROMETHANE AND STABILIZERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-11-08 | — | — | WO | disclosed |
| US-7288511-B2 | Cleaning compositions containing dichloroethylene and six carbon alkoxy substituted perfluoro compounds | KYZEN CORPORATION (US) | 2007-10-30 | — | — | US | disclosed |
| US-20070231671-A1 | Catalyst Material For Use In Fuel Cell, Catalyst Membrane, Membrane Electrode Assembly and Fuel Cell | FUJIFILM CORPORATION | 2007-10-04 | — | — | US | disclosed |
| US-20070128455-A1 | Highly stable surface plasmon resonance plates, microarrays, and methods | SUZHOU PUXIN LIFE SCIENCE & TECHNOLOGY., LTD. (CN) | 2007-06-07 | — | — | US | disclosed |
| US-20070108403-A1 | refrigerants as heat exchanger; comprising 1,1,1,4,4,5,5,5-octafluoro-2-pentene mixture | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-05-17 | — | — | US | disclosed |
| WO-2007053697-A2 | COMPOSITIONS COMPRISING FLUOROOLEFINS AND USES THEREOF | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-05-10 | — | — | WO | disclosed |
| CN-1308402-C | Anti-fouling coating for anti-reflective surfaces and method for making same | MINNESITA MINING AND MFG CO (US) | 2007-04-04 | — | — | CN | disclosed |
| EP-0964438-B1 | DRY ETCHING METHOD | AGENCY IND SCIENCE TECHN (JP) | 2007-01-10 | — | — | EP | disclosed |
| EP-1511833-B1 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORP (US) | 2007-01-10 | — | — | EP | disclosed |
| EP-0948033-B1 | GAS COMPOSITION FOR DRY ETCHING AND PROCESS OF DRY ETCHING | AGENCY IND SCIENCE TECHN (JP) | 2006-10-18 | — | — | EP | disclosed |
| CN-1845955-A | Method for producing thermoplastic resin microporous film | TONEN SEKIYUKAGAKU KK (JP) | 2006-10-11 | — | — | CN | disclosed |
| EP-1511833-A4 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORP (US) | 2005-07-06 | — | — | EP | disclosed |
| EP-1511833-A2 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | Kyzen Corporation (US) | 2005-03-09 | — | — | EP | disclosed |
| US-20040224870-A1 | Cleaning compositions containing dichloroethylene and six carbon alkoxy substituted perfluoro compounds | KYZEN CORPORATION | 2004-11-11 | — | — | US | disclosed |
| US-6756179-B2 | A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-29 | — | — | US | disclosed |
| US-6699829-B2 | ALSO CONTAINING ADDITIVE SELECTED FROM HIGHLY FLUORINATED COMPOUND AND ENHANCEMENT AGENT OR MIXTURES | KYZEN CORPORATION | 2004-03-02 | — | — | US | disclosed |
| US-6689734-B2 | AND MIXTURES WITH HIGHLY FLUORINATED COMPOUNDS AND/OR OTHER AGENTS THAT IMPROVE AND ENHANCE THE PROPERTIES OF THE MIXTURE; DEGREASING, PHOTORESIST STRIPPING | KYZEN CORPORATION | 2004-02-10 | — | — | US | disclosed |
| WO-2003104365-A2 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORPORATION (US) | 2003-12-18 | — | — | WO | disclosed |
| US-20030228997-A1 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORPORATION | 2003-12-11 | — | — | US | disclosed |
| US-20030083220-A1 | Low ozone depleting brominated compound mixtures for use in solvent and cleaning applications | KYZEN CORPORATION | 2003-05-01 | — | — | US | disclosed |
| US-6506950-B1 | Saturated linear polyfluorohydrocarbons, processes for their production, and their use in cleaning compositions | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-01-14 | — | — | US | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| US-6383403-B1 | USING OCTAFLUOROCYCLOPENTENE AND GENERATING A PLASMA USING INDUCTION OR HELICON WAVE SYSTEM TO ETCH SEMICONDUCTORS; HIGH ETCH SELECTIVITY; DOESN'T FORM POLYMER | JAPAN AS REPRESENTED BY THE DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6355113-B1 | Multiple solvent cleaning system | 3M INNOVATIVE PROPERTIES COMPANY | 2002-03-12 | — | — | US | disclosed |
| US-6322715-B1 | HIGH RATE, GOOD SELECTIVITY; USED FOR PROTECTIVE THIN FILMS SUCH AS PHOTORESISTS OR POLYSILICONS | JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2001-11-27 | — | — | US | disclosed |
| US-6312759-B1 | ALICYCLIC TRIHYDROFLUOROCARBON WITH 5 CARBON ATOMS | NIPPON ZEON CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| US-6277485-B1 | FLUORINATED POLYETHER CONTAINING SILOXANE GROUPS | 3M INNOVATIVE PROPERTIES COMPANY | 2001-08-21 | — | — | US | disclosed |
| CN-1284105-A | Antisoiling coatings for antireflective surfaces and methods of prepn | MINNESITA MINING AND MFG CO (US) | 2001-02-14 | — | — | CN | disclosed |
| EP-0994089-A1 | FLUORINATED HYDROCARBONS, DETERGENTS, DETERGING METHOD, POLYMER-CONTAINING FLUIDS, AND METHOD OF FORMING POLYMER FILMS | Nippon Zeon Co., Ltd. (JP) | 2000-04-19 | — | — | EP | disclosed |
| EP-0982281-A1 | FLUORINATED, SATURATED HYDROCARBONS | JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2000-03-01 | — | — | EP | disclosed |
| EP-0964438-A1 | DRY ETCHING METHOD | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1999-12-15 | — | — | EP | disclosed |
| EP-0948033-A1 | GAS COMPOSITION FOR DRY ETCHING AND PROCESS OF DRY ETCHING | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1999-10-06 | — | — | EP | disclosed |
| EP-0747404-B1 | Method for producing a fluorine-containing copolymer | ASAHI GLASS CO LTD (JP) | 1999-09-01 | — | — | EP | disclosed |
| US-5811473-A | ADHESION PROMOTER COMPRISING A POLYFLUOROALKANE COMPOUND, AN ALKANOL, A TRANSITION METAL COMPOUND AND AN AMINE COMPOUND | LOCTITE CORPORATION (US) | 1998-09-22 | — | — | US | disclosed |
| US-5723701-A | Saturated linear polyfluorohydrocarbons, processes for their production, and their use in cleaning compositions | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-03-03 | — | — | US | disclosed |
| US-5683978-A | Saturated linear polyfluorohydrocarbons in cleaning compositions | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-11-04 | — | — | US | disclosed |
| US-5663251-A | Method for producing a fluorine-containing copolymer | ASAHI GLASS COMPANY LTD. (JP) | 1997-09-02 | — | — | US | disclosed |
| EP-0747404-A1 | Method for producing a fluorine-containing copolymer | ASAHI GLASS COMPANY LTD. (JP) | 1996-12-11 | — | — | EP | disclosed |
| EP-0552252-B1 | SATURATED LINEAR POLYFLUOROHYDROCARBONS, PROCESSES FOR THEIR PRODUCTION, AND THEIR USE IN CLEANING COMPOSITIONS | DU PONT (US) | 1996-06-19 | — | — | EP | disclosed |
| US-5504265-A | Saturated linear polyfluorohydrocarbons, processes for their production, and their use in cleaning compositions | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-04-02 | — | — | US | disclosed |
| EP-0701634-A1 | MULTIPLE SOLVENT CLEANING SYSTEM | AlliedSignal Inc. (US) | 1996-03-20 | — | — | EP | disclosed |
| WO-1994028196-A1 | MULTIPLE SOLVENT CLEANING SYSTEM | ALLIEDSIGNAL INC. (US) | 1994-12-08 | — | — | WO | disclosed |
| JP-H06157615-A | PRODUCTION OF FLUOROPOLYMER | ASAHI GLASS CO LTD | 1994-06-07 | — | — | JP | disclosed |
| JP-H05269301-A | DEWATERING FLUOROSOLVENT | ASAHI CHEM IND CO LTD | 1993-10-19 | — | — | JP | disclosed |
| EP-0552252-A4 | SATURATED LINEAR POLYFLUOROHYDROCARBONS, PROCESSES FOR THEIR PRODUCTION, AND THEIR USE IN CLEANING COMPOSITIONS | — | 1993-09-22 | — | — | EP | disclosed |
| EP-0552252-A1 | SATURATED LINEAR POLYFLUOROHYDROCARBONS, PROCESSES FOR THEIR PRODUCTION, AND THEIR USE IN CLEANING COMPOSITIONS. | DU PONT (US) | 1993-07-28 | — | — | EP | disclosed |
| US-5171902-A | SATURATED LINEAR POLYFLUOROHYDROCARBONS, PROCESSES FOR THEIR PRODUCTION, AND THEIR USE IN CLEANING COMPOSITIONS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-12-15 | — | — | US | disclosed |
| WO-1992006941-A1 | SATURATED LINEAR POLYFLUOROHYDROCARBONS, PROCESSES FOR THEIR PRODUCTION, AND THEIR USE IN CLEANING COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-04-30 | — | — | WO | disclosed |
| EP-0431458-A1 | Cleaning composition | DAIKIN INDUSTRIES, LIMITED (JP) | 1991-06-12 | — | — | EP | disclosed |
| EP-0431458-A1 | Cleaning composition | DAIKIN INDUSTRIES, LIMITED (JP) | 1991-06-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (50 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180113382-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, FRG1, C1R | LMNA 3875/4885THRB 2169/4885 |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | XDH, HAX1, MLX | LMNA 1673/4885THRB 2413/4885 |
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“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.