Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.59 |
| ▸ | HPGD | P15428 | 4/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.59 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.59 |
| ▸ | CA1 | P00915 | 2/20 | 0.55 |
| ▸ | CA2 | P00918 | 2/20 | 0.55 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.55 |
| ▸ | CA12 | O43570 | 1/20 | 0.55 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.55 |
| ▸ | CA7 | P43166 | 1/20 | 0.55 |
| ▸ | CA9 | Q16790 | 1/20 | 0.55 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.55 |
| ▸ | CES2 | O00748 | 2/20 | 0.53 |
| ▸ | MEN1 | O00255 | 4/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.53 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.52 |
| ▸ | KDR | P35968 | 2/20 | 0.52 |
| ▸ | TNF | P01375 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10786191 | 0.98 | ALDH1A1 (0.58) | ALDH1A1HPGDKDM4EHSD17B10CA1 | |
| SCHEMBL330660 | 0.85 | ACMSD (0.66) | ALDH1A1HPGDKDM4EHSD17B10CA1 | |
| SCHEMBL131207 | 0.85 | CA1 (0.52) | ALDH1A1HPGDKDM4EHSD17B10CA1 | |
| SCHEMBL115659 | 0.84 | ALDH1A1 (0.65) | ALDH1A1HPGDKDM4EHSD17B10CA1 | |
| SCHEMBL460066 | 0.83 | KDM4E (0.69) | ALDH1A1HPGDKDM4EHSD17B10CES2 | |
| SCHEMBL8949395 | 0.83 | CA1 (0.50) | ALDH1A1HPGDKDM4EHSD17B10CA1 | |
| SCHEMBL320481 | 0.82 | CES2 (0.52) | ALDH1A1HPGDKDM4EHSD17B10CES2 | |
| SCHEMBL10455841 | 0.82 | CES2 (0.52) | ALDH1A1HPGDKDM4EHSD17B10CES2 | |
| SCHEMBL30062195 | 0.82 | CES2 (0.52) | ALDH1A1HPGDKDM4EHSD17B10CES2 | |
| SCHEMBL27866247 | 0.82 | ALDH1A1 (0.62) | ALDH1A1HPGDKDM4EHSD17B10CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 525 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260092029-A1 | LIGAND-ENABLED SCALABLE C-H HYDROXYLATION OF BENZOIC AND PHENYLACETIC ACIDS AT ROOM TEMPERATURE | SCRIPPS RESEARCH INST (US) | 2026-04-02 | — | — | US | claimed |
| EP-4584236-A1 | LIGAND-ENABLED SCALABLE C-H HYDROXYLATION OF BENZOIC AND PHENYLACETIC ACIDS AT ROOM TEMPERATURE | The Scripps Research Institute (US) | 2025-07-16 | — | — | EP | claimed |
| WO-2024054881-A1 | LIGAND-ENABLED SCALABLE C-H HYDROXYLATION OF BENZOIC AND PHENYLACETIC ACIDS AT ROOM TEMPERATURE | THE SCRIPPS RESEARCH INSTITUTE (US) | 2024-03-14 | — | — | WO | claimed |
| CN-116178689-A | Liquid crystal polymer and preparation method and application thereof | 深圳大学 | 2023-05-30 | — | — | CN | claimed |
| EP-2095817-A1 | Therapeutic compositions and methods | RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY (US) | 2009-09-02 | — | — | EP | claimed |
| US-20050249697-A1 | Compositions and methods for the inhibition of bone growth and resorption | RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY | 2005-11-10 | — | — | US | claimed |
| WO-2005039489-A2 | COMPOSITIONS AND METHODS FOR THE INHIBITION OF BONE GROWTH AND RESORPTION | POLYMERIX CORPORATION (US) | 2005-05-06 | — | — | WO | claimed |
| US-20040096476-A1 | Therapeutic devices for patterned cell growth | RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY | 2004-05-20 | — | — | US | claimed |
| WO-2004006863-A2 | THERAPEUTIC DEVICES FOR PATTERNED CELL GROWTH | RUTGERS, THE STATE UNIVERSITY (US) | 2004-01-22 | — | — | WO | claimed |
| US-4910021-A | Oral administered coated capsule for colonic absorption | R. P. SCHERER CORPORATION (US) | 1990-03-20 | — | — | US | claimed |
| EP-0036534-B1 | AN ORALLY ADMINISTRABLE DRUG FORM COMPRISING A BETA-LACTAM ANTIBIOTIC AND AN ADJUVANT | INTERx RESEARCH CORPORATION (US) | 1987-09-23 | — | — | EP | claimed |
| EP-0225189-A2 | Targeted enteral delivery system | R.P. SCHERER CORPORATION (US) | 1987-06-10 | — | — | EP | claimed |
| US-4470980-A | Method of increasing oral absorption of β-lactam antibiotics | INTERX RESEARCH CORP. (US) | 1984-09-11 | — | — | US | claimed |
| US-4464363-A | HYDROXY ARYL- OR HYDROXY ARALKYL ACIDS OR SALTS | MERCK & CO., INC. (US) | 1984-08-07 | — | — | US | claimed |
| US-4406896-A | ANTIBIOTICS, ACIDS, HYDROXY | MERCK & CO., INC. (US) | 1983-09-27 | — | — | US | claimed |
| EP-0036534-A1 | An orally administrable drug form comprising a beta-lactam antibiotic and an adjuvant | INTERx RESEARCH CORPORATION (US) | 1981-09-30 | — | — | EP | claimed |
| EP-0036145-A1 | An orally administered drug form comprising a polar bioactive agent and an adjuvant | INTERx RESEARCH CORPORATION (US) | 1981-09-23 | — | — | EP | claimed |
| EP-0035770-A2 | An orally administered drug form comprising a glycosidic antibiotic and an adjuvant | INTERx RESEARCH CORPORATION (US) | 1981-09-16 | — | — | EP | claimed |
| EP-0031561-A2 | A rectally administered suppository comprising a drug and an adjuvant | MERCK & CO. INC. (US) | 1981-07-08 | — | — | EP | claimed |
| US-12612361-B2 | Substituted pyrrolidones and piperidones as small molecule inhibitors of EZH2 and EED protein binding | NORTHWESTERN UNIVERSITY (US) | 2026-04-28 | — | — | US | disclosed |
| US-20260092029-A1 | LIGAND-ENABLED SCALABLE C-H HYDROXYLATION OF BENZOIC AND PHENYLACETIC ACIDS AT ROOM TEMPERATURE | SCRIPPS RESEARCH INST (US) | 2026-04-02 | — | — | US | disclosed |
| EP-4584236-A1 | LIGAND-ENABLED SCALABLE C-H HYDROXYLATION OF BENZOIC AND PHENYLACETIC ACIDS AT ROOM TEMPERATURE | The Scripps Research Institute (US) | 2025-07-16 | — | — | EP | disclosed |
| US-20250171460-A1 | INDUCERS OF KLF2 AND METHODS OF USE THEREOF | RIPARIAN PHARMACEUTICALS, INC. (US) | 2025-05-29 | — | — | US | disclosed |
| US-20250162979-A1 | P-DIPHENYL COMPOUND DERIVATIVE MIXTURE AND METHOD OF PRODUCING THE SAME | HODOGAYA CHEMICAL CO., LTD. (JP) | 2025-05-22 | — | — | US | disclosed |
| EP-4476229-A1 | INDUCERS OF KLF2 AND METHODS OF USE THEREOF | Riparian Pharmaceuticals, Inc. (US) | 2024-12-18 | — | — | EP | disclosed |
| CN-118974057-A | KLF2 inducers and methods of use thereof | 里帕里安制药股份有限公司 | 2024-11-15 | — | — | CN | disclosed |
| US-20240376050-A1 | SUBSTITUTED PYRROLIDONES AND PIPERIDONES AS SMALL MOLECULE INHIBITORS OF EZH2 AND EED PROTEIN BINDING | NORTHWESTERN UNIVERSITY | 2024-11-14 | — | — | US | disclosed |
| WO-2024135498-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122425-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024054881-A1 | LIGAND-ENABLED SCALABLE C-H HYDROXYLATION OF BENZOIC AND PHENYLACETIC ACIDS AT ROOM TEMPERATURE | THE SCRIPPS RESEARCH INSTITUTE (US) | 2024-03-14 | — | — | WO | disclosed |
| US-11919855-B2 | Substituted pyrrolidones and piperidones as small molecule inhibitors of EZH2 and EED protein binding | NORTHWESTERN UNIVERSITY (US) | 2024-03-05 | — | — | US | disclosed |
| WO-2024043121-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND AND INTERMEDIATE THEREFOR | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2024043098-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| WO-2023223865-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023223897-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| US-11822240-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| WO-2023210472-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | 東京応化工業株式会社 | 2023-11-02 | — | — | WO | disclosed |
| WO-2023195407-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-12 | — | — | WO | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| WO-2023189961-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230314945-A1 | NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| WO-2023176546-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR | 東京応化工業株式会社 | 2023-09-21 | — | — | WO | disclosed |
| US-11762288-B2 | Resist composition, method of forming resist pattern, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11762288-B2 | Resist composition, method of forming resist pattern, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| WO-2023171527-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| WO-2023171743-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| WO-2023171670-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| WO-2023171739-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| US-11754922-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-20230280652-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | JSR CORPORATION (JP) | 2023-09-07 | — | — | US | disclosed |
| US-11747726-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-05 | — | — | US | disclosed |
| WO-2023162907-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID GENERATION AGENT | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023163008-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023153294-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| WO-2023150374-A1 | INDUCERS OF KLF2 AND METHODS OF USE THEREOF | RIPARIAN PHARMACEUTICALS, INC. (US) | 2023-08-10 | — | — | WO | disclosed |
| WO-2023145535-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-08-03 | — | — | WO | disclosed |
| WO-2023140364-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023140231-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023140386-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| US-11709428-B2 | Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound | JSR CORPORATION (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11709425-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11703757-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-11703756-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| WO-2023127690-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | 東京応化工業株式会社 | 2023-07-06 | — | — | WO | disclosed |
| WO-2023127692-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-07-06 | — | — | WO | disclosed |
| US-11693313-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-20230205084-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| WO-2023112893-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2023-06-22 | — | — | WO | disclosed |
| WO-2023112746-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-06-22 | — | — | WO | disclosed |
| US-11667605-B2 | Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-06 | — | — | US | disclosed |
| CN-116178689-A | Liquid crystal polymer and preparation method and application thereof | 深圳大学 | 2023-05-30 | — | — | CN | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-11656549-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-23 | — | — | US | disclosed |
| US-11650497-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11644751-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| WO-2023068251-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2023-04-27 | — | — | WO | disclosed |
| US-11635686-B2 | Resist composition, method of forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-25 | — | — | US | disclosed |
| US-11586111-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-20230041025-A1 | NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, PATTERN FORMATION METHOD, CURED FILM, CURED FILM PRODUCTION METHOD, AND ROLLED BODY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-02-09 | — | — | US | disclosed |
| WO-2023013592-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-02-09 | — | — | WO | disclosed |
| WO-2023287067-A1 | ANTIBACTERIAL COMPOUND | 주식회사 엘지화학 | 2023-01-19 | — | — | WO | disclosed |
| US-20220411727-A1 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-12-29 | — | — | US | disclosed |
| WO-2022265002-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2022265034-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2022264941-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2022264845-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| US-20220397825-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROLLING AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-12-15 | — | — | US | disclosed |
| US-20220363633-A1 | SUBSTITUTED PYRROLIDONES AND PIPERIDONES AS SMALL MOLECULE INHIBITORS OF EZH2 AND EED PROTEIN BINDING | UNITED STATES GOVERNMENT | 2022-11-17 | — | — | US | disclosed |
| US-20220363633-A1 | SUBSTITUTED PYRROLIDONES AND PIPERIDONES AS SMALL MOLECULE INHIBITORS OF EZH2 AND EED PROTEIN BINDING | UNITED STATES GOVERNMENT | 2022-11-17 | — | — | US | disclosed |
| US-20220324791-A1 | P-DIPHENYL COMPOUND DERIVATIVE MIXTURE AND METHOD OF PRODUCING THE SAME | HODOGAYA CHEMICAL CO., LTD. (JP) | 2022-10-13 | — | — | US | disclosed |
| US-11448963-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOG YO CO., LTD. (JP) | 2022-09-20 | — | — | US | disclosed |
| US-20220214615-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-20220206384-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-30 | — | — | US | disclosed |
| US-20220206385-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-30 | — | — | US | disclosed |
| US-11372329-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-28 | — | — | US | disclosed |
| US-20220179306-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| US-20220179314-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| US-20220179315-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| US-20220121117-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20220121116-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20220107565-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-07 | — | — | US | disclosed |
| US-11256169-B2 | Resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-02-22 | — | — | US | disclosed |
| US-20220019142-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-20 | — | — | US | disclosed |
| US-20220011666-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-13 | — | — | US | disclosed |
| US-20220011665-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-13 | — | — | US | disclosed |
| US-11221557-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-11 | — | — | US | disclosed |
| US-20210405527-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-12-30 | — | — | US | disclosed |
| US-20210405531-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-12-30 | — | — | US | disclosed |
| US-20210397086-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-12-23 | — | — | US | disclosed |
| US-11204551-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-12-21 | — | — | US | disclosed |
| US-20210389668-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACID GENERATOR, AND METHOD OF PRODUCING COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2021-12-16 | — | — | US | disclosed |
| US-11187981-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |
| US-11181822-B2 | — | — | 2021-11-23 | — | — | US | disclosed |
| US-11150554-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-19 | — | — | US | disclosed |
| US-20210284773-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | JSR CORPORATION (JP) | 2021-09-16 | — | — | US | disclosed |
| US-20210230332-A1 | ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, METHOD OF PRODUCING POLYMERIC COMPOUND, AND METHOD OF FORMING RESIST PATTERN | NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT | 2021-07-29 | — | — | US | disclosed |
| US-11067888-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-20 | — | — | US | disclosed |
| US-11061329-B2 | Resist composition, method of forming resist pattern, polymeric compound, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-20210200089-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND ACID DIFFUSION-CONTROLLING AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20210200088-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20210200087-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20210200086-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20210191262-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-24 | — | — | US | disclosed |
| US-20210191268-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-24 | — | — | US | disclosed |
| US-20210181634-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-17 | — | — | US | disclosed |
| US-20210181632-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-17 | — | — | US | disclosed |
| US-20210181633-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-17 | — | — | US | disclosed |
| US-11036132-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion control agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-15 | — | — | US | disclosed |
| US-11034671-B2 | Apoptosis signal-regulating kinase inhibitors and uses thereof | SICHUAN HAISCO PHARMACEUTICAL CO., LTD. (CN) | 2021-06-15 | — | — | US | disclosed |
| US-11036131-B2 | Resist composition, method of forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-15 | — | — | US | disclosed |
| US-11029600-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-08 | — | — | US | disclosed |
| US-20210165324-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-03 | — | — | US | disclosed |
| US-20210157234-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-27 | — | — | US | disclosed |
| US-20210149303-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-20 | — | — | US | disclosed |
| US-20210149302-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-20 | — | — | US | disclosed |
| US-20210141308-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-20210141309-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-20210141307-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-20210139521-A1 | DIARYL TREHALOSE COMPOUNDS AND USES THEREOF | THE UNIV OF MONTANA (US) | 2021-05-13 | — | — | US | disclosed |
| US-20210132495-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-06 | — | — | US | disclosed |
| WO-2021070764-A1 | NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, PATTERN FORMATION METHOD, CURED FILM, CURED FILM PRODUCTION METHOD, AND ROLLED BODY | 東京応化工業株式会社 | 2021-04-15 | — | — | WO | disclosed |
| US-10976661-B2 | Resist composition, method of forming resist pattern, and polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-04-13 | — | — | US | disclosed |
| US-20210063878-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| US-20210055656-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-25 | — | — | US | disclosed |
| US-10921711-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| US-10908502-B2 | Resist composition, method of forming resist pattern, polymeric compound, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-02 | — | — | US | disclosed |
| US-20210026243-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-01-28 | — | — | US | disclosed |
| US-20210018836-A1 | PHOTORESIST COMPOSITION FOR THICK FILM AND METHOD OF FORMING THICK FILM PHOTORESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-01-21 | — | — | US | disclosed |
| US-20210003918-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-01-07 | — | — | US | disclosed |
| US-20200409259-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-20200409262-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-20200409264-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-10866514-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-12-15 | — | — | US | disclosed |
| US-10838301-B2 | Resist composition, method of forming resist pattern, fluorine-containing compound, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-11-17 | — | — | US | disclosed |
| US-20200283404-A1 | APOPTOSIS SIGNAL-REGULATING KINASE INHIBITORS AND USES THEREOF | SICHUAN HAISCO PHARMACEUTICAL CO., LTD. (CN) | 2020-09-10 | — | — | US | disclosed |
| US-20200257197-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-08-13 | — | — | US | disclosed |
| US-20200209741-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| US-20200201181-A1 | NEGATIVE-TONE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, AND METHOD OF FORMING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-25 | — | — | US | disclosed |
| US-20200192223-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200183273-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-11 | — | — | US | disclosed |
| US-20200183275-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-11 | — | — | US | disclosed |
| US-20200174369-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-04 | — | — | US | disclosed |
| US-20200174365-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-04 | — | — | US | disclosed |
| US-20200174366-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-04 | — | — | US | disclosed |
| US-20200166837-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-28 | — | — | US | disclosed |
| US-20200159119-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| US-20200159118-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| US-20200150531-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-14 | — | — | US | disclosed |
| US-10649330-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-12 | — | — | US | disclosed |
| US-20200142303-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-07 | — | — | US | disclosed |
| US-10627717-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-04-21 | — | — | US | disclosed |
| US-10606174-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-03-31 | — | — | US | disclosed |
| US-20190354011-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-11-21 | — | — | US | disclosed |
| US-10451968-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-10-22 | — | — | US | disclosed |
| US-10414918-B2 | Method of preparing polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-09-17 | — | — | US | disclosed |
| US-10401727-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-09-03 | — | — | US | disclosed |
| US-10394122-B2 | Resist composition, method for forming resist pattern, compound, and acid generator | TOYKO OHKA KOGYO CO., LTD. (JP) | 2019-08-27 | — | — | US | disclosed |
| US-20190235380-A1 | NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, PATTERN FORMING METHOD, CURED FILM, AND METHOD OF PRODUCING CURED FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-08-01 | — | — | US | disclosed |
| US-20190219920-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COPOLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-18 | — | — | US | disclosed |
| US-20190204738-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-04 | — | — | US | disclosed |
| US-20190204735-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-04 | — | — | US | disclosed |
| US-20190204739-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-04 | — | — | US | disclosed |
| US-20190196330-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| US-20190196329-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| US-20190163057-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-05-30 | — | — | US | disclosed |
| US-10295905-B2 | Resist composition, method for forming resist pattern, and polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-05-21 | — | — | US | disclosed |
| EP-3022202-B1 | AUTOTAXIN INHIBITORS COMPRISING A HETEROAROMATIC RING-BENZYL-AMIDE-CYCLE CORE | NOVARTIS AG (CH) | 2019-05-15 | — | — | EP | disclosed |
| US-10261416-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-16 | — | — | US | disclosed |
| US-20190107779-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-11 | — | — | US | disclosed |
| US-10241403-B2 | Negative photosensitive composition and pattern formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-03-26 | — | — | US | disclosed |
| US-10241406-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-03-26 | — | — | US | disclosed |
| WO-2019051265-A1 | APOPTOSIS SIGNAL-REGULATING KINASE INHIBITORS AND USES THEREOF | FRONTHERA U.S. PHARMACEUTICALS LLC (US) | 2019-03-14 | — | — | WO | disclosed |
| US-10183025-B2 | Autotaxin inhibitors | NOVARTIS AG (CH) | 2019-01-22 | — | — | US | disclosed |
| US-20190018319-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-01-17 | — | — | US | disclosed |
| US-10180625-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion control agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-01-15 | — | — | US | disclosed |
| US-20180370905-A1 | Compounds Useful for the Treatment of Metabolic Disorders and Synthesis of the Same | NORTH CAROLINA CENTRAL UNIV (US) | 2018-12-27 | — | — | US | disclosed |
| US-20180224742-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-08-09 | — | — | US | disclosed |
| US-20180224742-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-08-09 | — | — | US | disclosed |
| US-20180210338-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-26 | — | — | US | disclosed |
| US-20180180997-A1 | RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-10005720-B2 | Compounds useful for the treatment of metabolic disorders and synthesis of the same | NORTH CAROLINA CENTRAL UNIVERSITY (US) | 2018-06-26 | — | — | US | disclosed |
| US-20180149973-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-05-31 | — | — | US | disclosed |
| US-20180095366-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-04-05 | — | — | US | disclosed |
| US-20180081269-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20180081271-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20180081271-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20180081269-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20180072651-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-20180072651-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-20180067394-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-08 | — | — | US | disclosed |
| US-9890233-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-02-13 | — | — | US | disclosed |
| US-20180037534-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20180037534-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20180024433-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20180022916-A1 | METHOD OF PREPARING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20180021345-A1 | AUTOTAXIN INHIBITORS | NOVARTIS AG (CH) | 2018-01-25 | — | — | US | disclosed |
| US-9851637-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion control agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-12-26 | — | — | US | disclosed |
| US-9846364-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846364-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-20170343897-A1 | CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-30 | — | — | US | disclosed |
| EP-3249469-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2017-11-29 | — | — | EP | disclosed |
| US-20170293223-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-9778567-B2 | Resist composition, method of forming resist pattern, polymeric compound, compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9778567-B2 | Resist composition, method of forming resist pattern, polymeric compound, compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-9763957-B2 | Autotaxin inhibitors | NOVARTIS AG (CH) | 2017-09-19 | — | — | US | disclosed |
| US-9766541-B2 | Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9740105-B2 | Resist pattern formation method and resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9696625-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-07-04 | — | — | US | disclosed |
| US-9690194-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-9690194-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-20170176855-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-22 | — | — | US | disclosed |
| US-9682951-B2 | Resist composition, method of forming resist pattern, acid generator, photoreactive quencher, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-20 | — | — | US | disclosed |
| US-9682951-B2 | Resist composition, method of forming resist pattern, acid generator, photoreactive quencher, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-20 | — | — | US | disclosed |
| US-20170168396-A1 | METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-15 | — | — | US | disclosed |
| US-20170168396-A1 | METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-15 | — | — | US | disclosed |
| US-9678423-B2 | Resist composition, method for forming resist pattern, acid generator and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9671690-B2 | Resist composition, method for forming resist pattern, photo-reactive quencher and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9671690-B2 | Resist composition, method for forming resist pattern, photo-reactive quencher and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9639002-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9618845-B2 | Method for forming resist pattern, resist pattern splitting agent, split pattern improving agent, resist pattern splitting material, and positive resist composition for forming split pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9618845-B2 | Method for forming resist pattern, resist pattern splitting agent, split pattern improving agent, resist pattern splitting material, and positive resist composition for forming split pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-20170097564-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-9606433-B2 | Resist composition, method of forming resist pattern, polymeric compound and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9606433-B2 | Resist composition, method of forming resist pattern, polymeric compound and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9581909-B2 | Method of trimming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-02-28 | — | — | US | disclosed |
| US-9581909-B2 | Method of trimming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-02-28 | — | — | US | disclosed |
| US-9557647-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9557647-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-01-31 | — | — | US | disclosed |
| US-20160376233-A1 | POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-12-29 | — | — | US | disclosed |
| US-9529266-B2 | Method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| EP-2394980-B1 | AROMATIC AMINO COMPOUND MANUFACTURING METHOD | HODOGAYA CHEMICAL CO LTD (JP) | 2016-12-21 | — | — | EP | disclosed |
| US-20160363860-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160363860-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160349617-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20160349617-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20160306278-A1 | CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-20 | — | — | US | disclosed |
| US-9469712-B2 | Method of producing polymeric compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-18 | — | — | US | disclosed |
| US-9469712-B2 | Method of producing polymeric compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-18 | — | — | US | disclosed |
| US-9459535-B2 | Method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9459535-B2 | Method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9459528-B2 | Negative tone resist composition for solvent developing and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9459528-B2 | Negative tone resist composition for solvent developing and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-04 | — | — | US | disclosed |
| US-20160280679-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATOR, PHOTOREACTIVE QUENCHER, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-29 | — | — | US | disclosed |
| US-20160280679-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, ACID GENERATOR, PHOTOREACTIVE QUENCHER, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-29 | — | — | US | disclosed |
| US-20160282717-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-29 | — | — | US | disclosed |
| US-20160282717-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-29 | — | — | US | disclosed |
| US-20160274464-A1 | METHOD OF RECOVERING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| US-20160274464-A1 | METHOD OF RECOVERING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| US-20160274458-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| US-20160274458-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| US-20160266495-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-15 | — | — | US | disclosed |
| US-20160266495-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-15 | — | — | US | disclosed |
| US-9442371-B2 | Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9442371-B2 | Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9411227-B2 | Resist composition, method of forming resist pattern, compound, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9405190-B2 | Method for forming resist pattern and resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160209745-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20160209745-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9383642-B2 | Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-07-05 | — | — | US | disclosed |
| US-9383642-B2 | Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-07-05 | — | — | US | disclosed |
| US-20160184318-A1 | AUTOTAXIN INHIBITORS | NOVARTIS AG (CH) | 2016-06-30 | — | — | US | disclosed |
| US-9354515-B2 | Resist composition, acid generator, polymeric compound and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-05-31 | — | — | US | disclosed |
| US-9354515-B2 | Resist composition, acid generator, polymeric compound and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-05-31 | — | — | US | disclosed |
| EP-3022202-A1 | AUTOTAXIN INHIBITORS COMPRISING A HETEROAROMATIC RING-BENZYL-AMIDE-CYCLE CORE | Novartis AG (CH) | 2016-05-25 | — | — | EP | disclosed |
| US-9341947-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-05-17 | — | — | US | disclosed |
| CN-105555783-A | Autotaxin inhibitors comprising a heteroaromatic ring-benzyl-amide-cycle core | NOVARTIS AG | 2016-05-04 | — | — | CN | disclosed |
| US-20160116843-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-04-28 | — | — | US | disclosed |
| US-20160097979-A1 | METHOD OF TRIMMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-20160097979-A1 | METHOD OF TRIMMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-20160091790-A1 | METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN SPLITTING AGENT, SPLIT PATTERN IMPROVING AGENT, RESIST PATTERN SPLITTING MATERIAL, AND POSITIVE RESIST COMPOSITION FOR FORMING SPLIT PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-31 | — | — | US | disclosed |
| US-20160091790-A1 | METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN SPLITTING AGENT, SPLIT PATTERN IMPROVING AGENT, RESIST PATTERN SPLITTING MATERIAL, AND POSITIVE RESIST COMPOSITION FOR FORMING SPLIT PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-31 | — | — | US | disclosed |
| US-20160062236-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9274424-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-01 | — | — | US | disclosed |
| US-20160046560-A1 | COMPOUNDS USEFUL FOR THE TREATMENT OF METABOLIC DISORDERS AND SYNTHESIS OF THE SAME | NORTH CAROLINA CENTRAL UNIVERSITY | 2016-02-18 | — | — | US | disclosed |
| US-9244357-B2 | Method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-9244347-B2 | Resist composition, compound, polymeric compound and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-9244347-B2 | Resist composition, compound, polymeric compound and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-9238624-B2 | Method of producing aromatic amino compounds | HODOGAYA CHEMICAL CO., LTD. (JP) | 2016-01-19 | — | — | US | disclosed |
| US-9235123-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9188863-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9188869-B2 | Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9188869-B2 | Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9170487-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-27 | — | — | US | disclosed |
| US-9170487-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-27 | — | — | US | disclosed |
| US-9164381-B2 | Resist composition, method of forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9164379-B2 | Resist composition, method for forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9164380-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9164380-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9134617-B2 | Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-9133102-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-9133102-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-9128374-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-08 | — | — | US | disclosed |
| US-9128370-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| US-9120726-B2 | Radiation-sensitive resin composition, compound and producing method of compound | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9122157-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9122157-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9097971-B2 | Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-9097969-B2 | Compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-20150205207-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-23 | — | — | US | disclosed |
| US-20150205207-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-23 | — | — | US | disclosed |
| US-20150198880-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198881-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-9075304-B2 | Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20150185619-A1 | METHOD OF FORMING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-02 | — | — | US | disclosed |
| US-9063416-B2 | Resist composition, method of forming resist pattern and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9063416-B2 | Resist composition, method of forming resist pattern and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9057948-B2 | Resist composition for EUV or EB, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-9057948-B2 | Resist composition for EUV or EB, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-9052592-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20150140497-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
| US-20150140497-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
| US-9023585-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-05 | — | — | US | disclosed |
| US-9023585-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20150118616-A1 | METHOD FOR FORMING RESIST PATTERN AND RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-30 | — | — | US | disclosed |
| CN-102596921-B | Novel compounds | GLAXO GROUP LTD | 2015-04-29 | — | — | CN | disclosed |
| US-9017924-B2 | Resist composition, method of forming resist pattern, polymeric compound and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-9017924-B2 | Resist composition, method of forming resist pattern, polymeric compound and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20150111155-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2015-04-23 | — | — | US | disclosed |
| US-9005872-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-14 | — | — | US | disclosed |
| US-8975010-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-10 | — | — | US | disclosed |
| US-8975010-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-10 | — | — | US | disclosed |
| US-8968980-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8956801-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-8956801-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20150037734-A1 | RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| US-20150037734-A1 | RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| US-20150034595-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATION STRUCTURE, METHOD OF FORMING PATTERN, AND METHOD OF FORMING FINE PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| US-20150034595-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATION STRUCTURE, METHOD OF FORMING PATTERN, AND METHOD OF FORMING FINE PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| WO-2015008230-A1 | AUTOTAXIN INHIBITORS COMPRISING A HETEROAROMATIC RING-BENZYL-AMIDE-CYCLE CORE | NOVARTIS AG (CH) | 2015-01-22 | — | — | WO | disclosed |
| CN-104292154-A | Novel compounds | GLAXO GROUP LTD | 2015-01-21 | — | — | CN | disclosed |
| US-8916332-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-23 | — | — | US | disclosed |
| US-20140363770-A1 | NEGATIVE TONE RESIST COMPOSITION FOR SOLVENT DEVELOPING AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363770-A1 | NEGATIVE TONE RESIST COMPOSITION FOR SOLVENT DEVELOPING AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140356787-A1 | RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-04 | — | — | US | disclosed |
| US-20140356787-A1 | RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-04 | — | — | US | disclosed |
| US-8883396-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-11-11 | — | — | US | disclosed |
| US-8883396-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-11-11 | — | — | US | disclosed |
| US-20140322652-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-10-30 | — | — | US | disclosed |
| US-20140322652-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-10-30 | — | — | US | disclosed |
| WO-2014165816-A1 | COMPOUNDS USEFUL FOR THE TREATMENT OF METABOLIC DISORDERS AND SYNTHESIS OF THE SAME | NORTH CAROLINA CENTRAL UNIVERSITY (US) | 2014-10-09 | — | — | WO | disclosed |
| EP-1512397-B1 | O-SUBSTITUTED HYDROXYARYL DERIVATIVES | INST MED MOLECULAR DESIGN INC (JP) | 2014-10-08 | — | — | EP | disclosed |
| US-20140287361-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140287360-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140272727-A1 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140272727-A1 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140255853-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| US-20140255853-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| EP-2483254-B1 | NOVEL COMPOUNDS | GLAXO GROUP LTD (GB) | 2014-08-13 | — | — | EP | disclosed |
| US-20140220492-A1 | RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |
| US-20140221673-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |
| US-20140221673-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |
| US-20140220492-A1 | RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |
| US-8795948-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795948-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795947-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8790868-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20140205956-A1 | METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD (JP) | 2014-07-24 | — | — | US | disclosed |
| US-8778939-B2 | Compounds | GLAXO GROUP LIMITED (GB) | 2014-07-15 | — | — | US | disclosed |
| US-8778595-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8778595-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8765354-B2 | Resist composition for negative development and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-01 | — | — | US | disclosed |
| US-20140163232-A1 | METHOD OF PRODUCING AROMATIC AMINO COMPOUNDS | HODOGAYA CHEMICAL CO., LTD. (JP) | 2014-06-12 | — | — | US | disclosed |
| US-20140147793-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140147787-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140147793-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140147792-A1 | POLYMERIZATION METHOD OF HIGH-MOLECULAR WEIGHT COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140147788-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140147790-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140147792-A1 | POLYMERIZATION METHOD OF HIGH-MOLECULAR WEIGHT COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140147788-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-20140147787-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-29 | — | — | US | disclosed |
| US-8735626-B2 | Method of producing aromatic amino compounds | HODOGAYA CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-20140141373-A1 | COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING COMPOUND, POLYMER, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-22 | — | — | US | disclosed |
| US-20140113236-A1 | SOLVENT DEVELOPABLE NEGATIVE RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN OF LAYER INCLUDING BLOCK COPOLYMER | RIKEN (JP) | 2014-04-24 | — | — | US | disclosed |
| US-20140017617-A1 | METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COMPOUND, AND COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-16 | — | — | US | disclosed |
| US-20130309614-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-20130302736-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| US-20130260312-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130260312-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130260314-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130252171-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-20130252180-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-20130252180-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-20130224656-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224656-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130209941-A1 | METHOD OF FORMING PATTERN | TOKYO ELECTRON LIMITED (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20130209941-A1 | METHOD OF FORMING PATTERN | TOKYO ELECTRON LIMITED (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20130189619-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130189619-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| US-20130164693-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-27 | — | — | US | disclosed |
| US-20130164693-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-27 | — | — | US | disclosed |
| US-20130157197-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130157197-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130157201-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130157201-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130143159-A1 | RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-06 | — | — | US | disclosed |
| US-20130137048-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130137048-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130115554-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-09 | — | — | US | disclosed |
| US-20130095427-A1 | RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-18 | — | — | US | disclosed |
| US-20130095427-A1 | RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-18 | — | — | US | disclosed |
| US-20130071789-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-21 | — | — | US | disclosed |
| US-20130065180-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| US-20130022911-A1 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120328982-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-27 | — | — | US | disclosed |
| US-8334087-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2012-12-18 | — | — | US | disclosed |
| US-20120258399-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND PRODUCING METHOD OF COMPOUND | JSR CORPORATION (JP) | 2012-10-11 | — | — | US | disclosed |
| US-8263657-B2 | Blocking neurokinins; using a benzene compound containing hydroxy or acetoxy group; antiinflammatory agents | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2012-09-11 | — | — | US | disclosed |
| EP-2483254-A1 | NOVEL COMPOUNDS | Glaxo Group Limited (GB) | 2012-08-08 | — | — | EP | disclosed |
| US-20120184553-A1 | NOVEL COMPOUNDS | GLAXO GROUP LIMITED (GB) | 2012-07-19 | — | — | US | disclosed |
| CN-102596921-A | Novel compounds | GLAXO GROUP LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-101849953-B | Inflammatory cytokine release inhibitor | INST MED MOLECULAR DESIGN INC | 2012-04-25 | — | — | CN | disclosed |
| EP-1844766-B1 | Inhibitors against the production and release of inflammatory cytokines | INST MED MOLECULAR DESIGN INC (JP) | 2012-04-18 | — | — | EP | disclosed |
| EP-1352650-B1 | INHIBITORS AGAINST THE PRODUCTION AND RELEASE OF INFLAMMATORY CYTOKINES | INST MED MOLECULAR DESIGN INC (JP) | 2012-03-07 | — | — | EP | disclosed |
| EP-2421834-A1 | PYRAZOLE AND TRIAZOLE CARBOXAMIDES AS CRAC CHANNEL INHIBITORS | Glaxo Group Limited (GB) | 2012-02-29 | — | — | EP | disclosed |
| US-20120035237-A1 | PYRAZOLE AND TRIAZOLE CARBOXAMIDES AS CRAC CHANN EL INHIBITORS | COE DIANE MARY (GB) | 2012-02-09 | — | — | US | disclosed |
| US-8097759-B2 | Inflammatory cytokine release inhibitor | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2012-01-17 | — | — | US | disclosed |
| EP-2394980-A1 | AROMATIC AMINO COMPOUND MANUFACTURING METHOD | Hodogaya Chemical Co., Ltd. (JP) | 2011-12-14 | — | — | EP | disclosed |
| CN-102239133-A | Aromatic amino compound manufacturing method | HODOGAYA CHEMICAL CO LTD | 2011-11-09 | — | — | CN | disclosed |
| US-20110257404-A1 | METHOD OF PRODUCING AROMATIC AMINO COMPOUNDS | HODOGAYA CHEMICAL CO., LTD. (JP) | 2011-10-20 | — | — | US | disclosed |
| WO-2011038572-A1 | NOVEL COMPOUNDS | GLAXO GROUP LIMITED (GB) | 2011-04-07 | — | — | WO | disclosed |
| WO-2011037929-A2 | PD(II)-CATALYZED HYDROXYLATION OF ARENES WITH O2 OR AIR | THE SCRIPPS RESEARCH INSTITUTE (US) | 2011-03-31 | — | — | WO | disclosed |
| US-20100310987-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-20100291181-A1 | THERAPEUTIC DEVICES FOR PATTERNED CELL GROWTH | RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY (US) | 2010-11-18 | — | — | US | disclosed |
| WO-2010122088-A1 | PYRAZOLE AND TRIAZOLE CARBOXAMIDES AS CRAC CHANNEL INHIBITORS | GLAXO GROUP LIMITED (GB) | 2010-10-28 | — | — | WO | disclosed |
| US-20100274051-A1 | INFLAMMATORY CYTOKINE RELEASE INHIBITOR | INSTITUTE OF MEDICINAL MOLECULAR DESIGN. INC. (JP) | 2010-10-28 | — | — | US | disclosed |
| CN-101849953-A | Inflammatory cytokine release inhibitor | INST MED MOLECULAR DESIGN INC | 2010-10-06 | — | — | CN | disclosed |
| CN-1658872-B | Antiallergic agent | INST MED MOLECULAR DESIGN INC | 2010-09-22 | — | — | CN | disclosed |
| US-20100113770-A1 | O-SUBSTITUTED HYDROXYARYL DERIVATIVES | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2010-05-06 | — | — | US | disclosed |
| CN-1658855-B | O-substituted hydroxyaryl derivatives | INST MED MOLECULAR DESIGN INC | 2010-04-28 | — | — | CN | disclosed |
| US-7700655-B2 | Antiallergic agents | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2010-04-20 | — | — | US | disclosed |
| US-7671058-B2 | N-(3,4-disubstituted phenyl) salicylamide derivatives | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-7671058-B2 | N-(3,4-disubstituted phenyl) salicylamide derivatives | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-7671058-B2 | N-(3,4-disubstituted phenyl) salicylamide derivatives | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-7626042-B2 | O-substituted hydroxyaryl derivatives | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2009-12-01 | — | — | US | disclosed |
| US-20090192122-A2 | INFLAMMATORY CYTOKINE RELEASE INHIBITOR | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2009-07-30 | — | — | US | disclosed |
| CN-100506221-C | Cancer therapeutic agent | INST MED MOLECULAR DESIGN INC (JP) | 2009-07-01 | — | — | CN | disclosed |
| CN-100490793-C | Remedies for neurodegenerative diseases | INST MED MOLECULAR DESIGN INC (JP) | 2009-05-27 | — | — | CN | disclosed |
| CN-100464742-C | NF-kB activation inhibitor | INST MED MOLECULAR DESIGN INC (JP) | 2009-03-04 | — | — | CN | disclosed |
| US-20080318956-A1 | INFLAMMATORY CYTOKINE RELEASE INHIBITOR | INSTITUTE OF MEDICINAL MOLECULAR DESIGN. INC. (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080311074-A1 | Inhibitors against activation of NF-kappaB | INSTITUTE OF MEDICAL MOLECULAR DESIGN INC. (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080249071-A1 | INFLAMMATORY CYTOKINE RELEASE INHIBITOR | INSTITUTE OF MEDICINAL MOLECULAR DESIGN. INC. (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080234233-A1 | MEDICAMENT FOR TREATMENT OF NEURODEGENERATIVE DISEASES | INSTITUTE OF MEDICINAL MOLECULAR DESIGN INC. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080227784-A1 | N-(3,4-disubstituted phenyl) salicylamide derivatives | INSTITUTE OF MEDICINAL MOLECULAR DESIGN. INC. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080227784-A1 | N-(3,4-disubstituted phenyl) salicylamide derivatives | INSTITUTE OF MEDICINAL MOLECULAR DESIGN. INC. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080227784-A1 | N-(3,4-disubstituted phenyl) salicylamide derivatives | INSTITUTE OF MEDICINAL MOLECULAR DESIGN. INC. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080090779-A1 | ANTIALLERGIC AGENTS | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2008-04-17 | — | — | US | disclosed |
| CN-100379410-C | Therapeutic agent for diabetes | INST MED MOLECULAR DESIGN INC (JP) | 2008-04-09 | — | — | CN | disclosed |
| CN-100370975-C | Inflammatory cytokine production dissociation inhibitor | INST OF MEDICINE MOLECULAR DES (JP) | 2008-02-27 | — | — | CN | disclosed |
| CN-101125138-A | Inhibitors against the production and release of inflammatory cytokines | INST MED MOLECULAR DESIGN INC (JP) | 2008-02-20 | — | — | CN | disclosed |
| CN-101103977-A | Therapeutic agent for diabetes | INST MED MOLECULAR DESIGN INC (JP) | 2008-01-16 | — | — | CN | disclosed |
| EP-1847263-A2 | Inhibitors against the production and release of inflammatory cytokines | Institute of Medicinal Molecular Design, Inc. (JP) | 2007-10-24 | — | — | EP | disclosed |
| EP-1844766-A2 | Inhibitors against the production and release of inflammatory cytokines | Institute of Medicinal Molecular Design, Inc. (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070185059-A1 | Antiallergic agents | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070185110-A1 | Antiallergic agents | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2007-08-09 | — | — | US | disclosed |
| CN-1867340-A | Topical use of halosalicylic acid derivatives | AVON PROD INC (US) | 2006-11-22 | — | — | CN | disclosed |
| EP-1694337-A2 | TOPICAL USE OF HALOSALICYLIC ACID DERIVATIVES | AVON PRODUCTS, INC. (US) | 2006-08-30 | — | — | EP | disclosed |
| US-20060122243-A1 | Antiallergic | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2006-06-08 | — | — | US | disclosed |
| US-20060111409-A1 | Medicament for treatment of diabetes | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2006-05-25 | — | — | US | disclosed |
| US-20060100257-A1 | Inhibitors against the activation of ap-1 and nfat | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2006-05-11 | — | — | US | disclosed |
| US-20060094718-A1 | 2-Morpholinocarbonyloxy-),5-(phenylethenyl,N-((3,5-bistrifluoromethyl-)phenyl)-benzamide; inhibitors of nuclear factor kappa B activation; cytokine suppressive antiinflammatory drugs(interleukin (IL-1, IL-6, IL-8) inhibitors); tumor necrosis factor (TNF-alpha) inhibitors; side effects reduction | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2006-05-04 | — | — | US | disclosed |
| US-20060089395-A1 | Nf-kb activation inhibitors | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2006-04-27 | — | — | US | disclosed |
| US-20060035944-A1 | Remedies for neurodegenerative diseases | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2006-02-16 | — | — | US | disclosed |
| US-20060019958-A1 | Immunity-related protein kinase inhibitors | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2006-01-26 | — | — | US | disclosed |
| US-20060014811-A1 | Medicament for treatment of cancer | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2006-01-19 | — | — | US | disclosed |
| US-20050249697-A1 | Compositions and methods for the inhibition of bone growth and resorption | RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY | 2005-11-10 | — | — | US | disclosed |
| CN-1658855-A | O-substituted hydroxyaryl derivatives | INST MED MOLECULAR DESIGN INC (JP) | 2005-08-24 | — | — | CN | disclosed |
| CN-1658856-A | Cancer therapeutic agent | INST MED MOLECULAR DESIGN INC (JP) | 2005-08-24 | — | — | CN | disclosed |
| CN-1658872-A | Antiallergic agent | INST MED MOLECULAR DESIGN INC (JP) | 2005-08-24 | — | — | CN | disclosed |
| CN-1658857-A | NF-kB activation inhibitor | INST MED MOLECULAR DESIGN INC (JP) | 2005-08-24 | — | — | CN | disclosed |
| CN-1658850-A | Therapeutic agent for diabetes | INST MED MOLECULAR DESIGN INC (JP) | 2005-08-24 | — | — | CN | disclosed |
| CN-1658854-A | Immune related protein kinase inhibitors | INST MED MOLECULAR DESIGN INC (JP) | 2005-08-24 | — | — | CN | disclosed |
| CN-1658858-A | Remedies for neurodegenerative diseases | INST MED MOLECULAR DESIGN INC (JP) | 2005-08-24 | — | — | CN | disclosed |
| CN-1658849-A | Inhibitors of AP-1 and NFAT activation | INST MED MOLECULAR DESIGN INC (JP) | 2005-08-24 | — | — | CN | disclosed |
| EP-1555018-A1 | REMEDIES FOR NEURODEGENERATIVE DISEASES | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-07-20 | — | — | EP | disclosed |
| WO-2005058230-A2 | TOPICAL USE OF HALOSALICYLIC ACID DERIVATIVES | AVON PRODUCTS, INC. (US) | 2005-06-30 | — | — | WO | disclosed |
| US-20050136015-A1 | Topical use of halosalicylic acid derivatives | AVON PRODUCTS, INC. | 2005-06-23 | — | — | US | disclosed |
| EP-1535610-A1 | THERAPEUTIC AGENT FOR CANCER | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-06-01 | — | — | EP | disclosed |
| EP-1535609-A1 | NF-KB ACTIVATION INHIBITORS | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-06-01 | — | — | EP | disclosed |
| WO-2005039489-A2 | COMPOSITIONS AND METHODS FOR THE INHIBITION OF BONE GROWTH AND RESORPTION | POLYMERIX CORPORATION (US) | 2005-05-06 | — | — | WO | disclosed |
| EP-1514544-A1 | ANTIALLERGIC | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-03-16 | — | — | EP | disclosed |
| EP-1512397-A1 | O-SUBSTITUTED HYDROXYARYL DERIVATIVES | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-03-09 | — | — | EP | disclosed |
| EP-1512396-A1 | INHIBITORS AGAINST THE ACTIVATION OF AP-1 AND NFAT | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-03-09 | — | — | EP | disclosed |
| EP-1510210-A1 | IMMUNITY-RELATED PROTEIN KINASE INHIBITORS | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-03-02 | — | — | EP | disclosed |
| EP-1510207-A1 | THERAPEUTIC DRUG FOR DIABETES | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-03-02 | — | — | EP | disclosed |
| US-20040259877-A1 | Inhibitors against the production and release of inflammatory cytokines | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040096476-A1 | Therapeutic devices for patterned cell growth | RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY | 2004-05-20 | — | — | US | disclosed |
| US-20040092754-A1 | Derivatives of 4-(trifluoromethyl)-phenol and 4-(trifluoromethylphenyl)-2-(tetrahydropyranyl) ether and method for producing the same | BASF AKTIENGESELLSCHAFT (DE) | 2004-05-13 | — | — | US | disclosed |
| CN-1489458-A | Inflammatory cytokine production dissociation inhibitor | ��ʽ����ҽҩ��������о��� | 2004-04-14 | — | — | CN | disclosed |
| WO-2004006863-A2 | THERAPEUTIC DEVICES FOR PATTERNED CELL GROWTH | RUTGERS, THE STATE UNIVERSITY (US) | 2004-01-22 | — | — | WO | disclosed |
| EP-1352650-A1 | INHIBITORS AGAINST THE PRODUCTION AND RELEASE OF INFLAMMATORY CYTOKINES | Institute of Medicinal Molecular Design, Inc. (JP) | 2003-10-15 | — | — | EP | disclosed |
| EP-1309531-A1 | DERIVATIVES OF 4-(TRIFLUOROMETHYL)-PHENOL AND 4-(TRIFLUOROMETHYLPHENYL)-2-(TETRAHYDROPYRANYL) ETHER AND METHOD FOR PRODUCING THE SAME | BASF AKTIENGESELLSCHAFT (DE) | 2003-05-14 | — | — | EP | disclosed |
| WO-2002014250-A1 | DERIVATIVES OF 4-(TRIFLUOROMETHYL)-PHENOL AND 4-(TRIFLUOROMETHYLPHENYL)-2-(TETRAHYDROPYRANYL) ETHER AND METHOD FOR PRODUCING THE SAME | BASF AKTIENGESELLSCHAFT (DE) | 2002-02-21 | — | — | WO | disclosed |
| EP-0586386-A1 | SUBSTITUTED SALICYLAMIDES, AGENTS TO COMBAT PLANT DISEASES | BAYER AG (DE) | 1994-03-16 | — | — | EP | disclosed |
| WO-1992017066-A1 | SUBSTITUTED SALICYLAMIDES, AGENTS TO COMBAT PLANT DISEASES | BAYER AKTIENGESELLSCHAFT (DE) | 1992-10-15 | — | — | WO | disclosed |
| EP-0225189-B1 | TARGETED ENTERAL DELIVERY SYSTEM | R.P. SCHERER CORPORATION (US) | 1992-10-07 | — | — | EP | disclosed |
| US-4910021-A | Oral administered coated capsule for colonic absorption | R. P. SCHERER CORPORATION (US) | 1990-03-20 | — | — | US | disclosed |
| EP-0225189-A2 | Targeted enteral delivery system | R.P. SCHERER CORPORATION (US) | 1987-06-10 | — | — | EP | disclosed |
| EP-0036145-B1 | AN ORALLY ADMINISTERED DRUG FORM COMPRISING A POLAR BIOACTIVE AGENT AND AN ADJUVANT | INTERx RESEARCH CORPORATION (US) | 1985-05-29 | — | — | EP | disclosed |
| EP-0036145-B1 | AN ORALLY ADMINISTERED DRUG FORM COMPRISING A POLAR BIOACTIVE AGENT AND AN ADJUVANT | INTERx RESEARCH CORPORATION (US) | 1985-05-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (50 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11061329-B2 | Resist composition, method of forming resist pattern, polymeric compound, and compound | RER1, ABCC1, CROCC | ALDH1A1 735/4885HPGD 3754/4885KDM4E 3728/4885 |
| US-11709425-B2 | Resist composition and method of forming resist pattern | RER1, RRS1, RXFP4 | ALDH1A1 3475/4885HPGD 3626/4885KDM4E 2379/4885 |
| US-20200283404-A1 | APOPTOSIS SIGNAL-REGULATING KINASE INHIBITORS AND USES THEREOF | DAPK1, ATF1, BAD | ALDH1A1 3022/4885HPGD 1924/4885KDM4E 3408/4885 |
| US-10005720-B2 | Compounds useful for the treatment of metabolic disorders and synthesis of the same | GLS2, PC, GLS | ALDH1A1 219/4885HPGD 272/4885KDM4E 2153/4885 |
| US-11693313-B2 | Resist composition and method of forming resist pattern | C1R, C1S, C9 | ALDH1A1 1921/4885HPGD 3017/4885KDM4E 4803/4885 |
| US-11036132-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion control agent | RB1, RBBP5, RBBP4 | ALDH1A1 3576/4885HPGD 3418/4885KDM4E 2795/4885 |
| US-20180037534-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, BRIX1, HAX1 | ALDH1A1 1390/4885HPGD 4198/4885KDM4E 3543/4885 |
| US-20130115554-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | C1R, SLC11A2, C9 | ALDH1A1 1040/4885HPGD 1381/4885KDM4E 4125/4885 |
| US-20050249697-A1 | Compositions and methods for the inhibition of bone growth and resorption | SOST, BMP2, BMP1 | ALDH1A1 4454/4885HPGD 929/4885KDM4E 3175/4885 |
| US-20060019958-A1 | Immunity-related protein kinase inhibitors | MAP3K1, MAP3K7, MAP3K8 | ALDH1A1 3396/4885HPGD 981/4885KDM4E 1319/4885 |
| US-20180370905-A1 | Compounds Useful for the Treatment of Metabolic Disorders and Synthesis of the Same | GLS2, PC, GLS | ALDH1A1 219/4885HPGD 272/4885KDM4E 2153/4885 |
| US-10838301-B2 | Resist composition, method of forming resist pattern, fluorine-containing compound, and compound | AFF1, RER1, AFF2 | ALDH1A1 1349/4885HPGD 3362/4885KDM4E 4432/4885 |
| US-20260092029-A1 | LIGAND-ENABLED SCALABLE C-H HYDROXYLATION OF BENZOIC AND PHENYLACETIC ACIDS AT ROOM TEMPERATURE | CYP2B6, CYP2A6, CYP1A1 | ALDH1A1 137/4885HPGD 110/4885KDM4E 2985/4885 |
| US-20080311074-A1 | Inhibitors against activation of NF-kappaB | NFKBIA, IKBKB, RELA | ALDH1A1 2096/4885HPGD 240/4885KDM4E 3977/4885 |
| US-11034671-B2 | Apoptosis signal-regulating kinase inhibitors and uses thereof | DAPK1, ATF1, BAD | ALDH1A1 3022/4885HPGD 1924/4885KDM4E 3408/4885 |
| US-20220324791-A1 | P-DIPHENYL COMPOUND DERIVATIVE MIXTURE AND METHOD OF PRODUCING THE SAME | DDT, CYP2D6, CYP3A4 | ALDH1A1 542/4885HPGD 618/4885KDM4E 3077/4885 |
| US-20160184318-A1 | AUTOTAXIN INHIBITORS | ENPP2, SERPINB1, TFPI | ALDH1A1 4843/4885HPGD 3777/4885KDM4E 4073/4885 |
| US-20160376233-A1 | POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER, AND POLYMERIC COMPOUND | RB1, RPL22, RPS21 | ALDH1A1 3046/4885HPGD 4158/4885KDM4E 1770/4885 |
| US-20040092754-A1 | Derivatives of 4-(trifluoromethyl)-phenol and 4-(trifluoromethylphenyl)-2-(tetrahydropyranyl) ether and method for producing the same | EPX, CYP4X1, EPHX2 | ALDH1A1 1331/4885HPGD 1212/4885KDM4E 144/4885 |
| US-20160274458-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND | MLX, ASIC1, RDX | ALDH1A1 1009/4885HPGD 1834/4885KDM4E 4599/4885 |
| US-20060111409-A1 | Medicament for treatment of diabetes | XDH, SLC5A1, SLC5A2 | ALDH1A1 469/4885HPGD 481/4885KDM4E 3430/4885 |
| US-20080090779-A1 | ANTIALLERGIC AGENTS | NAT1, EPX, HRH2 | ALDH1A1 364/4885HPGD 80/4885KDM4E 1835/4885 |
| US-20200209741-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | RER1, SERPINB10, ABCC1 | ALDH1A1 684/4885HPGD 4152/4885KDM4E 4289/4885 |
| US-20060014811-A1 | Medicament for treatment of cancer | HDAC3, HDAC1, HDAC6 | ALDH1A1 97/4885HPGD 738/4885KDM4E 2118/4885 |
| US-20140163232-A1 | METHOD OF PRODUCING AROMATIC AMINO COMPOUNDS | DDC, AOC2, AOC3 | ALDH1A1 805/4885HPGD 916/4885KDM4E 610/4885 |
| US-20180149973-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR | MCM4, RFC4, ATP1A4 | ALDH1A1 2391/4885HPGD 2871/4885KDM4E 3044/4885 |
| US-20060122243-A1 | Antiallergic | EPX, NAT1, HNMT | ALDH1A1 296/4885HPGD 81/4885KDM4E 1633/4885 |
| US-20060094718-A1 | 2-Morpholinocarbonyloxy-),5-(phenylethenyl,N-((3,5-bistrifluoromethyl-)phenyl)-benzamide; inhibitors of nuclear factor kappa B activation; cytokine suppressive antiinflammatory drugs(interleukin (IL-1, IL-6, IL-8) inhibitors); tumor necrosis factor (TNF-alpha) inhibitors; side effects reduction | IL1A, TNF, NFKBIA | ALDH1A1 535/4885HPGD 1463/4885KDM4E 1885/4885 |
| US-20100274051-A1 | INFLAMMATORY CYTOKINE RELEASE INHIBITOR | IL1B, NFKBIA, IL1A | ALDH1A1 479/4885HPGD 272/4885KDM4E 4017/4885 |
| US-10180625-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion control agent | SLC11A2, DRD1, ZYX | ALDH1A1 376/4885HPGD 1425/4885KDM4E 4029/4885 |
| US-20090192122-A2 | INFLAMMATORY CYTOKINE RELEASE INHIBITOR | IL1B, NFKBIA, IL1A | ALDH1A1 563/4885HPGD 238/4885KDM4E 3953/4885 |
| US-20250171460-A1 | INDUCERS OF KLF2 AND METHODS OF USE THEREOF | SREBF2, LIPG, KLF5 | ALDH1A1 1828/4885HPGD 662/4885KDM4E 999/4885 |
| US-20170097564-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | SLC11A2, DRD1, ZYX | ALDH1A1 367/4885HPGD 1411/4885KDM4E 4021/4885 |
| US-20190204739-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | RB1, NR3C2, NR3C1 | ALDH1A1 2809/4885HPGD 4306/4885KDM4E 1982/4885 |
| US-20220011665-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT | MRPS23, MRPS22, SLC11A2 | ALDH1A1 2227/4885HPGD 4266/4885KDM4E 3259/4885 |
| US-11667605-B2 | Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound | RB1, RBBP5, RRM2B | ALDH1A1 2376/4885HPGD 3058/4885KDM4E 2574/4885 |
| US-10241406-B2 | Resist composition and method for forming resist pattern | RB1, CHD1, SMARCA1 | ALDH1A1 1374/4885HPGD 4299/4885KDM4E 932/4885 |
| US-10908502-B2 | Resist composition, method of forming resist pattern, polymeric compound, and compound | RER1, ABCC1, PSMC6 | ALDH1A1 519/4885HPGD 3841/4885KDM4E 3407/4885 |
| US-20180072651-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | RPL21, RER1, RPS21 | ALDH1A1 1377/4885HPGD 1775/4885KDM4E 3941/4885 |
| US-20180021345-A1 | AUTOTAXIN INHIBITORS | ENPP2, SERPINB1, TFPI | ALDH1A1 4843/4885HPGD 3777/4885KDM4E 4073/4885 |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | MRPS23, MRPS22, SLC11A2 | ALDH1A1 2173/4885HPGD 4260/4885KDM4E 3127/4885 |
| US-20210389668-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACID GENERATOR, AND METHOD OF PRODUCING COMPOUND | RB1, RBBP5, RRM2B | ALDH1A1 2376/4885HPGD 3058/4885KDM4E 2574/4885 |
| US-20120035237-A1 | PYRAZOLE AND TRIAZOLE CARBOXAMIDES AS CRAC CHANN EL INHIBITORS | RYR2, PAICS, CTRC | ALDH1A1 1856/4885HPGD 2864/4885KDM4E 1317/4885 |
| US-20080249071-A1 | INFLAMMATORY CYTOKINE RELEASE INHIBITOR | IL1B, NFKBIA, IL1A | ALDH1A1 563/4885HPGD 238/4885KDM4E 3953/4885 |
| US-20080234233-A1 | MEDICAMENT FOR TREATMENT OF NEURODEGENERATIVE DISEASES | MAPT, TFEB, MAOA | ALDH1A1 425/4885HPGD 647/4885KDM4E 2199/4885 |
| US-20120184553-A1 | NOVEL COMPOUNDS | LRRK2, PARK7, PINK1 | ALDH1A1 4183/4885HPGD 3273/4885KDM4E 3000/4885 |
| US-20110257404-A1 | METHOD OF PRODUCING AROMATIC AMINO COMPOUNDS | AOC2, AOC3, DDC | ALDH1A1 630/4885HPGD 1517/4885KDM4E 1447/4885 |
| US-10649330-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | MCM4, RFC4, ATP1A4 | ALDH1A1 2391/4885HPGD 2871/4885KDM4E 3044/4885 |
| US-10451968-B2 | Resist composition and method of forming resist pattern | RPL21, RER1, RPS21 | ALDH1A1 1377/4885HPGD 1775/4885KDM4E 3941/4885 |
| US-20150198881-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND POLYMERIC COMPOUND | C9, SLC11A2, AR | ALDH1A1 339/4885HPGD 4085/4885KDM4E 1855/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.